1. Low-energy electron-induced decarbonylation of Fe[(CO).sub.5] films adsorbed on Au(111) surfaces
- Author
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Hauchard, Christelle and Rowntree, Paul A.
- Subjects
Infrared spectroscopy -- Usage ,Carbonylation -- Research ,Monomolecular films -- Properties -- Research ,Chemistry - Abstract
The decarbonylation of Fe[(CO).sub.5] adsorbed in monolayer and multilayer films on Au(111)/mica substrates has been induced by 0-20 eV electrons and studied by grazing incidence IR spectroscopy. Our results show that the cross sections for the initial stages of this process in as-deposited films range from 60-300 [Å.sup.2] and show considerable variations with the incident electron energy. The high sensitivity to low-energy electrons is believed to be the result of secondary reactions of anion fragments in the film with the neighbouring Fe[(CO).sub.5] moieties, leading to increasingly massive heteronuclear [Fe.sub.n][(CO).sub.m] species and progressive CO elimination. Continued exposure to the electron beam leads to the slower degradation of these newly created species into an Fe-rich deposit containing traces of CO. These traces are removed by subsequent heating to ~300 K. Fe[(CO).sub.5] films that have been subjected to temperatures exceeding 125 K have no measurable sensitivity to the electron beam in the 0-20 eV regime; this is believed to be due to the structural transformation of the as-deposited thin film structure into 3D aggregates. This structural motif presents a very limited quantity of the adsorbed Fe[(CO).sub.5] to the incident beam, and may also form a protective layer of the robust [Fe.sub.n][(CO).sub.m] species during the initial stages of exposure to the electrons. Key words: low-energy electron, Fe[(CO).sub.5], CO elimination, dissociative electron attachment, surface polymerization. La decarbonylation du Fe[(CO).sub.5] adsorbe en monocouche et en films multicouches sur des substrats de Au(III)/ mica a ete induite par des electrons de 0 a 20 eV et la reaction a ete etudiee par spectroscopie infrarouge en incidence rasante. Les resultats obtenus montrent que les sections droites des stages initiaux de ce processus dans les films tels que deposes s'etalent de 60 a 300 [Å.sup.2] et varient beaucoup avec l'energie des electrons incidents. On croit que la grande sensibilite aux electrons de faible energie resulte de reactions secondaires des fragments ioniques dans le film avec les fractions voisines de Fe[(CO).sub.5] qui conduisent a des especes [Fe.sub.n][(CO).sub.m] heteronucleaires de plus en plus massives et a une elimination progressive de CO. Une continuation de l'exposition au faisceau d'electron conduit a une degradation plus lente de ces especes nouvellement creees en depots riches en Fe contenant des traces de CO. Il est possible d'eliminer ces traces par un chauffage subsequent a environ 300 K. Les films de Fe[(CO).sub.5] qui ont ete soumis a des temperatures superieures a 125 K n'ont aucune sensibilite mesurable vis-a-vis du faisceau d'electron dans le regime 0 a 20 eV; on croit que cette situation est due a une transformation de la structure du film mince tel que depose en des agregats 3D. Ce motif structural ne represente qu'une faible quantite du Fe[(CO).sub.5] adsorbe a faisceau incident et il peut agir comme couche protectrice pour les robustes especes [Fe.sub.n][(CO).sub.m] dans les etapes initiales d'exposition aux electrons. Mots-cles : electron de faible energie, Fe[(CO).sub.5], elimination de CO, attachement dissociatif d'electron, polymerisation en surface. [Traduit par la Redaction], Introduction The growth of thin metallic films is an essential aspect in the design of reactive surfaces and in microelectronics. Among the methods of choice to deposit these films, vapour-phase [...]
- Published
- 2011
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