191 results on '"Brunner, Timothy A."'
Search Results
2. Ketorolac Is Not More Effective Than Flunixin Meglumine or Phenylbutazone in Reducing Foot Pain in Horses
3. Validation of imaging benefits of dual monopole exposures
4. Image contrast metrology for EUV lithography
5. Dual monopole exposure strategy to improve extreme ultraviolet imaging
6. Induction of Noninflammatory Pain in an Experimental Foot Lameness Model in Horses
7. Image contrast metrology for EUV lithography
8. EUV dark field lithography: extreme resolution by blocking 0th order
9. One metric to rule them all: new k4 definition for photoresist characterization
10. Validation of imaging benefits of dual monopole exposures.
11. Current challenges and opportunities for EUV lithography
12. Rapid image-based pupil plane characterization for EUV lithography systems
13. Edge placement error fundamentals and impact of EUV: will traditional design-rule calculations work in the era of EUV?
14. EUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reduction
15. Evaluation of EUV mask impacts on wafer line-width roughness using aerial and SEM image analyses
16. EPE fundamentals and impact of EUV: Will traditional design-rule calculations work in the era of EUV? (Conference Presentation)
17. Evaluation of EUV mask impacts on wafer line-edge roughness using aerial and SEM image analyses (Conference Presentation)
18. EUV vote-taking lithography: crazy... or not?
19. First microprocessors printed with immersion lithography
20. Chasing ghosts: How an SRAM detected the subtle impact of stray light
21. Level crossing methodology applied to line-edge roughness characterization
22. Vote-taking for EUV lithography: a radical approach to mitigate mask defects
23. Line-edge roughness performance targets for EUV lithography
24. Current Challenges and Opportunities for EUV Lithography.
25. Rapid Image-Based Pupil Plane Characterization for EUV Lithography Systems.
26. Evaluation of EUV mask impacts on wafer line-width roughness using aerial and SEM image analyses.
27. EUV vote-taking lithography: Crazy... or not ?
28. EPE fundamentals and impact of EUV: Will Traditional Design-rule Calculations Work in the Era of EUV?
29. Rotational energy transfer in Na*2 (A Σ) colliding with Xe, Kr, Ar, Ne, He, H2, CH4, and N2: Experiment and fitting laws.
30. Velocity dependence of rates for rotationally inelastic collisions in Na*2-Xe using velocity selection by Doppler shift.
31. Rotational energy transfer in Na*2-Xe collisions: Level to level dynamics.
32. Power law scaling for rotational energy transfer.
33. Deconvolution of thermal averaging in scattering experiments using integral transform methods.
34. Intrafield overlay correction for illumination-based distortion
35. Patterned wafer geometry (PWG) metrology for improving process-induced overlay and focus problems
36. Validation of imaging benefits of dual monopole exposures
37. Monitoring process-induced focus errors using high-resolution flatness metrology
38. Intra-field overlay correction for illumination based distortion
39. Origins of power law behavior in rotationally inelastic collisions.
40. Layout optimization method to equalize the best-focus position of different patterns
41. Ion beams, thermal processes and lithographic challenges
42. Rapid image-based pupil plane characterization for EUV lithography systems
43. Evaluation of EUV mask impacts on wafer line-edge roughness using aerial and SEM image analyses
44. EUV vote-taking lithography: crazy... or not?
45. EPE fundamentals and impact of EUV: Will traditional design-rule calculations work in the era of EUV?
46. Image contrast metrology for EUV lithography.
47. Characterization of wafer geometry and overlay error on silicon wafers with nonuniform stress
48. Scatterometry-based on-product focus measurement and monitoring
49. Dose-focus monitor technique using a critical-dimension scanning electron microscope and its application to local variation analysis
50. Dose-focus monitor technique using CD-SEM and application to local variation analysis
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