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4. Bulk Titanium Micromachining using Deep Reactive Ion Etching

Author

Ettouri, Rim, Tillocher, Thomas, Lefaucheux, Philippe, Boutaud, Bertrand, Dussart, Rémi, Groupe de recherches sur l'énergétique des milieux ionisés (GREMI), Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS), and MISTIC

Subjects
[PHYS]Physics [physics], DRIE, bulk micromachining, [PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph], titanium, deep reactive ion etching, biomedical
Abstract

National audience; Over the past three decades, deep reactive ion etching (DRIE) has emerged as a promising technique for the fabrication of microtechnological devices. Successful etching depends on understanding the physico-chemical mechanisms involved and overcoming a series of challenges. Although this technology was originally developed for semiconductor manufacturing, it has shown great promise in other material-processing applications including bulk titanium etching. Titanium has been widely used as a biomedical material due to the excellent biocompatibility properties and biostability which results from the spontaneous formation of an oxide layer in air or blood. It has also proven to be a remarkably interesting material for bulk micromachining. So far, however, little work has been done to explore deep titanium etching.The current work details efforts to develop high-aspect-ratio bulk titanium etching processes for the design of microelectromechanical systems (MEMS). Reactive ion etching (RIE) using chlorine/fluorine gases and positive photoresist mask permit etch depths of up to several hundreds of microns. Our research is based on the application of titanium micromachining technology to the creation of biomedical devices. Among the advantages resulting from the overlap between the medical field and that of microfabrication are the reduction of costs, the miniaturization and the improvement of systems properties.

Published
2020

5. Combined analysis methods for investigating titanium and nickel surface contamination after plasma deep etching.

Author

Ettouri, Rim, Tillocher, Thomas, Lefaucheux, Philippe, Boutaud, Bertrand, Fernandez, Vincent, Fairley, Neal, Cardinaud, Christophe, Girard, Aurélie, and Dussart, Rémi

Subjects
PLASMA etching, SURFACE contamination, X-ray photoelectron spectroscopy, TITANIUM, NICKEL-titanium alloys, ETCHING techniques
Abstract

Plasma etching techniques can result in damage and contamination of materials, which, if not removed, can interfere with further processing. Therefore, characterisation of the etched surface is necessary to understand the basic mechanisms involved in the etching process and enable process control and cleaning procedures to be developed. A detailed investigation by means of the combined use of scanning electron microscopy coupled with energy‐dispersive X‐ray spectrometry (SEM/EDS), X‐ray photoelectron spectroscopy (XPS) and optical microscopy (OM) has been carried out on deep titanium trenches etched by plasma. This innovative approach has provided a further insight into the microchemical structure of the surface contamination layer on both the titanium and the nickel hard mask surfaces. The described experiments were conducted on 25 to 100‐μm wide trenches, first etched in bulk titanium by an optimised Cl2/SF6/O2‐based inductively coupled plasma process, through an electroplated nickel hard mask. The results allow to identify chlorine, fluorine and carbon as the main contaminating agents of the nickel mask and to associate three oxidation states around the etched trenches highlighting certain specific aspects related to the passivation mechanism. These observations reinforce the scientific relevance of the combined use of complementary optical and imaging analytical techniques. [ABSTRACT FROM AUTHOR]

Published
2022
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6. Bulk micromachined Titanium MEMS

Author

Bécan, Gwenaël, Rousset, Baptiste, Edmond, Samson, Isac, Nathalie, Do Vale, Maïté, Coste, Philippe, LEFEUVRE, Elie, Woytasik, Marion, Laudrel, Edouard, Boutaud, Bertrand, Philippe, Hadrien, Tillocher, Thomas, Dussart, Remi, Robert, Michel, Michel, Fabrice, Centre de Nanosciences et Nanotechnologies (C2N (UMR_9001)), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS), MISTIC SAS, Groupe de recherches sur l'énergétique des milieux ionisés (GREMI), Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS), and VEGATEC

Subjects
[PHYS]Physics [physics], [SPI]Engineering Sciences [physics], [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, ComputingMilieux_MISCELLANEOUS
Abstract

International audience

Published
2018

7. Titanium-based MEMS: Application for a novel implantable feedthrough using TTV (Through Titanium Vias) technologies

Author

Boutaud, Bertrand, Laudrel, Edouard, Woytasik, Marion, LEFEUVRE, Elie, Tillocher, Thomas, Dussart, Remi, Michel, Fabrice, Robert, Michel, MISTIC SAS, Centre de Nanosciences et Nanotechnologies (C2N (UMR_9001)), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS), Groupe de recherches sur l'énergétique des milieux ionisés (GREMI), Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS), VEGATEC, and Laudrel, Edouard

Subjects
[SPI]Engineering Sciences [physics], [SPI] Engineering Sciences [physics], [SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, [SPI.PLASMA]Engineering Sciences [physics]/Plasmas, [SPI.PLASMA] Engineering Sciences [physics]/Plasmas, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, ComputingMilieux_MISCELLANEOUS
Abstract

International audience

Published
2018

9. Microstructuration of titanium for implantable components

Author

Laudrel, Edouard, Tillocher, Thomas, Lefaucheux, Philippe, Woytasik, Marion, Michel, Fabrice, Philippe, Hadrien, Rousset, Baptiste, Boutaud, Bertrand, Robert, Michel, LEFEUVRE, Elie, Dussart, Remi, Groupe de recherches sur l'énergétique des milieux ionisés (GREMI), Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS), Centre National de la Recherche Scientifique (CNRS)-Université d'Orléans (UO), Centre de Nanosciences et de Nanotechnologies [Orsay] (C2N), Université Paris-Sud - Paris 11 (UP11)-Université Paris-Saclay-Centre National de la Recherche Scientifique (CNRS), VEGATEC, MISTIC SAS, Université Paris-Saclay, and Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Saclay

Subjects
[SPI]Engineering Sciences [physics], [PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph], [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, ComputingMilieux_MISCELLANEOUS
Abstract

International audience

Published
2017

10. Titanium microstructuring for implantable components

Author

Laudrel, Edouard, Tillocher, Thomas, Méric, Yannick, Lefaucheux, Philippe, Woytasik, Marion, Michel, Fabrice, Rousset, Baptiste, Boutaud, Bertrand, Philippe, Hadrien, Robert, Michel, Lefeuvre, Elie, Dussart, Remi, Groupe de recherches sur l'énergétique des milieux ionisés (GREMI), Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS), Centre de Nanosciences et de Nanotechnologies [Orsay] (C2N), Université Paris-Sud - Paris 11 (UP11)-Université Paris-Saclay-Centre National de la Recherche Scientifique (CNRS), VEGATEC, MISTIC SAS, Tillocher, Thomas, and Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Saclay

Subjects
[PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph], [PHYS.PHYS.PHYS-PLASM-PH] Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph], ComputingMilieux_MISCELLANEOUS
Abstract

International audience

Published
2017

11. Chlorine-based plasma deep etching of bulk titanium

Author

Laudrel, Edouard, Tillocher, Thomas, Méric, Yannick, Lefaucheux, Philippe, Boutaud, Bertrand, Dussart, Remi, Groupe de recherches sur l'énergétique des milieux ionisés (GREMI), Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS), Centre National de la Recherche Scientifique (CNRS)-Université d'Orléans (UO), and MISTIC SAS

Subjects
[PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph], ComputingMilieux_MISCELLANEOUS
Abstract

International audience

Published
2016

12. DRY DEEP ETCHING OF BULK TITANIUM BY PLASMA PROCESSES

Author

Laudrel, Edouard, Tillocher, Thomas, Lefaucheux, Philippe, Boutaud, Bertrand, Dussart, Remi, Groupe de recherches sur l'énergétique des milieux ionisés (GREMI), Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS), and Sorin Group [Clamart]

Subjects
[PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph], ComputingMilieux_MISCELLANEOUS
Abstract

International audience

Published
2015

13. Bulk titanium deep etching by plasma processes

Author

Laudrel, Edouard, Tillocher, Thomas, Lefaucheux, Philippe, Boutaud, Bertrand, Dussart, Remi, Groupe de recherches sur l'énergétique des milieux ionisés (GREMI), Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS), and Sorin Group [Clamart]

Subjects
[PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph], ComputingMilieux_MISCELLANEOUS
Abstract

International audience

Published
2015

14. Titanium deep etching for medical applications

Author

Tillocher, Thomas, Lefaucheux, Philippe, Boutaud, Bertrand, Dussart, Remi, Groupe de recherches sur l'énergétique des milieux ionisés (GREMI), Centre National de la Recherche Scientifique (CNRS)-Université d'Orléans (UO), Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS), and Sorin Group [Clamart]

Subjects
[PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph], ComputingMilieux_MISCELLANEOUS
Abstract

International audience

Published
2013

15. Reproducible process for Titanium deep etching

Author

Tillocher, Thomas, Lefaucheux, Philippe, Boutaud, Bertrand, Dussart, Remi, Groupe de recherches sur l'énergétique des milieux ionisés (GREMI), Centre National de la Recherche Scientifique (CNRS)-Université d'Orléans (UO), Sorin Group [Clamart], Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS), and Tillocher, Thomas

Subjects
stomatognathic diseases, [PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph], [PHYS.PHYS.PHYS-PLASM-PH] Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph], health care facilities, manpower, and services, education, ComputingMilieux_MISCELLANEOUS, health care economics and organizations
Abstract

Oral; International audience

Published
2013

16. Investigations in SF6 and Cl2/Ar plasmas used for titanium deep etching by means of mass spectrometry

Author

Tillocher, Thomas, Golda, Judith, Lefaucheux, Philippe, Boutaud, Bertrand, Ranson, Pierre, Dussart, Remi, Groupe de recherches sur l'énergétique des milieux ionisés (GREMI), Centre National de la Recherche Scientifique (CNRS)-Université d'Orléans (UO), Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS), and Sorin Group [Clamart]

Subjects
[PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph], ComputingMethodologies_GENERAL, ComputingMilieux_MISCELLANEOUS
Abstract

Poster; International audience

Published
2012

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