44 results on '"Bottiglieri, Gerardo"'
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2. EUV mask absorber induced best focus shifts
3. Pathfinding the perfect EUV mask: understanding the EUV mask using the hybrid mask model
4. High-NA EUV imaging: from system introduction towards low-k1 extension
5. Investigation of waveguide modes in EUV mask absorbers
6. Imaging effects of particles on the surface of EUV mask and wafer
7. EUV dark field lithography: extreme resolution by blocking 0th order
8. Multilayer optimization for high-NA EUV mask3D suppression
9. Experimental verification of high-NA imaging simulations using SHARP
10. Pathfinding the perfect EUV mask: the role of the multilayer
11. Particle on EUV pellicles, impact on LWR
12. High-NA EUV imaging: challenges and outlook
13. Lithographic effects due to particles on high-NA EUV mask pellicle
14. 3D mask effects in high NA EUV imaging
15. High NA EUV lithography: Next step in EUV imaging
16. Exploring the limits of high contrast contact imaging using split pupil exposures in high-NA EUV lithography
17. High-NA EUV lithography: The next step in EUV imaging (Conference Presentation)
18. Simulation study of illumination effects in high-NA EUV lithography
19. Lithographic effects due to particles on High NA EUV mask pellicle.
20. High-NA EUV imaging: challenges and outlook.
21. Particle on EUV pellicles, impact on LWR.
22. High NA EUV lithography: Next step in EUV imaging.
23. 3D Mask Effects in High NA EUV Imaging.
24. Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography
25. Simulation study of illumination effects in high-NA EUV lithography.
26. Anamorphic imaging at high-NA EUV: mask error factor and interaction between demagnification and lithographic metrics
27. EUV high-NA scanner and mask optimization for sub-8nm resolution
28. Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography.
29. Particle on EUV pellicles, impact on LWR
30. Lithographic effects due to particles on high-NA EUV mask pellicle
31. High-NA EUV imaging: challenges and outlook
32. 3D mask effects in high NA EUV imaging
33. EUV High-NA scanner and mask optimization for sub 8 nm resolution
34. Imaging performance of the EUV high NA anamorphic system
35. Simulation study of illumination effects in high-NA EUV lithography
36. Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography
37. Anamorphic imaging at high-NA EUV: mask error factor and interaction between demagnification and lithographic metrics
38. EUV high-NA scanner and mask optimization for sub-8nm resolution
39. Imaging performance of the EUV high NA anamorphic system
40. EUV dark field lithography: extreme resolution by blocking 0th order.
41. Experimental verification of high-NA imaging simulations using SHARP.
42. EUV dark field lithography: extreme resolution by blocking 0th order
43. High NA EUV lithography: Next step in EUV imaging
44. EUV High-NA scanner and mask optimization for sub 8 nm resolution
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