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This paper reports the design and experimental characterization of a cryogenic compact low-power 60GHz amplifier for control of electron/hole spin qubits, as elementary building block for monolithic Si quantum processors. Tested at 2 K, the amplifier exhibits S21 of 15 dB at 59 GHz, BW3dB of 52.5-67.5 GHz, and power consumption of 2.16 mW. Owing to the topology with inductorless active network, the amplifier has a compact core area of 0.18 x 0.19 mm2., Comment: The final version of this draft has been appearing in the proceedings of IMS 2022 available on IEEE Xplore Digital Library (10.1109/IMS37962.2022.9865561)

This paper reports the experimental characterization at the cryogenic temperature of a compact mm-wave broadband single-pole single-throw (SPST) switch in 22nm FDSOI CMOS technology. The switch consists of two n-MOSFETs with a special device option to reduce the substrate parasitic effects, and a third n-MOSFET to improve isolation. Unlike prior wideband mm-wave switches, it does not require any large passive components, allowing a very compact design, low loss and high isolation performance. The cryogenic measurements at 2 K show an insertion loss lower than 2.3 dB, an isolation better than 25.3 dB, and the return loss better than -11.5 dB, over the entire frequency range from DC to 70 GHz., Comment: The final version of this draft has been appearing in the Proceedings of IMS 2022 available on IEEE Xplore Digital Library (10.1109/IMS37962.2022.9865577)

Hole spins in semiconductor quantum dots represent a viable route for the implementation of electrically controlled qubits. In particular, the qubit implementation based on Si pMOSFETs offers great potentialities in terms of integration with the control electronics and long-term scalability. Moreover, the future down scaling of these devices will possibly improve the performance of both the classical (control) and quantum components of such monolithically integrated circuits. Here we use a multi-scale approach to simulate a hole-spin qubit in a down scaled Si-channel pMOSFET, whose structure is based on a commercial 22nm fully-depleted silicon-on-insulator device. Our calculations show the formation of well defined hole quantum dots within the Si channel, and the possibility of a general electrical control, with Rabi frequencies of the order of 100 MHz for realistic field values. Our calculations demonstrate the crucial role of the channel aspect ratio, and the presence of a favorable parameter range for the qubit manipulation.