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We demonstrate an Nb 2 O 5 / β - Ga 2 O 3 metal–insulator–semiconductor (MIS) hetero-junction diode with Nb 2 O 5 as the high-k dielectric insulator for more efficient electric field management resulting in enhanced breakdown characteristics compared to a β - Ga 2 O 3 Schottky barrier diode. Nb 2 O 5 dielectric films were grown using atomic layer deposition and exhibited a high dielectric constant of 50. The high dielectric constant resulted in a 5 × lower electric field at the metal/dielectric interface in the MIS diode compared to the metal/ β - Ga 2 O 3 interface in the Schottky barrier diode. With good electron conduction in forward bias enabled by the negative conduction band offset of Nb 2 O 5 with respect to β - Ga 2 O 3 , the MIS design led to a 3 × improvement in the reverse blocking voltage with a slight trade-off in the specific on-resistance. Overall, a 3.3 × increase in the power figure of merit was observed (3.25 MW / cm 2 for the Schottky diode and 10.8 MW / cm 2 for the MIS diode). A detailed analysis of the energy band line-up and the forward and reverse current transport mechanisms are also presented using analytical modeling and 2D technology computer-aided design simulations. [ABSTRACT FROM AUTHOR]

Ternary dielectrics with varying composition formed by alloying two binary oxides can enable tunable optical and electrical properties for advanced technological applications. Atomic layer deposition (ALD) gives precise control over ternary dielectric composition through the ability to finely tune the precursor pulsing ratio. This work presents ALD development of Si-rich SixTi1−xO2 dielectrics with varying composition (x), along with spectroscopic and electrical characterization of their properties. Stoichiometry of the SixTi1−xO2 films was determined using X-ray photoelectron spectroscopy. Their composition-dependent refractive index, energy bandgap, and reflectance show promise for diverse optical applications ranging from anti-reflective coatings in photovoltaics to optical waveguides. This work also reports a first comparative study of SixTi1−xO2 films prepared by thermal (T-) and plasma-enhanced (PE-) ALD with varying Si composition and deposition temperatures. Deposition rates of 0.67–0.92 Å/cycle were obtained for SixTi1−xO2 films with x = 0.5–0.91 deposited using PE-ALD at 250 °C, which were higher than that of T-ALD at 200 °C (0.42–0.05 Å/cycle). PE-ALD also exhibited a high deposition rate of 0.81 Å/cycle for SixTi1−xO2 film with x = 0.91 at a low growth temperature of 150 °C. The PE-ALD Si-rich silica–titania films show substantially lower (100×) leakage current densities than the thermally deposited films, along with higher breakdown fields for decreasing deposition temperature. A dielectric constant as low as ∼5 was achieved for PE-ALD SixTi1−xO2 films with high Si (x = 0.91) content. [ABSTRACT FROM AUTHOR]

The realization of next-generation transition-metal dichalcogenide based nanoscale devices demands stringent control over coherent in-plane heterostructures of atomically thin monolayers with exceptional properties. In this paper, we report atmospheric-pressure chemical vapor deposition growth of large-domain, coherent polymorphic in-plane heterostructures of monolayer WS2 on a SiO2/Si substrate with intriguing optical and electronic properties. The formation of in-plane heterostructures with 1H and 1T polymorphs was extensively analyzed using a variety of spectroscopic as well as microscopic techniques, along with lifetime luminescence imaging. High-angle annular dark-field scanning transmission electron microscopy revealed coexistence of the heterophases in monolayer WS2 heterostructures. Back-gated photoconductivity measurements in nanoscale field-effect-transistor device geometry and the rational design of a WS2 heterostructure pattern demonstrate optoelectronic applications. [ABSTRACT FROM AUTHOR]

High performance gate stacks are critically needed for the development of β-Ga2O3 power transistors. Significant improvement in the performance of β-Ga2O3 gate stacks is demonstrated in this work by using SiO2 as an interlayer dielectric between Al2O3 and β-Ga2O3. The presence of SiO2 results in an 800× reduction in gate leakage current along with a 1.7× increase in the electric breakdown field. Additionally, the capacitance-voltage characteristics show an increase in flat band voltage (from 0.74 V to 3.25 V) that can enable normally off power transistors. The lowest interface trap density (Dit) of 5.1 × 1010 cm−2 eV−1 for the SiO2/β-Ga2O3 interface has been demonstrated through the use of a piranha clean before SiO2 deposition on β-Ga2O3 for the first time. Reduction (8×) in Dit, hysteresis (from 0.17 V to 0.05 V), and border trap density indicate substantial improvement in the quality of the β-Ga2O3/gate dielectric interface for the Al2O3/SiO2 bilayer stack as compared to only Al2O3. [ABSTRACT FROM AUTHOR]

Fin field-effect transistor (FinFET) scaling beyond the 10-nm node requires formation of a junction isolation region between the source and the drain to suppress sub-fin leakage current. In this paper, heavy species such as Sb and As were implanted at room temperature to form a punch-through stop (PTS) layer in ${n}$ -Ge substrates. The impact of PTS implants on channel doping and defects, as well as junction leakage, was investigated for bulk Ge ${p}$ -FinFET applications. We report retrograde doping profiles with a low surface (channel) dopant concentration of 4–5 $\times 10^{\textsf {16}}$ cm−3 for Sb PTS implants post 550 °C and 650 °C activation anneals. Besides achieving low effective channel doping, the 650 °C high-temperature activation anneal post PTS implant also helps in the reduction of channel defect density. Furthermore, low junction leakage currents are also demonstrated for Sb and As PTS implants with 550 °C and 650 °C activation anneals. To avoid damaging the FinFET channel layer due to PTS ion implantation, Ge homoepitaxy was also studied post Sb PTS implants. However, Sb PTS implants activated at 650 °C without Ge epitaxy exhibit the best results in terms of low channel dopant and defect concentrations, besides junction leakage. [ABSTRACT FROM AUTHOR]

The accuracy of magnetic resonance imaging (MRI) scanning can be improved using a multifunctional nanosystem having T1–T2 dual contrast enhancement. Specifically, the combination of both T1 and T2 effects in a single system helps in acquiring cross validated information during dual mode MRI and reduces the required dose. In this study, polyethylene glycol (PEG) stabilized MnFe2O4@MnO Janus nanoparticles were developed as novel dual-mode MR imaging agents. MnO contributed to T1 contrast whereas MnFe2O4 enabled T2 contrast. The PEG molecules afforded solubility and stability to the contrast agent in water, making it acceptable for biomedical purposes. The biocompatibility of the developed nanosystem was confirmed by cell viability studies. The r2/r1 ratio remained at a suitable value, justifying the applicability of the contrast agent for dual mode MRI. Finally, the efficiency of the agent for T1–T2 contrast enhancement was confirmed through in vitro and ex vivo MRI experiments. [ABSTRACT FROM AUTHOR]

This work demonstrates a solution to the problem of increase in Schottky barrier height (#8709;B) with thermal annealing (thermal instability) in unpinned (low #8709;B) Ti/TiO2/n-Ge metal-interfacial layer (IL)-semiconductor (MIS) contacts through plasma nitridation of the TiO2 layer. Unlike TiO2, unpinned (#8709;B =0.09 eV) TiOxNy contacts are thermally stable for anneals up to 30 min at 400°C. The thermal stability improves with increasing nitrogen concentration ([N], 2.5-9.5%) and is independent of thickness (2-5 nm) for [N]=9.5%. Additionally, the plasma nitridation process is shown to increase the oxygen vacancy concentration (n-type doping) and reduce the #8709;B dependence on TiOxNy thickness in unannealed TiOxNy contacts. Enhanced thermal stability is attributed to the incorporated nitrogen acting as a diffusion barrier that prevents contact pinning through reduction of the TiO2 layer by contact metal during the anneal, as well as preserves the amorphous nature of the IL along with its fixed charge and interfacial dipoles that contribute to #8709;B reduction. [ABSTRACT FROM AUTHOR]

Stabilizing defective domains of sub‐monolayer thickness in 2D materials plays a significant role in tuning the electronic and optical properties. The chemical vapor deposition growth of WS2 monolayers with control over phase and uniformly nucleated defect domains is reported. Multifold photoluminescence (PL) enhancement (≈20‐fold) is achieved by stabilizing defect‐dominated domains toward design of nanoscale optical devices. While the observed luminescence variation in the form of alternating triangles arises from planar heterostructure (1H–1T′) formation, defect domain present at the center of WS2 heterophase monolayer causes 20‐fold enhancement in photoluminescence. The observed luminescence enhancement is correlated with sulfur defects and confirmed by site‐specific spatial X‐ray photoemission spectroscopy and in situ PL measurements at cryogenic temperatures. Detailed microstructural and spectroscopic observations indicate the partial stripping of monolayers by removal of sulfur and incorporation of oxygen leading to increased excitonic emissions. The demonstrated atomic‐scale manipulation to stabilize defect domains over large area with enhanced luminescence behavior is relevant for developing next‐generation nanoscale photonic devices. [ABSTRACT FROM AUTHOR]

The accuracy of magnetic resonance imaging (MRI) scanning can be improved using a multifunctional nanosystem having T1-T2 dual contrast enhancement. Specifically, the combination of both T1 and T2 effects in a single system helps in acquiring cross validated information during dual mode MRI and reduces the required dose. In this study, polyethylene glycol (PEG) stabilized MnFe2O4@MnO Janus nanoparticles were developed as novel dual-mode MR imaging agents. MnO contributed to T1 contrast whereas MnFe2O4 enabled T2 contrast. The PEG molecules afforded solubility and stability to the contrast agent in water, making it acceptable for biomedical purposes. The biocompatibility of the developed nanosystem was confirmed by cell viability studies. The r2/r1 ratio remained at a suitable value, justifying the applicability of the contrast agent for dual mode MRI. Finally, the efficiency of the agent for T1-T2 contrast enhancement was confirmed through in vitro and ex vivo MRI experiments.

Self-organized semiconductor-semiconductor heterostructures (3R-2H) that coexist in atomically thin 2D monolayers forming homojunctions are of great importance for next-generation nanoelectronics and optoelectronics applications. Herein, we investigated the defect controlled growth of heterogeneous electronic structure within a single domain of monolayer WS 2 to enable in-plane homojunctions consisting of alternate 2H semiconducting and 3R semiconducting phases of WS 2 . X-ray photoelectron, Raman, and photoluminescence spectroscopy along with fluorescence and Kelvin probe force microscopy imaging confirm the formation of homojunctions, enabling a direct correlation between chemical heterogeneity and electronic heterostructure in the atomically thin WS 2 monolayer. Quantitative analysis of phase fractions shows 59% stable 2H phase and 41% metastable 3R phase estimated over WS 2 flakes of different sizes. Time-resolved fluorescence lifetime imaging confirms distinct contrast between 2H and 3R phases with two distinct lifetimes of 3.2 ns and 1.1 ns, respectively. Kelvin probe force microscopy imaging revealed an abrupt change in the contact potential difference with a depletion width of ∼2.5 μm, capturing a difference in work function of ∼40 meV across the homojunction. Further, the thermal stability of coexisting phases and their temperature dependent optical behavior show a distinct difference among 2H and 3R phases. The investigated aspects of the controlled in plane growth of coexisting phases with seamless homojunctions, their properties, and their thermal stability will enable the development of nanoscale devices that are free from issues of lattice mismatch and grain boundaries.