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Your search keyword '"Bayraktar, Muharrem"' showing total 91 results
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91 results on '"Bayraktar, Muharrem"'

2. Spectral and spatial resolution of an extreme ultraviolet broadband imaging spectrometer based on dispersion-matched zone plates.

Author

Babenko, Ievgeniia, Mostafa, Yahia, Bouza, Zoi, Versolato, Oscar O., and Bayraktar, Muharrem

Subjects
LASER plasmas, PLASMA sources, SPECTRAL imaging, SPATIAL resolution, ULTRAVIOLET radiation
Abstract

We present a combined 1D imaging and broadband spectroscopy tool for analyzing laser-produced plasma sources of extreme ultraviolet light using a tapered zone plate that is dispersion-matched to a transmission grating. Specifically, we follow up on prior work [Mostafa et al. Opt. Lett. 48, 4316 (2023)] to obtain the actual spectral and spatial resolution of the imaging spectrometer and compare it to the design values. The imaging spectrometer is shown to have a spectral resolution of 1.2 nm at 13.5 nm, close to its design value, by assessing spectra obtained from carbon laser-produced plasma in a 5–180 nm wavelength band. The spatial resolution was obtained by placing slits near the object plane and back-illuminating the slit with a tin laser-produced plasma and found to be 17(5) µm, somewhat larger than the design specifications but still well within design limits for use for diagnosing plasma. [ABSTRACT FROM AUTHOR]

Published
2024
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3. Tuning of large piezoelectric response in nanosheet-buffered lead zirconate titanate films on glass substrates

Author

Chopra, Anuj, Bayraktar, Muharrem, Nijland, Maarten, Elshof, Johan E. ten, Bijkerk, Fred, and Rijnders, Guus

Subjects
Condensed Matter - Materials Science
Abstract

Renewed interest has been witnessed in utilizing the piezoelectric response of $PbZr_{0.52}Ti_{0.48}O_{3}$ (PZT) films on glass substrates for applications such as data storage and adaptive optics. Accordingly, new methodologies are being explored to grow well-oriented PZT thin films to harvest a large piezoelectric response. However, thin film piezoelectric response is significantly reduced compared to intrinsic response due to substrate induced clamping, even when films are well-oriented. Here, a novel method is presented to grow preferentially (100)-oriented PZT films on glass substrates by utilizing crystalline nanosheets as seed layers. Furthermore, increasing the repetition frequency up to 20 Hz during pulsed laser deposition helps to tune the film microstructure to hierarchically ordered columns that leads to reduced clamping and enhanced piezoelectric response evidenced by transmission electron microscopy and analytical calculations. A large piezoelectric response of 280 pm/V is observed in optimally tuned structure which almost triples the highest reported piezoelectric response on glass. To confirm that the clamping compromises the piezoelectric response, denser films are deposited using a lower repetition frequency and a $BiFeO_{3}$ buffer layer resulting in significantly reduced piezoelectric responses. This paper demonstrates a novel method for PZT integration on glass substrates without compromising the large piezoelectric response., Comment: 26 pages, 6 figures

Published
2016

12. Adaptive multilayer mirrors based on piezoelectric actuators

Author

Lucke, Philip, Polyakov, Alexander Yu., Bayraktar, Muharrem, Schukkink, Niels, Nematollahi, Mohammadreza, Yakshin, Andrey, Rijnders, A.J.H.M., Bijkerk, F., XUV Optics, MESA+ Institute, and Inorganic Materials Science

Published
2021

13. Method to calculate the far field of three-dimensional objects for computer-generated holography

Author

Bayraktar, Muharrem and Ozcan, Meric

Subjects
Holography -- Methods, Astronomy, Physics
Abstract

Here, a new method for calculating the computer-generated holograms of three-dimensional (3D) objects is presented along with a review of current techniques. The method, the planar layers method (PLM), is established on the idea of representing 3D objects in discrete planar layers perpendicular to the observation plane, then calculating the total far field pattern by summing up the far field patterns of each layer. Simulation results, computational complexity, and error comparisons reveal that this new method can be used to calculate far field patterns--hence, the holograms--of computer-synthesized objects very efficiently. [c] 2010 Optical Society of America OCIS codes: 090.1760, 090.1995, 100.3010, 350.5500.

Published
2010

16. Spectral purity performance of high-power EUV systems

Author

van de Kerkhof, Mark, Liu, Fei, Meeuwissen, Marieke, Zhang, Xueqing, de Kruif, Robert, Davydova, Natalia, Schiffelers, Guido, Wählish, Felix, van Setten, Eelco, Varenkamp, Wouter, Ricken, Kees, de Winter, Laurens, McNamara, John, Bayraktar, Muharrem, Felix, Nelson M., Lio, Anna, and XUV Optics

Subjects
Scanner, Pellicle, Materials science, business.industry, Extreme ultraviolet lithography, Spectral Purity, Power (physics), Optics, DGL-membrane, Out-of-band management, Reticle, DUV, High-Power, EUV, Emission spectrum, business, Throughput (business), Spectral purity
Abstract

With the introduction of the NXE:3400B scanner, ASML has brought EUV to High-Volume Manufacturing (HVM). The high EUV power of >200W being realized with this system satisfies the throughput requirements of HVM, but also requires reconsideration of the imaging aspects of spectral purity, both from the details of the EUV emission spectrum and from the DUV emission. This paper will present simulation and experimental results for the spectral purity of high-power EUV systems, and the imaging impact of this, both for the case of with and without a pellicle. Also, possible controls for spectral purity will be discussed, and a novel method will be described to measure imaging impact of varying CE and DUV. It will be shown that CE optimization towards higher source power leads to reduction in relative DUV content, that the small deltas in EUV source spectrum for higher power do not influence imaging. It will also be shown that resulting variations in DUV do not affect imaging performance significantly, provided that a suitable reticle black border is used. In short, spectral purity performance is not a bottleneck for increasing power of EUV systems to well above 250W.

Published
2020
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23. Adaptive piezoelectric optics for XUV wavelengths

Author

Bayraktar, Muharrem, Lucke, Philip, Nematollahi, Mohammadreza, Yakshin, Andrey, Louis, Eric, Rijnders, A.J.H.M., Bijkerk, F., XUV Optics, and Inorganic Materials Science

Published
2019

25. Influence of DC Bias on the Hysteresis, Loss, and Nonlinearity of Epitaxial PbZr0.55Ti0.45O3 Films.

Author

Lucke, Philip, Bayraktar, Muharrem, Schukkink, Niels, Yakshin, Andrey E., Rijnders, Guus, Bijkerk, Fred, and Houwman, Evert P.

Subjects
RAYLEIGH model, HYSTERESIS, ROTATIONAL motion
Abstract

The hysteresis, loss, and nonlinearity of the strain and polarization response of an epitaxial PbZr0.55Ti0.45O3 film are experimentally investigated for non‐switching AC excitation fields at a DC bias of 20 kV cm−1 in the 70 Hz to 5 kHz range. The measured strain is hysteretic and linear, whereas the polarization is hysteretic and highly nonlinear with excitation amplitude. Furthermore, compared to the case with zero bias, the effective piezoelectric coefficient that is extracted from the strain response is almost not changed for the investigated field range. In contrast, the loss tangent and nonlinearity of the polarization response are strongly reduced. The observations can not be explained by the Rayleigh model and its extensions, but are very well explained by the recently proposed polarization rotation model through addition of a non‐zero bias field term to the model. This model describes the film properties as the result of the nonlinear rotation of the polarization vector within the unit‐cell in response to the applied field, which is accompanied with viscous domain interaction. These results demonstrate that the polarization rotation model can describe the film response in a broad range of excitation frequencies and amplitudes, which far the applicable range of the Rayleigh model. [ABSTRACT FROM AUTHOR]

Published
2021
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33. Hysteresis, Loss and Nonlinearity in Epitaxial PbZr0.55Ti0.45O3 Films: A Polarization Rotation Model.

Author

Lucke, Philip, Bayraktar, Muharrem, Birkhölzer, Yorick A., Nematollahi, Mohammadreza, Yakshin, Andrey, Rijnders, Guus, Bijkerk, Fred, and Houwman, Evert P.

Subjects
*HYSTERESIS, *RAYLEIGH model, *ROTATIONAL motion, *UNIT cell, *FERROELECTRIC thin films, *THIN films
Abstract

The phenomena of hysteresis, ferroelectric loss, and nonlinearity are investigated for the strain and polarization of a monoclinic, epitaxial Pb(Zr,Ti)O3 film over the 70 Hz to 5 kHz frequency range at sub‐coercive excitation fields and zero electrical bias. For the strain, a linear hysteretic behavior is found, whereas the polarization shows a strongly nonlinear hysteretic behavior. In contrast to polycrystalline structures (for instance in ceramics or chemical solution deposited thin films), the commonly referred Rayleigh model cannot explain the observed behavior. A new model is presented, based on the rotation of the polarization vector within the monoclinic or rhombohedral unit cell under an applied electric field, with the viscous interaction of domains accompanying the unit cell deformation. The model explains the amplitude and frequency scaling of the strain, polarization, and loss tangent as well as the observed higher harmonics of polarization in the measured epitaxial Pb(Zr,Ti)O3 films. It is concluded that the nonlinear response and the hysteretic loss originate from two separate physical processes. The nonlinear response is attributed to the nonlinear angular rotation of the polarization vector, whereas the hysteresis and ferroelectric loss are due to a viscous interaction of domains while the polarization vector is rotating. [ABSTRACT FROM AUTHOR]

Published
2020
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34. EUV-mirror, optical system with EUV-mirror and associated operating method

Author

Dinger, U., Bijkerk, Frederik, Bayraktar, Muharrem, Dier, O., XUV Optics, and Faculty of Science and Technology

Subjects
METIS-320142, IR-102804
Abstract

An EUV mirror (1000) has a mirror element which forms a mirror surface of the mirror. The mirror element has a substrate (1020) and a multilayer arrangement (1030) applied on the substrate and having a reflective effect with respect to radiation from the extreme ultraviolet range (EUV). The multilayer arrangement has a multiplicity of layer pairs having alternate layers composed of a high refractive index layer material and a low refractive index layer material, has an active layer (1040) arranged between a radiation entrance surface and the substrate and consisting of a piezoelectrically active layer material, the layer thickness (z) of which active layer can be altered by the action of an electric field, and has an electrode arrangement to generate the electric field acting on the active layer.

Published
2016

35. Transmission grating spectrometer for broadband characterization of EUV sources

Author

Bayraktar, Muharrem, Bastiaens, Hubertus M.J., Bruineman, C., Vratzov, B., Bijkerk, Frederik, XUV Optics, and Laser Physics & Nonlinear Optics

Subjects
METIS-319124
Abstract

Emission from extreme ultraviolet (EUV) light sources for lithography and metrology applications needs to be maximized in a narrow wavelength band. On the other hand, these sources also emit radiation outside this wavelength band, extending into the deep ultraviolet (DUV) and visible/IR range. To gain a comprehensive understanding of the source conditions, characterization of the in-band as well as the ouf-of-band radiation is needed. Here, we present a broadband spectrometer based on a set of free-standing transmission gratings. The spectrometer combines, high (up to 10,000 lines/mm) and low line density gratings that enable recording of the source spectrum with high resolution and also in a wide bandwidth extending beyond the DUV wavelengths. Compared to a reflective grating configuration, the transmission geometry enables the design to be more compact, and the alignment and calibration to be more straightforward. The components in the spectrometer are controlled by motorized stages that enable adjusting spectral resolution and spectral range without breaking vacuum. We present measurements that were carried out at different types of EUV sources and at various spectral ranges. The measurements provide comprehensive spectral information that is directly available for analysis and optimization of the source conditions.

Published
2016

36. Compact Anomalous Transmission Filters for EUV Spectral Monitoring

Author

Barreaux, J.L.P., Kozhevnikov, I.V., Bayraktar, Muharrem, van de Kruijs, Robbert Wilhelmus Elisabeth, Bastiaens, Hubertus M.J., Bijkerk, Frederik, Boller, Klaus J., Laser Physics & Nonlinear Optics, and XUV Optics

Subjects
METIS-317682
Published
2016

37. Wavefront correction at Angstom length scales

Author

Wylie- Van Eerd, Benjamin, Bayraktar, Muharrem, Chopra, A.R., Krijnen, B., Rijnders, Augustinus J.H.M., Bijkerk, Frederik, Inorganic Materials Science, and XUV Optics

Subjects
METIS-315450
Published
2016

39. Broadband transmission grating spectrometer for measuring the emission spectrum of EUV sources

Author

Bayraktar, Muharrem, Bastiaens, Hubertus M.J., Bruineman, Caspar, Vratzov, Boris, Bijkerk, Frederik, XUV Optics, Laser Physics & Nonlinear Optics, and Faculty of Science and Technology

Subjects
METIS-319112, Astrophysics::Solar and Stellar Astrophysics, Physics::Optics, IR-102306
Abstract

Extreme ultraviolet (EUV) light sources and their optimization for emission within a narrow wavelength band are essential in applications such as photolithography. Most light sources however also emit radiation outside this wavelength band and have a spectrum extending up to deep ultraviolet (DUV) wavelengths. This out-of-band radiation can be hazardous in the rest of the lithography process, hence monitoring of it is necessary. In this article we present a broadband spectrometer based on a transmission grating for spectral monitoring of EUV sources from EUV to DUV wavelengths. The transmission geometry enables a compact design and a straightforward alignment. Measurements that were carried out with the spectrometer at two different EUV sources provide detailed spectral information that is immediately available for analysis and optimization of the source conditions.

Published
2016

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