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1. Parasitic Resistance Reduction for Aggressively Scaled Stacked Nanosheet Transistors

2. Advanced BEOL Interconnects

3. Improved Air Spacer Co-Integrated with Self-Aligned Contact (SAC) and Contact over Active Gate (COAG) for Highly Scaled CMOS Technology

5. Highly Selective SiGe Dry Etch Process for the Enablement of Stacked Nanosheet Gate-All-Around Transistors

6. Self-Allancd Gate Contact (SAGC) for CMOS technology scaling beyond 7nm

7. Gate-Cut-Last in RMG to Enable Gate Extension Scaling and Parasitic Capacitance Reduction

8. Sub- $10^{-9}~\Omega $ -cm2 n-Type Contact Resistivity for FinFET Technology

9. Gas cluster ion beam processing for improved self aligned contact yield at 7 nm node FinFET: MJ: MOL and junction interfaces

10. A 7nm CMOS technology platform for mobile and high performance compute application

11. Interface engineering of Si1−xGex gate stacks for high performance dual channel CMOS

12. Ultra-Thin Body and BOX (UTBB) Device for Aggressive Scaling of CMOS Technology

13. Electrochemical characterization of a polypyrrole/Co0.2CrOx composite as a cathode material for lithium ion batteries

14. Mathematical modeling of the capacity fade of Li-ion cells

15. Capacity fade study of lithium-ion batteries cycled at high discharge rates

16. Synthesis and characterization of a novel non-chrome electrolytic surface treatment process to protect zinc coatings

17. Performance of La0.8Sr0.2CoO3 coated NiO as cathodes for molten carbonate fuel cells

18. Capacity fade of Sony 18650 cells cycled at elevated temperatures

19. Performance study of commercial LiCoO2 and spinel-based Li-ion cells

20. Study of cobalt-doped lithium–nickel oxides as cathodes for MCFC

21. Study of polypyrrole graphite composite as anode material for secondary lithium-ion batteries

22. Electrochemical characterization of cobalt-encapsulated nickel as cathodes for MCFC

23. Comprehensive study of effective current variability and MOSFET parameter correlations in 14nm multi-fin SOI FINFETs

24. Corrosion initiation time of steel reinforcement in a chloride environment—A one dimensional solution

25. 56 nm pitch copper dual-damascene interconnects with triple pitch split metal and double pitch split via

26. Extremely-Thin SOI for Mainstream CMOS: Challenges and Opportunities

27. EUV lithography at the 22nm technology node

28. Copper contact metallization for 22 nm and beyond

29. OPTIMIZATION OF THE CATHODE LONG-TERM STABILITY IN MOLTEN CARBONATE FUEL CELLS: EXPERIMENTAL STUDY AND MATHEMATICAL MODELING

30. OPTIMIZATION OF THE CATHODE LONG TERM STABILITY IN MOLTEN CARBONATE FUEL CELLS: EXPERIMENTAL STUDY AND MATHEMATICAL MODELING

31. Development of First Principles Capacity Fade Model for Li-Ion Cells

32. Corrosion Protection of Steel Using Nonanomalous Ni-Zn-P Coatings

33. Development of a Novel Electrochemical Method to Deposit High Corrosion Resistant Silicate Layers on Metal Substrates

34. Study of Sn-Coated Graphite as Anode Material for Secondary Lithium-Ion Batteries

35. Anodic Behavior of Ti in KOH Solutions

36. Studies on Capacity Fade of Spinel-Based Li-Ion Batteries

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