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11. Holographic method for a direct growth of three-dimensional photonic crystals by chemical vapor deposition.

Author

Duneau, Michel, Delyon, François, and Audier, Marc

Subjects
CRYSTALS, CRYSTAL growth, CHEMICAL vapor deposition, HOLOGRAPHY, LITHOGRAPHY, PHOTORESISTS, INTERFEROMETERS
Abstract

A method to obtain three-dimensional (3D) photonic crystals by chemical vapor deposition (CVD) is presented. Campbell et al. [ N. Campbell, N. Sharp, M. T. Harrison, R. G. Denning, and A. J. Tuberfield, Nature 404, 53 (2000) ] have developed a method of holographic lithography for producing 3D periodic structures with photoresists. Their method is adapted in two main directions. First, we optimize the geometry of the interferometer with respect to polarizations and relative intensities of the beams. The construction of an interferometer adapted to a ultraviolet laser source at 355 nm is described and direct observations of the interference field obtained by a video camera are presented. Second, we show that a laser source with short pulses could induce a suitable thermal contrast on a convenient substrate in order to grow a 3D photonic crystal by CVD. [ABSTRACT FROM AUTHOR] more...

Published
2004
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12. A very promising piezoelectric property of Ta2O5 thin films. I: Monoclinic-trigonal phase transition

Author

Audier, Marc, Chenevier, Bernard, Roussel, Herve, Vincent, Loïc, Peña, Alexandra, Lintanf-Salaün, Amélie, Laboratoire des matériaux et du génie physique (LMGP ), Institut National Polytechnique de Grenoble (INPG)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Centre Interuniversitaire de Micro-Electronique (CIME), Institut National Polytechnique de Grenoble (INPG), Optique et Matériaux (OPTIMA), Institut Néel (NEEL), Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Centre National de la Recherche Scientifique (CNRS)-Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Centre National de la Recherche Scientifique (CNRS), Science et Ingénierie des Matériaux et Procédés (SIMaP), and Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut de Chimie du CNRS (INC)-Institut National Polytechnique de Grenoble (INPG) more...

Subjects
Ceramic thin film, X-ray photoelectron spectroscopy, Tantalum oxide, [CHIM.CRIS]Chemical Sciences/Cristallography, [CHIM.MATE]Chemical Sciences/Material chemistry, Transmission electron microscopy, Phase transition, X-ray diffraction
Abstract

International audience; Ceramic thin films of tantalum oxide of a new trigonal structure (a=12.713(7) angstrom, alpha = 28.201(0)degrees, space-group R3) were produced by thermal treatments of amorphous deposits on (001)Si wafers, either by electrostatic spray deposition or by injection metal-organic chemical vapor decomposition. This trigonal phase comes from the transformation of a monoclinic phase 11L- or 25L-Ta2O5. The transformation is reversible under oxygen atmosphere and, from results of TEM investigations, occurs mainly via atomic motions along the z unique axis of the monoclinic structure parallel to the polar three-fold axis of the trigonal structure. The non-centrosymmetry and direction of polar axis of the trigonal phase, identified by high resolution TEM imaging, indicate a possibility of very high electric dipole moments linked to a strong piezoelectricity. From results of XPS analyses of both monoclinic and trigonal structures, the binding energies remain similar to those of Ta2O5. As the formation of the trigonal structure gives rise to an important volume expansion, stresses induced in ceramic thin films are likely influencing both properties of birefringence and piezoelectricity which are presented in a 'separated article (part 11). It is mentioned that the formation of trigonal phase does not occur in bulk Ta2O5 samples, for which an incommensurate phase transition has been observed in a previous work. more...

Published
2011
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13. Electrical characterisation of HfO2 films obtained by UV assisted injection MOCVD

Author

Decams, J.M., Guillon, H., Jiménez, Carmen, Audier, Marc, Sénateur, J.P., Dubourdieu, Catherine, Cadix, O., O'Sullivan, B.J., Mondreanu, M., Hurley, P.K., Rushworth, S., Leedham, T.J., Davies, H., Fang, Q., Boyd, I., Qualifow-Jipelec (QUALIFOW-JIPELEC), Qualiflow-Jipelec, Laboratoire des matériaux et du génie physique (LMGP ), Institut National Polytechnique de Grenoble (INPG)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), National Microelectronic Research Center (NMRC), University College Cork (UCC), Epichem (EPICHEM LIMITED), Epichem, and University College of London [London] (UCL) more...

Subjects
high k, MOCVD, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], permittivity, ComputingMilieux_MISCELLANEOUS, hafnium dioxide, UV
Abstract

International audience

Published
2005

21. CrO2-to-Cr2O3 Transformation in a Three-Dimensional Interference Field of Ultraviolet Laser Light.

Author

Audier, Marc, Salaün, Mathieu, Roussel, Hervé, Delyon, François, and Duneau, Michel

Subjects
*TITANIUM dioxide, *CHROMIUM oxide, *PHOTOLYSIS (Chemistry)
Abstract

In a previous work (J. Cryst. Growth2009, 311, 2590), direct growth of a fcc architecture of Cr2O3 phase onto (001)TiO2 substrates has been obtained by photolysis of CrO2Cl2 in a three-dimensional interference field of UV laser light. This growth includes a step of CrO2-to-Cr2O3 transformation which is characterized in the present work from CrO2 layers irradiated in UV interferences. Cr2O3 is confirmed to form with specific crystallographic orientational relationships from results of X-ray diffraction, namely, [100]TiO2 ∥ [100]CrO2 ∥ [101̅]Cr2O3, [010]TiO2 ∥ [010]CrO2 ∥ [111]Cr2O3, [001]TiO2 ∥ [001]CrO2 ∥ [12̅1]Cr2O3. According to these relationships, four orientations of Cr2O3 domains are observed on (001)CrO2 but only two on (100)CrO2. From transmission electron microscopy observations, thin layers of Cr2O3 onto (100)CrO2 exhibit a structure in domains with two orientations which can be assumed to be in epitaxy with habit planes {100}CrO2 ∥ {101̅} Cr2O3. This epitaxy is justified from the similarities existing between the atomic arrangements of these planes. Finally, experimental conditions for further growth of a fcc architecture constituted of pure epitaxial CrO2 phase are discussed. A study of the CrO2-to-Cr2O3 transformation of single crystal CrO2 layers exposed to a three-dimensional interference field of UV laser light is reported. The transformation has previously been observed in a direct growth of a fcc architecture of Cr2O3 phase on (001)TiO2 substrates by photolysis of CrO2Cl2. [ABSTRACT FROM AUTHOR] more...

Published
2010
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