1. Reducing disorder in Ge quantum wells by using thick SiGe barriers
- Author
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Costa, Davide, Stehouwer, Lucas E. A., Huang, Yi, Martí-Sánchez, Sara, Esposti, Davide Degli, Arbiol, Jordi, and Scappucci, Giordano
- Subjects
Condensed Matter - Mesoscale and Nanoscale Physics ,Condensed Matter - Materials Science - Abstract
We investigate the disorder properties of two-dimensional hole gases in Ge/SiGe heterostructures grown on Ge wafers, using thick SiGe barriers to mitigate the influence of the semiconductor-dielectric interface. Across several heterostructure field effect transistors we measure an average maximum mobility of $(4.4 \pm 0.2) \times 10^{6}~\mathrm{cm^2/Vs}$ at a saturation density of $(1.72 \pm 0.03) \times 10^{11}~\mathrm{cm^{-2}}$, corresponding to a long mean free path of $(30 \pm 1)~\mathrm{\mu m}$. The highest measured mobility is $4.68 \times 10^{6}~\mathrm{cm^2/Vs}$. We identify uniform background impurities and interface roughness as the dominant scattering mechanisms limiting mobility in a representative device, and we evaluate a percolation-induced critical density of $(4.5 \pm 0.1)\times 10^{9} ~\mathrm{cm^{-2}}$. This low-disorder heterostructure, according to simulations, may support the electrostatic confinement of holes in gate-defined quantum dots.
- Published
- 2024