Ferrari, M.a, Alombert-Goget, G.a, Armellini, C.a, Berneschi, S.b, Bhaktha, S.N.B.ac, Boulard, B.d, Brenci, M.b, Chiappini, A.a, Chiasera, Duverger-Arfuso, C.d, Féron, P.e, Gonçalves, R.R.f, Jestin, Y.a, Minati, L.g, Moser, E.c, Nunzi Conti, Pelli, Rao, D.N.h, Retoux, R.i, Righini, G.C.b, Speranza, G.g, Caratterizzazione e Sviluppo di Materiali per la Fotonica e l'Optoelecttronica (CSMFO), CNR Istituto di Fotonica e Nanotecnologie [Trento] (IFN), Consiglio Nazionale delle Ricerche [Roma] (CNR)-Consiglio Nazionale delle Ricerche [Roma] (CNR), Istituto di Fisica Applicata 'Nello Carrara' (IFAC), Consiglio Nazionale delle Ricerche [Roma] (CNR), Dipartimento di Fisica (Università Degli Studi di Trento), Università degli Studi di Trento (UNITN)-Istituto Nazionale per la Fisica della Materia (INFM)-Caratterizzazione e Sviluppo di Materiali per la Fotonica e l'Optoelecttronica (CSMFO), Laboratoire des oxydes et fluorures (LdOF ), Le Mans Université (UM)-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC), Fonctions Optiques pour les Technologies de l'informatiON (FOTON), Institut National des Sciences Appliquées - Rennes (INSA Rennes), Institut National des Sciences Appliquées (INSA)-Université de Rennes (UNIV-RENNES)-Institut National des Sciences Appliquées (INSA)-Université de Rennes (UNIV-RENNES)-Centre National de la Recherche Scientifique (CNRS)-Université de Rennes 1 (UR1), Université de Rennes (UNIV-RENNES)-École Nationale Supérieure des Sciences Appliquées et de Technologie (ENSSAT)-Télécom Bretagne, Departamento de Quimica, Universitade de São Paulo, Fondazione Bruno Kessler [Trento, Italy] (FBK), School of Physics, University of Hyderabad, Laboratoire de cristallographie et sciences des matériaux (CRISMAT), École Nationale Supérieure d'Ingénieurs de Caen (ENSICAEN), Normandie Université (NU)-Normandie Université (NU)-Centre National de la Recherche Scientifique (CNRS)-Université de Caen Normandie (UNICAEN), Normandie Université (NU)-Institut de Chimie du CNRS (INC), Ali Serpenguzel, Gonçal Badenes, Giancarlo C. Righini, Collaboration : umr6082, CNR-IFN Trento, CNR-IFAC, National Research Council of Italy | Consiglio Nazionale delle Ricerche (CNR)-National Research Council of Italy | Consiglio Nazionale delle Ricerche (CNR), National Research Council of Italy | Consiglio Nazionale delle Ricerche (CNR), Università degli Studi di Trento (UNITN), Le Mans Université (UM)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Université de Rennes (UR)-Institut National des Sciences Appliquées - Rennes (INSA Rennes), Institut National des Sciences Appliquées (INSA)-Institut National des Sciences Appliquées (INSA)-École Nationale Supérieure des Sciences Appliquées et de Technologie (ENSSAT)-Télécom Bretagne-Centre National de la Recherche Scientifique (CNRS), Université de Caen Normandie (UNICAEN), Normandie Université (NU)-Normandie Université (NU)-École Nationale Supérieure d'Ingénieurs de Caen (ENSICAEN), Normandie Université (NU)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Institut de Recherche sur les Matériaux Avancés (IRMA), Normandie Université (NU)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université de Rouen Normandie (UNIROUEN), Normandie Université (NU)-Institut national des sciences appliquées Rouen Normandie (INSA Rouen Normandie), Institut National des Sciences Appliquées (INSA)-Normandie Université (NU)-Institut National des Sciences Appliquées (INSA)-Centre National de la Recherche Scientifique (CNRS)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université de Rouen Normandie (UNIROUEN), and Institut National des Sciences Appliquées (INSA)-Normandie Université (NU)-Institut National des Sciences Appliquées (INSA)-Centre National de la Recherche Scientifique (CNRS)
conference 7366 « Photonic Materials, Devices, and Applications », Session: 3B « Nanophotonics II » [7366-13], http://spie.org/microtechnologies-new-millennium.xml; International audience; The realization of photonic structures operating at visible and near infrared frequencies is a highly attractive scientific and technological challenge. Since optical fiber innovation, a huge of activity has been performed leading to interesting results, such as optical waveguides and planar lightwave circuits, microphotonic devices, optical microcavities, nanowires, plasmonic structures, and photonic crystals. These systems have opened new possibilities in the field of both basic and applied physics, in a large area covering Information Communication Technologies, Health and Biology, Structural Engineering, and Environment Monitoring Systems. Several materials and techniques are employed to successfully fabricate photonic structures. Concerning materials, Er3+-activated silica-based glasses still play an important role, although recently interesting results have been published about fluoride glass-ceramic waveguides. As far as regards the fabrication methods sol-gel route and rf sputtering have proved to be versatile and reliable techniques. In this article we will present a review of some Er3+-activated photonic structures fabricated by sol gel route and rf sputtering deposition. In the discussion on the sol-gel approach we focus our attention on the silica-hafnia binary system presenting an overview concerning fabrication protocols and structural, optical and spectroscopic assessment of SiO2-HfO2 waveguides activated by Er3+ ions. In order to put in evidence the reliability and versatility of the sol-gel route for photonics applications four different confined structures are briefly presented: amorphous waveguides, coated microspheres, monolithic waveguide laser, and core-shell nanospheres. As examples of rf sputtering technique, we will discuss Er3+-activated silica-hafnia and silica-germania waveguides, the latter system allowing fabrication of integrated optics structures by UV photo-imprinting. Finally, two examples of photonic crystal structures, one prepared by sol-gel process and the other one fabricated by rf sputtering deposition, will be illustrated.