1. Recent advances in the Sandia EUV 10x microstepper
- Author
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Richard H. Stulen, Yon E. Perras, Rodney P. Nissen, Daniel A. Tichenor, John E. M. Goldsmith, Gregory Frank Cardinale, Kevin D. Krenz, Daniel R. Folk, Alfred A. Ver Berkmoes, Joel R. Darnold, John B. Wronosky, Tony G. Smith, Avijit K. Ray-Chaudhuri, Craig C. Henderson, Donna J. O'Connell, Karen J. Jefferson, Glenn D. Kubiak, Kurt W. Berger, Steven J. Haney, Luis J. Bernardez, and Pamela K. Barr
- Subjects
Wavefront ,Engineering ,Software ,Optics ,business.industry ,Extreme ultraviolet lithography ,Process (computing) ,Aerospace engineering ,Photomask ,business ,Lithography ,Aerial image ,Graphical user interface - Abstract
The Sandia EUV 10x microstepper system is the result of an evolutionary development process, starting with a simple 20x system, progressing through an earlier 10x system, to the current system that has full microstepper capabilities. The 10x microstepper prints 400-micrometers -diameter fields at sub- 0.10-micrometers resolution. Upgrades include the replacement of the copper wire target with a pulsed xenon jet target, construction of an improved projection optics system, the addition of a dose monitor a d an aerial image monitor, and the addition of a graphical user interface to the system operation software. This paper provides an up-to-date report on the status of the microstepper.
- Published
- 1998