6 results on '"Alcalá Penadés, Germán"'
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2. Thin film nanostructuring at oblique angles by substrate patterning
- Author
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Muñoz-Piña, Sandra, Márquez Alcaide, Antonio José, Limones-Ahijón, Blanca, Oliva Ramírez, Manuel, Rico Gavira, Victor Joaquín, Alcalá Penadés, Germán, González Sagardoy, Maria Ujué, García-Martín, José Miguel, Álvarez Molina, Rafael, Wang, Dong, Schaaf, Peter, Rodríguez González-Elipe, Agustín, Palmero Acebedo, Alberto, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Ministerio de Ciencia, Innovación y Universidades (España), Agencia Estatal de Investigación (España), European Commission, Junta de Andalucía, Consejo Superior de Investigaciones Científicas (España), Comunidad de Madrid, Universidad de Sevilla, and German Research Foundation
- Subjects
Substrate patterning ,Oblique angle deposition ,Porous thin films ,Nanostructured thin films ,Materials Chemistry ,Surfaces and Interfaces ,General Chemistry ,Condensed Matter Physics ,Magnetron sputtering ,Surfaces, Coatings and Films - Abstract
It is demonstrated that, besides classical nanocolumnar arrays, the oblique angle geometry induces the growth of singular structures in the nanoscale when using wisely designed patterned substrates. Well-ordered array of crosses, cylindrical nanorods or hole structures arranged in square or hexagonal regular geometries are reported as examples, among others. The fundamental framework connecting substrate topography and film growth at oblique angles is presented, allowing the use of substrate patterning as a feasible thin film nanostructuring technique. A systematic analysis of the growth of TiO2 thin films on 4 different lithographic patterned substrates in 4 different scale lengths is also presented. A first conclusion is the existence of a height-based selective growth in the initial stages of the deposition, by which the film preferentially develops on top of the tallest substrate features. This behavior is maintained until the film reaches a critical thickness, the so-called Oblivion Thickness, above which the film topography becomes gradually independent of the substrate features. A general formula relating the spatial features of the pattern, the coarsening exponent and the Oblivion Thickness has been deduced., The authors thank the financial support from MCIN/AEI/10.13039/ 501100011033 projects PID2019-110430GB-C21, PID2020-112620GBI00, PID2020-114270RA-I00 and RTI2018-098117-B-C21 (also financed by FEDER Una manera de hacer europa), the Junta de Andalucía (PAIDI- 2020 through projects P18-RT-3480 and P18-RT-6079, and through its 2019 PhD Researcher Hiring Program), the CSIC (2019AEP161 and 201860E050), the Regional Government of Madrid (project IND2017/ IND-7668 and YEI contract PEJ-2019-AI/IND-14451 with support from FSE), the H2020-EU.1.2.1-FET OPEN program (grant 899352, project SOUNDofICE, and the EFRE Infra-Pro project ChAMP), and the University of Seville (VI PPIT-US). The work is supported by the Deutsche Forschungsgemeinschaft (DFG, grant Scha 632/24, “Tailored Disorder” and Scha 632/27, “DFGGer ¨atezentrum”). This work is also supported by the free state of Thuringia under grants 2015 FGI 0025 305 (FastμXRD) and B715-10009 (BioMacroNano2020), all co-financed by the European Union within the framework of the European Regional Development Fund (ERDF). The service from the MiNa Laboratory at IMN-CNM (CSIC), funded from CM (project S2018/NMT-4291 TEC2SPACE), MINECO (project CSIC13-4E- 1794) and EU (FEDER, FSE), is also acknowledged.
- Published
- 2022
3. Thin film nanostructuring at oblique angles by substrate patterning
- Author
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Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Muñoz-Piña, Sandra, Márquez Alcaide, Antonio José, Limones-Ahijón, Blanca, Oliva Ramírez, Manuel, Rico Gavira, Victor Joaquín, Alcalá Penadés, Germán, González Sagardoy, Maria Ujué, García-Martín, José Miguel, Álvarez Molina, Rafael, Wang, Dong, Schaaf, Peter, Rodríguez González-Elipe, Agustín, Palmero Acebedo, Alberto, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Muñoz-Piña, Sandra, Márquez Alcaide, Antonio José, Limones-Ahijón, Blanca, Oliva Ramírez, Manuel, Rico Gavira, Victor Joaquín, Alcalá Penadés, Germán, González Sagardoy, Maria Ujué, García-Martín, José Miguel, Álvarez Molina, Rafael, Wang, Dong, Schaaf, Peter, Rodríguez González-Elipe, Agustín, and Palmero Acebedo, Alberto
- Abstract
It is demonstrated that, besides classical nanocolumnar arrays, the oblique angle geometry induces the growth of singular structures in the nanoscale when using wisely designed patterned substrates. Well-ordered array of crosses, cylindrical nanorods or hole structures arranged in square or hexagonal regular geometries are reported as examples, among others. The fundamental framework connecting substrate topography and film growth at oblique angles is presented, allowing the use of substrate patterning as a feasible thin film nanostructuring technique. A systematic analysis of the growth of TiO2 thin films on 4 different lithographic patterned substrates in 4 different scale lengths is also presented. A first conclusion is the existence of a height-based selective growth in the initial stages of the deposition, by which the film preferentially develops on top of the tallest substrate features. This behavior is maintained until the film reaches a critical thickness, the so-called Oblivion Thickness, above which the film topography becomes gradually independent of the substrate features. A general formula relating the spatial features of the pattern, the coarsening exponent and the Oblivion Thickness has been deduced.
- Published
- 2022
4. Editorial for Special Issue: Nanostructured Surfaces and Thin Films Synthesis by Physical Vapor Deposition
- Author
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Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Palmero Acebedo, Alberto, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Palmero Acebedo, Alberto, Alcalá Penadés, Germán, and Álvarez Molina, Rafael
- Published
- 2021
5. Growth of nanocolumnar thin films on patterned substrates at oblique angles
- Author
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Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Universidad de Sevilla. FQM280: Física no Lineal, García-Valenzuela, Aurelio, Muñoz-Piña, Sandra, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Lacroix, Bertrand, Santos, Antonio J, Cuevas-Maraver, Jesús, Rico Gavira, Víctor Joaquín, Gago, Raúl, Vázquez Burgos, Luis, Cotrino Bautista, José, Rodríguez González-Elipe, Agustín, Palmero Acebedo, Alberto, Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear, Universidad de Sevilla. Departamento de Química Inorgánica, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Universidad de Sevilla. FQM280: Física no Lineal, García-Valenzuela, Aurelio, Muñoz-Piña, Sandra, Alcalá Penadés, Germán, Álvarez Molina, Rafael, Lacroix, Bertrand, Santos, Antonio J, Cuevas-Maraver, Jesús, Rico Gavira, Víctor Joaquín, Gago, Raúl, Vázquez Burgos, Luis, Cotrino Bautista, José, Rodríguez González-Elipe, Agustín, and Palmero Acebedo, Alberto
- Abstract
The influence of one dimensional substrate patterns on the nanocolumnar growth of thin films deposited by magnetron sputtering at oblique angles is theoretically and experimentally studied. A well‐established growth model has been used to study the interplay between the substrate topography and the thin film morphology. A critical thickness has been defined, below which the columnar growth is modulated by the substrate topography, while for thicknesses above, the impact of substrate features is progressively lost in two stages; first columns grown on taller features take over neighboring ones, and later the film morphology evolves independently of substrate features. These results have been experimentally tested by analyzing the nanocolumnar growth of SiO2 thin films on ion‐induced patterned substrates.
- Published
- 2019
6. Presentación del prototipo final a la Competición 'Chem-E-Car' en el 10º Congreso Mundial de Ingeniería Química
- Author
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Negro Álvarez, Carlos Manuel, Monte Lara, M. Concepción, Fuente González, Elena de la, Blanco Suárez, M. Ángeles, Miranda Carreño, Rubén, Tijero Cruz, Antonio, Balea Martín, Ana, Merayo Cuevas, Noemí, Campano Tiedra, Cristina, López Expósito, Patricio Roberto, Plaza Rodríguez, Jesús, García-Ochoa Soria, Félix, Ladero Galán, Miguel, Senit Velasco, Juan José, Velasco Conde, Daniel, Pérez Trujillo, Francisco Javier, Alcalá Penadés, Germán, Mato Díaz, M. Sonia, Santos Barahona, Héctor, Lasanta Carrasco, M. Isabel, Miguel Gamo, M. Teresa de, García Martín, Gustavo, Illana Sánchez, Andrea, Bolívar Tejedo, Pilar, Carlucci, Maurizio Antonio, Morona Murillo, Lorena, Amo Salgado, Pablo del, Márquez Negro, Alejandro, Ara Jimeno, Pablo, Resino Guirao, Jesús, Alberola Sánchez, Raúl, Galán Galán, Alicia, Espinosa García, Lucía, Pedregal Sáez, Antonio, Fernández Rodríguez, Gemma, Arsuaga Cao, Pablo, Martín Jiménez, Diego, Arriba Gutiérrez, Héctor, Navarro Torres, Jorge, Sancho González, Luis, Negro Álvarez, Carlos Manuel, Monte Lara, M. Concepción, Fuente González, Elena de la, Blanco Suárez, M. Ángeles, Miranda Carreño, Rubén, Tijero Cruz, Antonio, Balea Martín, Ana, Merayo Cuevas, Noemí, Campano Tiedra, Cristina, López Expósito, Patricio Roberto, Plaza Rodríguez, Jesús, García-Ochoa Soria, Félix, Ladero Galán, Miguel, Senit Velasco, Juan José, Velasco Conde, Daniel, Pérez Trujillo, Francisco Javier, Alcalá Penadés, Germán, Mato Díaz, M. Sonia, Santos Barahona, Héctor, Lasanta Carrasco, M. Isabel, Miguel Gamo, M. Teresa de, García Martín, Gustavo, Illana Sánchez, Andrea, Bolívar Tejedo, Pilar, Carlucci, Maurizio Antonio, Morona Murillo, Lorena, Amo Salgado, Pablo del, Márquez Negro, Alejandro, Ara Jimeno, Pablo, Resino Guirao, Jesús, Alberola Sánchez, Raúl, Galán Galán, Alicia, Espinosa García, Lucía, Pedregal Sáez, Antonio, Fernández Rodríguez, Gemma, Arsuaga Cao, Pablo, Martín Jiménez, Diego, Arriba Gutiérrez, Héctor, Navarro Torres, Jorge, and Sancho González, Luis
- Abstract
El proyecto consistió en la presentación del prototipo Chem-E-Car desarrollado en la UCM en la competición mundial que se celebró durante el transcurso del Congreso Mundial de Ingeniería Química (Barcelona, 30 septiembre-2 de octubre de 2017).
- Published
- 2019
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