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Effluent wastewater from industrial processes needs to be properly treated before being discharged into the environment. Conventional procedures for handling this wastewater can be problematic due to the presence of toxic elements, time constraints, and complexity. However, a new electrochemical procedure has been developed as an effective method for remediation. In a recent study, refinery wastewater was successfully treated using an electrochemical technique combined with ultrasonic irradiation and photocatalysis. The study found that electrocoagulation, which uses cheap and recyclable metal electrodes, was a simple, efficient, practical, and cost-effective way to handle refinery wastewater. Various parameters were investigated, including electrode metals, operating time, applied voltage, pH, inter-electrode gap, and temperature. The aim was to determine the optimal configuration for pollutant removal. The study also focused on the synergistic effects of combining electrocoagulation and photocatalysis to improve the efficiency of contaminant removal in oily wastewater. By integrating these two treatment technologies, the researchers aimed to enhance pollutant removal rates, energy efficiency, and overall system performance. The research provided valuable insights into the feasibility, optimization parameters, and applicability of the electrocoagulation-photocatalysis process for remediating organic contaminants in oily wastewater industrial effluents. The results showed that electrocoagulation, especially when combined with ultrasonic irradiation and TiO2 photocatalysis, was highly effective in pollutant removal within a short timeframe. These findings support the implementation of this procedure for remediating most industrial wastewater.In conclusion, the study contributes to the development of more effective and sustainable water treatment strategies. The electrocoagulation-photocatalysis process shows promise in addressing the remediation of organic contaminants in oily wastewater from industrial processes. [ABSTRACT FROM AUTHOR]

Silylenes (silanediyls) have made an important impact on organosilicon chemistry even if it is of more recent foundation than carbenes in organic chemistry and much less complete. These species are highly reactive intermediates. They play a central role in the chemical vapour deposition (CVD) of various silicon-containing thin films which have a technological importance in microelectronics as well as in the dry etching processes of silicon wafers. Spectroscopic methods have been developed to observe these species, a necessary pre-requisite to their direct monitoring. In this work, deuterated phenylsilane precursor, PhSiD3 was chosen for SiD2 because its analogue phenylsilane, PhSiH3 proved to be a good precursor for SiH2 and the high quality decay signals observed revealed that SiD2 be readily detected from PhSiD3 and that if other decomposition pathways (e.g. PhSiD + D2) are occurring, they do not effect measurements of the rate constants for SiD2. The absorption spectrum of SiD2 formed from the flash photolysis of a mixture of PhSiD3 and SF6 at 193nm were found in the region 17384-17391 cm-1 with strong band at 17387.07 cm-1. This single rotational line of pQ1 was chosen to monitor SiD2 removal. Time-resolved studies of SiD2 have been carried out to obtain rate constants for its bimolecular reactions with D2. The reactions were studied over the pressure range 5-100 Torr (in SF6 bath gas) at four temperatures in the range 298-498K. Single decay from 10 photolysis laser shots were averaged and found to give reasonable first-order kinetics fits. Second order kinetics were obtained by pressure dependence of the pseudo first order decay constants and substance D2 pressures within experimental error. The reaction was found to be weakly pressure dependent at all temperatures, consistent with a third-body mediated association process. In addition, SiH2+ H2 reaction is approximately ca. 60% faster than SiD2+D2 reaction. Theoretical extrapolations (using Lindemann-Hinshelwood model and Rice, Ramsperger, Kassel and Marcus (RRKM) theory) were also carried out and obtained data fitted the Arrhenius equations.

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Time-resolved investigation of deuterium-substituted silylene (SiD2) generated by laser flash photolysis of deuterium-substituted phenylsilane (PhSiD3) was carried out to obtain rate constants for its bimolecular reaction with ethylene (C2H4). The reaction was studied in the gas phase over the pressure range of 1-100 Torr (in SF6 bath gas) at 295 K. The rate constants for SiD2 + C2H4 were found to be independent of pressure and close in magnitude to the rate constants for the reaction of SiH2 + C2H4 at the high-pressure limit. They are consistent with a rapid isotopic scrambling mechanism similar to that of SiH2 + C2D4. While silirane, the main product produced from this reaction, was too labile to be detected, vinylsilane, another possible product, was ruled out by gas chromatography analysis. This reaction shows similarities to those of SiH2 + H2 and its isotopic counterparts. [ABSTRACT FROM AUTHOR]