401. Microstructure, infrared optical properties and thermal stability of ZrB2 and double-layer-structure Al2O3/ZrB2 thin films by magnetron sputtering technique.
- Author
-
Zhang, Min, Ma, Xiaodong, Yin, Juhang, Zhang, Yin, Zhang, Li, Wen, Jing, Dai, Linglu, Kuang, Renxiong, Chen, Haiyan, Weng, Xiaolong, Zhao, Xiaohui, Liang, Difei, Xie, Jianliang, and Deng, Longjiang
- Subjects
- *
MAGNETRON sputtering , *THIN films , *EMISSIVITY , *THERMAL stability , *OPTICAL properties , *THERMAL properties - Abstract
• Al 2 O 3 /ZrB 2 thin films exhibit a favorable thermal stability at 600 °C for 30 h. • Al 2 O 3 /ZrB 2 thin films exhibit a high average infrared reflectance of 0.86 after annealing at 750 °C for 2 h. • Al 2 O 3 thin film can effectively prevent diffusion of oxygen atoms during the heat treatment process. In the present research, ZrB 2 thin films and Al 2 O 3 /ZrB 2 multilayer were deposited on silicon substrates using magnetron sputtering method. To investigate the thermal stability of the thin films, films were annealed at temperatures of 600 °C, 700 °C and 800 °C, respectively. Results from X-ray powder diffraction (XRD), scanning electron microscopy (SEM), and Fourier transform infrared spectrometer (FTIR) suggested that ZrB 2 thin films were severely oxidized at 700 °C for 2 h which caused the obvious increase of infrared emissivity. In contrast, double-layer-structure Al 2 O 3 /ZrB 2 thin films exhibited a low infrared emissivity of 0.16 after annealing at 750 °C for 2 h. Similarity, ZrB 2 thin films showed a rise of infrared emissivity after annealing at 600 °C for 10 h. However, double-layer-structure Al 2 O 3 /ZrB 2 thin films exhibited a favorable thermal stability at 600 °C for 30 h with a low average infrared emissivity of 0.13 in the waveband of 2–14 μm. Compared with ZrB 2 thin films, double-layer-structure Al 2 O 3 /ZrB 2 thin films could work as low infrared emissivity layers at higher temperature for longer time for the reason that the addition of Al 2 O 3 thin film can effectively prevent diffusion of oxygen in air during the heat treatment process. [ABSTRACT FROM AUTHOR]
- Published
- 2020
- Full Text
- View/download PDF