962 results on '"Yamauchi, Kazuto"'
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402. High-spatial-resolution scanning x-ray fluorescence microscope with Kirkpatrick-Baez mirrors
403. At-wavelength figure metrology of total reflection mirrors in hard x-ray region
404. Single-Shot Spectrometry for X-Ray Free-Electron Lasers
405. Highly resolved scanning tunneling microscopy study of Si(0 0 1) surfaces flattened in aqueous environment
406. At-wavelength figure metrology of hard x-ray focusing mirrors
407. Atomic-Scale Evaluation of Si(111) Surfaces Finished by the Planarization Process Utilizing SiO[sub 2] Particles Mixed with Water
408. Development of the Cleaning Method Using High-Speed Shear Flow of Ultrapure Water (2nd Report)
409. Elastic Emission Machining for the Fabrication of X-Ray and EUV Mirrors
410. Development of Cleaning Method Using High-Speed Shear Flow of Ultrapure Water
411. Study of Cleaning Method for Si Substrate Using High-Speed Shear Flow of Ultrapure Water
412. Effect of Particle Morphology on Removal Rate and Surface Topography in Elastic Emission Machining
413. Electrochemical Etching Using Surface-Sulfonated Electrodes in Ultrapure Water
414. Wave-optical evaluation of interference fringes and wavefront phase in a hard-x-ray beam totally reflected by mirror optics
415. Electrochemical etching using surface carboxylated graphite electrodes in ultrapure water
416. Hard x-ray nano-focusing at 40nm level using K-B mirror optics for nanoscopy/spectroscopy
417. Results of x-ray mirror round-robin metrology measurements at the APS, ESRF, and SPring-8 optical metrology laboratories
418. Morphological Stability of Si(001) Surface Immersed in Fluid Mixture of Ultrapure Water and Silica Powder Particles in Elastic Emission Machining
419. Element Array by Scanning X-ray Fluorescence Microscopy after Cis-Diamminedichloro-Platinum(II) Treatment
420. Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50nm
421. Hard X-ray Diffraction-Limited Nanofocusing with Kirkpatrick-Baez Mirrors
422. Preparation of ultrasmooth and defect-free 4H-SiC(0001) surfaces by elastic emission machining
423. Relative angle determinable stitching interferometry for hard x-ray reflective optics
424. Creation of perfect surfaces
425. The Influence of Particle Morphology on the Si(001) Surface in EEM (Elastic Emission Machining)
426. The Influence of EEM (Elastic Emission Machining) Fluid on Si(001) Surface Morphology
427. Focusing Hard X-rays to Sub-50 nm Size by Elliptically Figured Mirror
428. Fabrication of Ultraprecisely Figured Elliptical Mirror for Nano-Focusing of Hard X-ray and Evaluation of Focusing Properties
429. Stitching Interferometry for Surface Figure Measurement of X-ray Reflective Optics
430. Smoothing 4H-SiC (0001) surface by EEM (Elastic Emission Machining)
431. Wave-optical and ray-tracing analysis to establish a compact two-dimensional focusing unit using K-B mirror arrangement
432. Microstitching interferometry for nanofocusing mirror optics
433. Image quality improvement in a hard X-ray projection microscope using total reflection mirror optics
434. Fabrication technology of hard x-ray aspherical mirror optics and application to nanospectroscopy
435. Development of a figure correction method having spatial resolution close to 0.1 mm
436. Flattening Si (001) surface by EEM (Elastic Emission Machining)
437. Flattening of Si (001) Surface by EEM (Elastic Emission Machining)
438. Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining
439. Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining
440. Microstitching interferometry for x-ray reflective optics
441. Development of the Measurement System with Interferometers for Ultraprecise X-ray Mirror
442. Wave-optical evaluation of reflected X-ray intensity and wavefront distribution in total reflection hard X-ray by mirror optics.
443. Fabrication of a 400-mm-long mirror for focusing x-ray free-electron lasers to sub-100 nm.
444. Atomic-scale Characterization of HF-treated 4H-SiC(0001)1×1 Surfaces by Scanning Tunneling Microscopy.
445. Fabrication of Ultraprecisely Figured Mirror for Nano Focusing Hard-x-ray.
446. Novel Abrasive-free Planarization of Si and SiC using Catalyst.
447. Aspheric Surface Fabrication in nm-level Accuracy by Numerically Controlled Plasma Chemical Vaporization Machining (CVM) and Elastic Emission Machining (EEM)
448. Wave-optical analysis of submicron focus of hard x-ray beams by reflective optics
449. Submicron focusing of hard x-ray beam by elliptically figured mirrors for scanning x-ray microscopy
450. Figuring with subnanometer-level accuracy by numerically controlled elastic emission machining
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