962 results on '"Yamauchi, Kazuto"'
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352. Requirements on hard x-ray grazing incidence optics for European XFEL: analysis and simulation of wavefront transformations
353. Termination dependence of surface stacking at4H-SiC(0001)−1×1: Density functional theory calculations
354. Feasibility study of high-resolution coherent diffraction microscopy using synchrotron x rays focused by Kirkpatrick–Baez mirrors
355. Tolerance Design of Logarithmic Roller Profiles in Cylindrical Roller Bearings
356. Development of Long Focusing Mirror for X-ray Free Electron Laser
357. Optimized Logarithmic Roller Crowning Design of Cylindrical Roller Bearings and Its Experimental Demonstration
358. Optimized Radius of Roller Large End Face in Tapered Roller Bearings(Machine Elements, Design and Manufacturing)
359. Journal of the Japan Society for Precision Engineering
360. A Study on a Surface Preparation Method for Single-Crystal SiC Using an Fe Catalyst
361. Element-specific hard x-ray diffraction microscopy
362. Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide
363. New Chemical Planarization of SiC and GaN Using an Fe Plate in H2O2 Solution
364. Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining
365. Damage-Free Planarization of 2-Inch 4H-SiC Wafer Using Pt Catalyst Plate and HF Solution
366. Fabrication of a 400-mm-long mirror for focusing x-ray free-electron lasers to sub-100 nm
367. Development of adaptive mirror for wavefront correction of hard x-ray nanobeam
368. Focusing mirror for x-ray free-electron lasers
369. Ultraprecision finishing technique by numerically controlled sacrificial oxidation
370. Processing efficiency of elastic emission machining for low‐thermal‐expansion material
371. Coherent x‐ray diffraction measurements of Cu thin lines
372. Highly accurate differential deposition for X‐ray reflective optics
373. Direct determination of the wave field of an x-ray nanobeam
374. Defect-Free Planarization of 4H–SiC(0001) Substrate Using Reference Plate
375. Plasma Chemical Vaporization Machining and Elastic Emission Machining
376. Experimental Comparison Between Partially Crowned and Logarithmic Roller Profiles in Cylindrical Roller Bearings
377. Atomically Controlled Fabrication Process as the Next Generation Ultra-precision Machining Technology
378. Stitching interferometric metrology for steeply curved x-ray mirrors
379. Catalyst-referred etching of 4HSiC substrate utilizing hydroxyl radicals generated from hydrogen peroxide molecules
380. Hard x-ray wavefront measurement and control for hard x-ray nanofocusing
381. Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long x-ray mirror
382. Damage-Free Planarization of 4H-SiC (0001) by Catalyst-Referred Etching
383. Polishing Characteristics of 4H-SiC Si-Face and C-Face by Plasma Chemical Vaporization Machining
384. Fabrication of ultrathin and highly uniform silicon on insulator by numerically controlled plasma chemical vaporization machining
385. Atomic-scale flattening of SiC surfaces by electroless chemical etching in HF solution with Pt catalyst
386. Efficient focusing of hard x rays to 25nm by a total reflection mirror
387. Atomic-scale Characterization of HF-treated 4H-SiC(0001)1×1 Surfaces by Scanning Tunneling Microscopy
388. Removal properties of low-thermal-expansion materials with rotating-sphere elastic emission machining
389. Hard X-ray Focusing less than 50nm for Nanoscopy/spectroscopy
390. Fabrication of damascene Cu wirings using solid acidic catalyst
391. Catalyst-referred etching of silicon
392. Fabrication of X-ray Mirror for Hard X-ray Diffraction Limited Nanofocusing
393. Ultraprecision Machining Method for Ultraprecise Aspherical Mirror
394. Surface Gradient Integrated Profiler for X-ray and EUV Optics—Calibration of the rotational angle error of the rotary encoders
395. Development of a Scanning X-ray Fluorescence Microscope Using Size-Controllable Focused X-ray Beam from 50 to 1500nm
396. Global High-Accuracy Intercomparison of Slope Measuring Instruments
397. Atomic inner-shell laser at 1.5-ångström wavelength pumped by an X-ray free-electron laser.
398. A novel branched TAT47–57 peptide for selective Ni2+ introduction into the human fibrosarcoma cell nucleus.
399. Investigation of the Surface Removal Process of Silicon Carbide in Elastic Emission Machining
400. Ultraprecision Machining Utilizing Numerically Controlled Scanning of Localized Atmospheric Pressure Plasma
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