351. Growth-interruption-induced low-density InAs quantum dots on GaAs
- Author
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Li, L., Chauvin, N.J.G., Patriarche, G., Alloing, B., Fiore, A., Li, L., Chauvin, N.J.G., Patriarche, G., Alloing, B., and Fiore, A.
- Abstract
We investigate the use of growth interruption to obtain low-density InAs quantum dots (QDs) on GaAs. The process was realized by Ostwald-type ripening of a thin InAs layer. It was found that the optical properties of the QDs as a function of growth interruption strongly depend on InAs growth rate. By using this approach, a low density of QDs (4 dots/ µm2) with uniform size distribution was achieved. As compared to QDs grown without growth interruption, a larger energy separation between the QD confined levels was observed, suggesting a situation closer to the ideal zero-dimensional system. Combining with an InGaAs capping layer such as In-rich QDs enable 1.3 µm emission at 4 K.
- Published
- 2008