301. Influence of chemical composition and deposition conditions on microstructure evolution during annealing of arc evaporated ZrAlN thin films
- Author
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Mats Johansson, Naureen Ghafoor, Lina Rogström, Magnus Odén, and Lars Hultman
- Subjects
Materials science ,Annealing (metallurgy) ,Nucleation ,Recrystallization (metallurgy) ,Surfaces and Interfaces ,Condensed Matter Physics ,Microstructure ,Grain size ,Surfaces, Coatings and Films ,Crystallography ,Vacuum deposition ,Residual stress ,Thin film ,Composite material - Abstract
The influence of substrate bias and chemical composition on the formed microstructure and resulting hardness of arc evaporated Zr1−xAlxN films in the compositional span 0.12≤ x ≤0.74 is investigated. A cubic ZrAlN phase is formed at low aluminum contents (x ≤ 0.38) whereas for a high Al-content, above x = 0.70, a single-phase hexagonal structure is obtained. For intermediate Al-contents, a two-phase structure is formed. The cubic structured films exhibit higher hardness than the hexagonal structured ones. A low bias results in N-rich films with a partly defect-rich microstructure while a higher substrate bias decreases the grain size and increases the residual stress in the cubic ZrAlN films. Recrystallization and out-diffusion of nitrogen from the lattice in the cubic ZrAlN films takes place during annealing at 800 °C, which results in an increased hardness. The cubic ZrAlN phase is stable to annealing temperatures of 1000 °C while annealing at higher temperature results in nucleation and growth of hexag...
- Published
- 2012
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