1,019 results on '"Fujita, Shizuo"'
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302. Structural Design of Flexible Electric Devices on Polymer Substrates and Application to Organic FET
303. Fabrication of Organic Small Molecular Thin Films based on Ultrasonic Spray-Assisted Vapor-Deposition Method
304. Photocurrent and Persistent Photoconductivity in Zinc Oxide Thin-Film Transistors under Ultraviolet-Light Irradiation
305. Study on oxygen source and its effect on film properties of ZnO deposited by radio frequency magnetron sputtering
306. Extraction of Trap Densities in ZnO Thin-Film Transistors and Dependence on Oxygen Partial Pressure During Sputtering of ZnO Films
307. Surface Potential Measurement of Tris(8-hydroxyquinolinato)aluminum and Bis[N-(1-naphthyl)-N-phenyl]benzidine Thin Films Fabricated on Indium–Tin Oxide by Kelvin Probe Force Microscopy
308. Reduction of Photo-Leakage Current in ZnO Thin-Film Transistors With Dual-Gate Structure
309. Effects of chemical stoichiometry of channel region on bias instability in ZnO thin-film transistors
310. Positive Bias Instability of Bottom-Gate Zinc Oxide Thin-Film Transistors with a SiOx/SiNx-Stacked Gate Insulator
311. Ultrasonic Spray-Assisted Solution-Based Vapor-Deposition of Aluminum Tris(8-hydroxyquinoline) Thin Films
312. Preface: Phys. Status Solidi C 8/2
313. Growth of SnO 2 crystalline thin films by mist chemical vapour deposition method
314. Fabrication of PEDOT:PSS/ZnMgO Schottky‐type ultraviolet sensors on glass substrates with solution‐based mist deposition technique and hard‐mask patterning
315. Fundamental Properties and Optical Device Applications of ZnO
316. Journal of the Society of Materials Science, Japan
317. ZnO Thin-Film Transistors with SiNx/SiOx Stacked Gate Insulators: Trap Densities and N2O Flow Rate Dependence
318. Fabrication of Lithium-Based Oxide Thin Films by Ultrasonic-Assisted Mist CVD Technique
319. Analysis of subthreshold photo-leakage current in ZnO thin-film transistors using indium-ion implantation
320. Analysis of Hump Characteristics in Thin-Film Transistors With ZnO Channels Deposited by Sputtering at Various Oxygen Partial Pressures
321. Mechanism analysis of photoleakage current in ZnO thin-film transistors using device simulation
322. Corundum‐structured α‐phase Ga 2 O 3 ‐Cr 2 O 3 ‐Fe 2 O 3 alloy system for novel functions
323. Growth characteristics of single‐crystalline ZnMgO layers by ultrasonic spray assisted mist CVD technique
324. Photo-Leakage Current of Zinc Oxide Thin-Film Transistors
325. Application of Organoboron Polymer to Multi Layered Two-Photon Absorption Optical Memory
326. Artificial Surface Control of Gallium Oxide Semiconductors and Growth of High Quality Single-crystalline Thin Films
327. 69.1: Photo-Leakage Current in ZnO TFTs for Transparent Electronics
328. Step-Flow Homoepitaxial Growth of Zinc Oxide Semiconductor Thin Films with A Vapor-Growth Method
329. Fabrication by Mist CVD Method and Evaluation of Corundum Structured Oxide Semiconductor Thin Films
330. Epitaxial ZnO Thin Films ona-Plane Sapphire Substrates Grown by Ultrasonic Spray-Assisted Mist Chemical Vapor Deposition
331. UV-B Sensor Based on a SnO2Thin Film
332. β-Al2xGa2-2xO3Thin Film Growth by Molecular Beam Epitaxy
333. Fabrication of Highly Crystalline Corundum-Structured α-(Ga1-xFex)2O3Alloy Thin Films on Sapphire Substrates
334. Wet Etching of β-Ga2O3 Substrates
335. Flame Detection by a β-Ga2O3-Based Sensor
336. Mist Deposition Technique as a Green Chemical Route for Synthesizing Oxide and Organic Thin Films
337. Corrigendum: “Initial nucleation scheme of Ga2O3 on (0001) sapphire by mist CVD for the growth of α -phase” [Jpn. J. Appl. Phys. 60 , 055501 (2021) ].
338. Mist CVD Growth of ZnO-Based Thin Films and Nanostructures
339. Growth of ZnO Nanostructures by Using Ultrasonic Spray Chemical Vapor Deposition with a Au Catalyst
340. Step-flow growth of homoepitaxial ZnO thin films by ultrasonic spray-assisted MOVPE
341. Enhancement of electron mobility in ZnO layers with applying ultrasonic spray-assisted MOVPE and buffer layers
342. Heteroepitaxy of Corundum-Structured α-Ga2O3Thin Films on α-Al2O3Substrates by Ultrasonic Mist Chemical Vapor Deposition
343. Atomically controlled surfaces with step and terrace of β-Ga2O3 single crystal substrates for thin film growth
344. Ultraviolet optical functions of ZnO and Ga 2 O 3 thin films
345. Non-Linear Optical Effects in Au Nanoparticle-Deposited ZnO Nanocrystalline Films
346. Catalyst-Free Synthesis of ZnO Nanorods on Metal Substrates by Using Thermal Chemical Vapor Deposition
347. Surface morphology of homoepitaxial β-Ga2O3 thin films grown by molecular beam epitaxy
348. An approach for single crystalline zinc oxide thin films with fine channel mist chemical vapor deposition method
349. Properties of Ga 2 O 3 ‐based (InxGa1– x) 2 O 3 alloy thin films grown by molecular beam epitaxy
350. Growth of Crystalline Zinc Oxide Thin Films by Fine-Channel-Mist Chemical Vapor Deposition
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