251. A simple method for monolithic fabrication of InGaAsP/GaAs lasers
- Author
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Shoichi Kurita, N. Shin‐ichi Takahashi, Toyotoshi Machida, Toshio Ito, Joji Ishikawa, and Takashi Aramaki
- Subjects
Fabrication ,Materials science ,business.industry ,General Physics and Astronomy ,Semiconductor device ,Integrated circuit ,Cladding (fiber optics) ,Laser ,Semiconductor laser theory ,law.invention ,law ,Etching (microfabrication) ,Optoelectronics ,business ,Current density - Abstract
A simple method for the fabrication of Fabry–Perot mirrors of InGaAsP/GaAs lasers is presented. The vertical and smooth wall etching is done for active layers only (not for both active and cladding layers), by an H2SO4:H2O2:H2O=3:1:1 etchant for 2–5 s. Since the active layers are much thinner than the cladding layers, the etching becomes much easier. The threshold current density of the etched mirror laser is ∼4.4 kA/cm2, about 1.1 times that of the cleaved laser, and the mirror reflectivity is evaluated as 29.4% (cleaved 31.4%).
- Published
- 1988