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Two patients are described in this article who developed fractures of transvenous endocardial pacing leads at the point of passage across the tricuspid valve. In one case life-threatening asystole occurred, emphasizing the potential seriousness of this complication.

This paper describes and discusses a consultancy project which was concerned with identifying a successful future for an ailing journal. The paper emphasises that part of the project which involved problem construction and discusses the use of cognitive mapping as an aid to defining the nature of a policy problem which involves conflicting and qualitative views of the problem.

In the last couple of years, O.R. workers have expressed interest in the use of repertory grids as a part of their armoury for tackling messy problems in organizations. This paper is designed to describe some of our experiences of using grids to aid the process of problem construction. It will also express some of our views of the theoretical and technical aspects of their use for working on problems. The principles behind the use of grids invite the design of other methods for managing qualitative problem data. The paper will briefly introduce some we have found helpful.

A new multilayer resist process consisting of a thin antireflective (AR) film between the thick bottom PMMA layer and the top photoresist layer of the conventional bilayer resist process is reported in this paper. Aluminum features of micron and submicron size over topography have been achieved with this novel resist process by using a conventional 10:1 reduction GCA DSW 4800 stepper to expose the top photoresist layer. Excellent linewidth control over steps is demonstrated. Both the standing wave effect in the top resist layer and the interference from the light scattered by the substrate topography are eliminated in this AR coating approach. The mixing of the two resist layers encountered in the original bilayer resist process does not appear in this new process. The plasma etch resistance of this new multilayer resist process is improved by retaining the capping top photoresist layer, which also eliminates the delamination of the AR layer during the PMMA development. This novel resist process provides ...