522 results on '"Mimura, Hidekazu"'
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202. Catalyst-referred etching of 4HSiC substrate utilizing hydroxyl radicals generated from hydrogen peroxide molecules
203. Hard x-ray wavefront measurement and control for hard x-ray nanofocusing
204. Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long x-ray mirror
205. Fabrication of ultrathin and highly uniform silicon on insulator by numerically controlled plasma chemical vaporization machining
206. Atomic-scale flattening of SiC surfaces by electroless chemical etching in HF solution with Pt catalyst
207. Efficient focusing of hard x rays to 25nm by a total reflection mirror
208. Element-Specific Hard X-ray Micro-Magnetometry to Probe Anisotropy in Patterned Magnetic Films
209. Hard X-ray Focusing less than 50nm for Nanoscopy/spectroscopy
210. Fabrication of X-ray Mirror for Hard X-ray Diffraction Limited Nanofocusing
211. Ultraprecision Machining Method for Ultraprecise Aspherical Mirror
212. Development of a Scanning X-ray Fluorescence Microscope Using Size-Controllable Focused X-ray Beam from 50 to 1500nm
213. Investigation of the Surface Removal Process of Silicon Carbide in Elastic Emission Machining
214. Ultraprecision Machining Utilizing Numerically Controlled Scanning of Localized Atmospheric Pressure Plasma
215. High-spatial-resolution scanning x-ray fluorescence microscope with Kirkpatrick-Baez mirrors
216. At-wavelength figure metrology of total reflection mirrors in hard x-ray region
217. Single-Shot Spectrometry for X-Ray Free-Electron Lasers
218. Highly resolved scanning tunneling microscopy study of Si(0 0 1) surfaces flattened in aqueous environment
219. At-wavelength figure metrology of hard x-ray focusing mirrors
220. Atomic-Scale Evaluation of Si(111) Surfaces Finished by the Planarization Process Utilizing SiO[sub 2] Particles Mixed with Water
221. Development of a Mirror Manipulator for Hard X-ray Microscopy with High Resolution
222. Effect of Particle Morphology on Removal Rate and Surface Topography in Elastic Emission Machining
223. Hard x-ray nano-focusing at 40nm level using K-B mirror optics for nanoscopy/spectroscopy
224. Results of x-ray mirror round-robin metrology measurements at the APS, ESRF, and SPring-8 optical metrology laboratories
225. Morphological Stability of Si(001) Surface Immersed in Fluid Mixture of Ultrapure Water and Silica Powder Particles in Elastic Emission Machining
226. Element Array by Scanning X-ray Fluorescence Microscopy after Cis-Diamminedichloro-Platinum(II) Treatment
227. Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50nm
228. Hard X-ray Diffraction-Limited Nanofocusing with Kirkpatrick-Baez Mirrors
229. Relative angle determinable stitching interferometry for hard x-ray reflective optics
230. Creation of perfect surfaces
231. The Influence of Particle Morphology on the Si(001) Surface in EEM (Elastic Emission Machining)
232. The Influence of EEM (Elastic Emission Machining) Fluid on Si(001) Surface Morphology
233. Focusing Hard X-rays to Sub-50 nm Size by Elliptically Figured Mirror
234. Fabrication of Ultraprecisely Figured Elliptical Mirror for Nano-Focusing of Hard X-ray and Evaluation of Focusing Properties
235. Stitching Interferometry for Surface Figure Measurement of X-ray Reflective Optics
236. Smoothing 4H-SiC (0001) surface by EEM (Elastic Emission Machining)
237. Wave-optical and ray-tracing analysis to establish a compact two-dimensional focusing unit using K-B mirror arrangement
238. Microstitching interferometry for nanofocusing mirror optics
239. Image quality improvement in a hard X-ray projection microscope using total reflection mirror optics
240. Fabrication technology of hard x-ray aspherical mirror optics and application to nanospectroscopy
241. Development of a figure correction method having spatial resolution close to 0.1 mm
242. Flattening Si (001) surface by EEM (Elastic Emission Machining)
243. Flattening of Si (001) Surface by EEM (Elastic Emission Machining)
244. Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining
245. Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining
246. Microstitching interferometry for x-ray reflective optics
247. Development of the Measurement System with Interferometers for Ultraprecise X-ray Mirror
248. Wave-optical evaluation of reflected X-ray intensity and wavefront distribution in total reflection hard X-ray by mirror optics.
249. Fabrication of a 400-mm-long mirror for focusing x-ray free-electron lasers to sub-100 nm.
250. Measuring the x-ray flux from MEMS devices for timing applications
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