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Integrated microspectrometers implemented in silicon photonic chips have gathered a great interest for diverse applications such as biological analysis, environmental monitoring, and remote sensing. These applications often demand high spectral resolution, broad operational bandwidth, and large optical throughput. Spatial heterodyne Fourier-transform (SHFT) spectrometers have been proposed to overcome the limited optical throughput of dispersive and speckle-based on-chip spectrometers. However, state-of-the-art SHFT spectrometers in near-infrared achieve large optical throughput only within a narrow operational bandwidth. Here we demonstrate for the first time, to the best of our knowledge, a broadband silicon nitride SHFT spectrometer with the largest light collecting multiaperture input (320×410µm^2) ever implemented in an SHFT on-chip spectrometer. The device was fabricated using 248 nm deep-ultraviolet lithography, exhibiting over 13 dB of optical throughput improvement compared to a single-aperture device. The measured resolution varies between 29 and 49 pm within the 1260–1600 nm wavelength range.

Silicon photonics is playing a key role in areas as diverse as high-speed optical communications, neural networks, supercomputing, quantum photonics, and sensing, which demand the development of highly efficient and compact light-processing devices. The lithographic segmentation of silicon waveguides at the subwavelength scale enables the synthesis of artificial materials that significantly expand the design space in silicon photonics. The optical properties of these metamaterials can be controlled by a judicious design of the subwavelength grating geometry, enhancing the performance of nanostructured devices without jeopardizing ease of fabrication and dense integration. Recently, the anisotropic nature of subwavelength gratings has begun to be exploited, yielding unprecedented capabilities and performance such as ultrabroadband behavior, engineered modal confinement, and sophisticated polarization management. Here we provide a comprehensive review of the field of subwavelength metamaterials and their applications in silicon photonics. We first provide an in-depth analysis of how the subwavelength geometry synthesizes the metamaterial and give insight into how properties like refractive index or anisotropy can be tailored. The latest applications are then reviewed in detail, with a clear focus on how subwavelength structures improve device performance. Finally, we illustrate the design of two ground-breaking devices in more detail and discuss the prospects of subwavelength gratings as a tool for the advancement of silicon photonics.

Integrated optical antennas are key components for on-chip light detection and ranging technology (LIDAR). In order to achieve a highly collimated far field with reduced beam divergence, antenna lengths on the order of several millimeters are required. In the high-index contrast silicon photonics platform, achieving such long antennas typically demands weakly modulated gratings with lithographic minimum feature sizes below 10 nm. Here, we experimentally demonstrate a new, to the best of our knowledge, strategy to make long antennas in silicon waveguides using a metamaterial subwavelength grating (SWG) waveguide core loaded with a lateral periodic array of radiative elements. The mode field confinement is controlled by the SWG duty cycle, and the delocalized propagating mode overlaps with the periodic perturbations. With this arrangement, weak antenna radiation strength can be achieved while maintaining a minimum feature size as large as 80 nm. Using this strategy, we experimentally demonstrate a 2-millimeter-long, single-etched subwavelength-engineered optical antenna on a conventional 220 nm SOI platform, presenting a measured far-field beam divergence of 0.1° and a wavelength scanning sensitivity of 0.13°/nm.

We demonstrate the anti-reflection properties of lithographically defined subwavelength gratings applied to the facets of integrated waveguides realized in the InP membrane-on-silicon platform. The subwavelength gratings are based on the gradient index effect to create a smooth index transition between the core material and air, making it possible to obtain reflections below −30dB at a wavelength of 1550 nm for both TE and TM polarized modes, as shown by 3D finite-difference time-domain simulations. Characterizations performed using Mach–Zehnder interferometers as test structures show relative reflections as low as −25dB, confirming the effectiveness of the technique.

Diffraction gratings that redirect light propagating in a channel waveguide to an on-chip slab are emerging as important building blocks in integrated photonics. Such distributed Bragg deflectors enable precise shaping of slab confined beams for a variety of applications, including wavelength multiplexing, optical phased array feeding, and coupling interfaces for on-chip point-to-point communications. However, these deflectors suffer from significant losses caused by off-chip radiation. In this Letter, we show, for the first time, to the best of our knowledge, that off-chip radiation can be dramatically reduced by using the single-beam phase matching condition and subwavelength metamaterial refractive index engineering. We present a deflector design with losses below 0.3 dB, opening a path toward new applications of distributed Bragg deflectors in integrated photonics.

Silicon photonics on-chip spectrometers are finding important applications in medical diagnostics, pollution monitoring, and astrophysics. Spatial heterodyne Fourier transform spectrometers (SHFTSs) provide a particularly interesting architecture with a powerful passive error correction capability and high spectral resolution. Despite having an intrinsically large optical throughput (étendue, also referred to as Jacquinot’s advantage), state-of-the-art silicon SHFTSs have not exploited this advantage yet. Here, we propose and experimentally demonstrate for the first time, to the best of our knowledge, an SHFTS implementing a wide-area light collection system simultaneously feeding an array of 16 interferometers, with an input aperture as large as 90µm×60µm formed by a two-way-fed grating coupler. We experimentally demonstrate 85 pm spectral resolution, 600 pm bandwidth, and 13 dB étendue increase, compared with a device with a conventional grating coupler input. The SHFTS was fabricated using 193 nm deep-UV optical lithography and integrates a large-size input aperture with an interferometer array and monolithic Ge photodetectors, in a 4.5mm^2 footprint.