151. Effects of oxygen partial pressure on the properties of indium tin oxide film on PET substrates by RF magnetron sputtering
- Author
-
Seon Tae Kim, Hyun Cho, Jin Kon Kim, and Tae Gyu Kim
- Subjects
Crystallinity ,chemistry.chemical_compound ,Materials science ,chemistry ,Electrical resistivity and conductivity ,Analytical chemistry ,Polyethylene terephthalate ,Limiting oxygen concentration ,Partial pressure ,Sputter deposition ,Amorphous solid ,Indium tin oxide - Abstract
Indium tin oxide (ITO) films with various oxygen partial pressure from 0 to 6 × 10 Pa were prepared onto polyethylene terephthalate (PET) using RF magnetron sputtering at room temperature. The structural, electrical and optical properties of the grown ITO films were investigated as a function of the oxygen partial pressure. The amorphous nature of the ITO films was dominant at the partial pressure below 1 × 10 Pa and the degree of crystallinity increased as the oxygen concentration increased further. This structural change comes with the increased carrier concentration and reduction of the electrical resistivity down to 9.8 × 10 Ω · cm. The average transmittance (at 400~800 nm) of the ITO deposited on the PET substrates increased as the oxygen partial pressure increased and transmittance above 80 % was achieved with the partial pressure of 4 × 10 Pa. The results show that the choice of optimal oxygen partial pressure can present improved film crystallinity, the increased carrier concentration, and the enhancement in the electrical conductivity.
- Published
- 2014
- Full Text
- View/download PDF