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1,100 results on '"Toyoda, S."'

112. Source identification of nitrous oxide on autotrophic partial nitrification in a granular sludge reactor

Author

Rathnayake, R.M.L.D, Song, Y., Tumendelger, A., Oshiki, M., Ishii, S., 1000080326636, Satoh, Hisashi, Toyoda, S., Yoshida, N., Okabe, S., Rathnayake, R.M.L.D, Song, Y., Tumendelger, A., Oshiki, M., Ishii, S., 1000080326636, Satoh, Hisashi, Toyoda, S., Yoshida, N., and Okabe, S.

Abstract

Emission of nitrous oxide (N2O) during biological wastewater treatment is of growing concern since N2O is a major stratospheric ozone-depleting substance and an important greenhouse gas. The emission of N2O from a lab-scale granular sequencing batch reactor (SBR) for partial nitrification (PN) treating synthetic wastewater without organic carbon was therefore determined in this study, because PN process is known to produce more N2O than conventional nitrification processes. The average N2O emission rate from the SBR was 0.32 ± 0.17 mg-N L−1 h−1, corresponding to the average emission of N2O of 0.8 ± 0.4% of the incoming nitrogen load (1.5 ± 0.8% of the converted NH4+). Analysis of dynamic concentration profiles during one cycle of the SBR operation demonstrated that N2O concentration in off-gas was the highest just after starting aeration whereas N2O concentration in effluent was gradually increased in the initial 40 min of the aeration period and was decreased thereafter. Isotopomer analysis was conducted to identify the main N2O production pathway in the reactor during one cycle. The hydroxylamine (NH2OH) oxidation pathway accounted for 65% of the total N2O production in the initial phase during one cycle, whereas contribution of the NO2− reduction pathway to N2O production was comparable with that of the NH2OH oxidation pathway in the latter phase. In addition, spatial distributions of bacteria and their activities in single microbial granules taken from the reactor were determined with microsensors and by in situ hybridization. Partial nitrification occurred mainly in the oxic surface layer of the granules and ammonia-oxidizing bacteria were abundant in this layer. N2O production was also found mainly in the oxic surface layer. Based on these results, although N2O was produced mainly via NH2OH oxidation pathway in the autotrophic partial nitrification reactor, N2O production mechanisms were complex and could involve multiple N2O production pathways.

Published
2013

117. The 4th international comparison on EPR dosimetry with tooth enamel Part 1: Report on the results

Author

Fattibene, P, Wieser, A, Adolfsson, Emelie, Benevides, L A, Brai, M, Callens, F, Chumak, V, Ciesielski, B, Della Monaca, S, Emerich, K, Gustafsson, Håkan, Hirai, Y, Hoshi, M, Israelsson, Axel, Ivannikov, A, Ivanov, D, Kaminska, J, Ke, Wu, Lund, Eva, Marrale, M, Martens, L, Miyazawa, C, Nakamura, N, Panzer, W, Pivovarov, S, A Reyes, R, Rodzi, M, Romanyukha, A A, Rukhin, A, Sholom, S, Skvortsov, V, Stepanenko, V, A Tarpan, M, Thierens, H, Toyoda, S, Trompier, F, Verdi, E, Zhumadilov, K, Fattibene, P, Wieser, A, Adolfsson, Emelie, Benevides, L A, Brai, M, Callens, F, Chumak, V, Ciesielski, B, Della Monaca, S, Emerich, K, Gustafsson, Håkan, Hirai, Y, Hoshi, M, Israelsson, Axel, Ivannikov, A, Ivanov, D, Kaminska, J, Ke, Wu, Lund, Eva, Marrale, M, Martens, L, Miyazawa, C, Nakamura, N, Panzer, W, Pivovarov, S, A Reyes, R, Rodzi, M, Romanyukha, A A, Rukhin, A, Sholom, S, Skvortsov, V, Stepanenko, V, A Tarpan, M, Thierens, H, Toyoda, S, Trompier, F, Verdi, E, and Zhumadilov, K

Abstract

This paper presents the results of the 4th International Comparison of in vitro electron paramagnetic resonance dosimetry with tooth enamel, where the performance parameters of tooth enamel dosimetry methods were compared among sixteen laboratories from all over the world. The participating laboratories were asked to determine a calibration curve with a set of tooth enamel powder samples provided by the organizers. Nine molar teeth extracted following medical indication from German donors and collected between 1997 and 2007 were prepared and irradiated at the Helmholtz Zentrum Munchen. Five out of six samples were irradiated at 0.1, 0.2, 0.5, 1.0 and 1.5 Gy air kerma; and one unirradiated sample was kept as control. The doses delivered to the individual samples were unknown to the participants, who were asked to measure each sample nine times, and to report the EPR signal response, the mass of aliquots measured, and the parameters of EPR signal acquisition and signal evaluation. Critical dose and detection limit were calculated by the organizers on the basis of the calibration-curve parameters obtained at every laboratory. For calibration curves obtained by measuring every calibration sample three times, the mean value of the detection limit was 205 mGy, ranging from 56 to 649 mGy. The participants were also invited to provide the signal response and the nominal dose of their current dose calibration curve (wherever available), the critical dose and detection limit of which were also calculated by the organizers., Funding Agencies|EC project SOUL|FIP6R-516478

Published
2011
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122. Contactless analysis of electric dipoles at high-k/SiO2 interfaces by surface-charge-switched electron spectroscopy.

Author

Toyoda, S., Fukuda, K., Itoh, E., Sugaya, H., Morita, M., Nakata, A., Uchimoto, Y., and Matsubara, E.

Subjects
*ELECTRIC dipole moments, *SURFACE charges, *ELECTRON spectroscopy, *TANTALATES, *VALENCE bands
Abstract

The continuous development of silicon devices has been supported by fundamental understanding of the two interfaces that predict the device properties: high-dielectric oxide (high-k)/SiO2 and SiO2/Si. In the absence of metal electrode fabrication, it is challenging to use spectroscopic approaches to deduce the electric dipoles in these interfaces for the prediction of electrical characteristics such as the leakage current and threshold voltage. Here, we propose a method to analyze the permanent dipole at the high-k/SiO2 interface by surface-charge-switched electron spectroscopy (SuCSES). An electron flood gun was used to switch the electrical polarity at the insulating surface to extract the interface-dipole contribution from the macroscopic dielectric polarization in the high-k/SiO2/Si stack structure. TaO3 - nanosheet (TaNS) crystallites, which are a family of high-k tantalate materials deposited on the SiO2/Si substrates, were annealed to prepare a nanoscale model interface. The properties of this interface were examined as a function of annealing temperature across the crystalline-toamorphous transition. Macroscopic dielectric polarization of the TaNS/SiO2/Si gate stack was found to exhibit a gradual decay that depended upon the quantum tunneling processes of induced carriers at the SiO2/Si interface. Additionally, the dipole at the high-k/thin-SiO2 interface abruptly changed by ∼0.4 eV before and after annealing at 400 °C, which may be the result of a decrease in conductionband offsets at the high-k/Si interface. Thus, SuCSES can aid in determining the inherent valenceband offsets in dielectric interfaces by using X-ray photoelectron spectroscopy with high accuracy and precision. Furthermore, SuCSES can determine whether dielectric polarization, including the interfacial dipole, affects the experimental value of the band offsets. [ABSTRACT FROM AUTHOR]

Published
2016
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123. One-Way Transparency of Light in Multiferroic CuB2O4.

Author

Toyoda, S., Abe, N., Kimura, S., Matsuda, Y. H., Ikeda, A., Takeyama, S., and Arima, T.

Subjects
*MULTIFERROIC materials, *ELECTROMAGNETIC waves, *SPECTRUM analysis, *DICHROISM, *OPTICAL polarization, *OPTICAL interference, *MAGNETIC transitions
Abstract

We experimentally demonstrate one-way transparency of light in multiferroic CuB20 4. The material is rendered transparent for light propagating in one direction, while opaque for light propagating in the opposite direction. The novel transparency results from a destructive interference of the electric dipole and magnetic dipole transitions. The realization of the effect has been accomplished by the application of a high magnetic field and the proper selection of the propagation direction of light in agreement with our quantum mechanical formulation of nonreciprocal directional dichroism [ABSTRACT FROM AUTHOR]

Published
2015
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130. TSV process solution for 3D-IC

Author

Toyoda, S., primary, Shibata, A., additional, Harada, M., additional, Murayama, T., additional, Sakuishi, T., additional, Hatanaka, M., additional, Morikawa, Y., additional, and Suu, K., additional

Published
2012
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132. KTN-crystal-waveguide-based electro-optic phase modulator with high performance index

Author

Toyoda, S., Fujiura, K., Sasaura, M., Enbutsu, K., Tate, A., Shimokozono, M., Fushimi, H., Imai, T., Manabe, K., Matsuura, T., Kurihara, T., Lee, S.C.J., Waardt, de, H., Toyoda, S., Fujiura, K., Sasaura, M., Enbutsu, K., Tate, A., Shimokozono, M., Fushimi, H., Imai, T., Manabe, K., Matsuura, T., Kurihara, T., Lee, S.C.J., and Waardt, de, H.

Abstract

An electro-optic (EO) phase modulator with a low driving voltage that uses newly developed KTa1-xNbxO3 buried waveguides is described. The waveguide layers for the core and cladding were formed using liquid phase epitaxy techniques. The propagation loss was less than 0.5 dB/cm and the polarisation-dependent loss was less than 0.1 dB/cm. The EO phase modulator had a low Vp×L value of

Published
2004

135. Ultraviolet absorption cross sections of carbonyl sulfide isotopologues OC<sup>32</sup>S, OC<sup>33</sup>S, OC<sup>34</sup>S and O<sup>13</sup>CS: isotopic fractionation in photolysis and atmospheric implications

Author

Hattori, S., primary, Danielache, S. O., additional, Johnson, M. S., additional, Schmidt, J. A., additional, Kjaergaard, H. G., additional, Toyoda, S., additional, Ueno, Y., additional, and Yoshida, N., additional

Published
2011
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