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Microforming has been received much attention in the recent decades due to the wide use of microparts in electronics and medical purpose. For the further functionalization of these micro devices, high functional surface with noble metals and nanomaterials are strongly required in bio- and medical fields, such as bio-sensors. To realize the efficient manufacturing process, which can deform the submillimeter scale bulk structure and can construct the micro to nanometer scale structures in one process, the present study proposes a combined process of microforming for metal foils with a selective chemical vapor deposition (SCVD) on the active surface of work materials. To clarify the availability of this proposed process, the feasibility of SCVD of functional materials to active surface of titanium (Ti) was investigated. CVD of iron (Fe) and carbon nanotubes (CNTs) which construct CNTs on the patterned surface of active Ti and non-active oxidation layer were conducted. Ti thin films on silicon substrate and Fe were used as work materials and functional materials, respectively. CNTs were grown on only Ti surface. Consequently, the selectivity of the active surface of Ti to the synthesis of Fe particles in CVD process was confirmed.

Boron nitride film was deposited on 〈1 0 0〉-oriented silicon substrate by hot filament assisted chemical vapor deposition. The B[N(CH 3 ) 2 ] 3 (Tris(dimetylamino)borane, TDMAB) was used as the single source precursor both for boron and nitride, and ammonia gas was used as the extra source to increase the N concentration in the films. Elemental composition of the films deposited under different filament temperatures were measured by energy dispersive X-ray (EDX) analysis, and the structure of the films were measured by X-ray diffraction (XRD) and Fourier transform infrared spectroscopy (FT-IR). The boron nitride films deposited under lower filament temperature was amorphous, while BN films contain hexagonal structure were deposited at higher filament temperature. To verify whether the films can be applied to the microforming die, a ball on disk test was carried out using pure titanium ball as the counterpart to investigate the interfacial behavior between the films and pure titanium. The results show that the reaction between the films and pure titanium was low as there was no titanium adhesion on the wear track when the film was remained.

Microforming has been received much attention in the recent decades due to the wide use of microparts in electronics and medical applications. For the further functionalization of these micro devices, high functional surfaces with noble metals and nanomaterials are strongly required in bio- and medical fields, such as bio-sensors. To realize an efficient manufacturing process, which can deform the submillimeter scale bulk structure and can construct the micro to nanometer scale structures in one process, the present study proposes a combined process of microforming for metal foils with a selective chemical vapor deposition (SCVD) on the active surfaces of the working material. To demonstrate feasibility of this proposed process, feasibility of SCVD of functional materials onto active surfaces of titanium (Ti) was investigated. CVD of iron (Fe) and carbon nanotubes (CNTs) which construct CNTs on the patterned surfaces of the active Ti and non-active Ti oxidation layers were conducted. Ti thin films on silicon substrate and Fe were used as working materials and functional materials respectively. CNTs were grown only on the Ti surface. Consequently, selectivity of the active surface of Ti to the synthesis of Fe particles in CVD was confirmed.

Boron nitride films were deposited onto Si substrates by hot filament chemical vapor deposition. The Tris(dimetylamino)borane (B[N(CH 3 ) 2 ] 3 ) was used as source precursor, and the ammonia gas was used as the extra nitrogen source to increase the N concentration in the films. The bias was applied on the substrate stage to obtain the cubic phase of boron nitride. Structures and compositions of the films were investigated by energy dispersive X-ray (EDX) analysis and Raman spectroscopy. BN films contain hexagonal structures were deposited. To verify whether the films can be applied to the microforming die for forming pure titanium, the ball-on-disk test was carried out with pure titanium as the counterpart. The interfacial behavior between the films and pure titanium was also investigated by observe the wear track after the ball-on-disk test. The result shows that there was no titanium adhesion on the wear track when BN films were remained.