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101. P‐89: Development of 30" 4K active matrix nanoLED display using Generation 4.5 size substrate with photolithography process in the atmosphere.

102. 95‐2: Ultra‐Small Pixel Color‐Conversion Arrays for MicroLED Displays with Color‐Purification Enhanced Color Gamut.

103. Enhancing Parameters Tuning of Overlay Models with Ridge Regression: Addressing Multicollinearity in High-Dimensional Data

104. A Thorough Review of Emerging Technologies in Micro- and Nanochannel Fabrication: Limitations, Applications, and Comparison

105. Piezoelectric Shunt Damping for a Planar Motor Application under Cryogenic Conditions

106. Large-Scale High-Accuracy and High-Efficiency Phase Plate Machining

108. Methods for extending working distance using modified photonic crystal for near-field lithography.

109. Ambient Phosphor with High Efficiency and Long Lifetime in Poly(Methyl Methacrylate) Through Charge‐Transfer‐Mediated Triplet Exciton Formation for Photolithography Applications.

110. Low-Energy Ion Implantation and Deep-Mesa Si-Avalanche Photodiodes with Improved Fabrication Process.

111. Toward Sustainable Electronics: Exploiting the Potential of a Biodegradable Cellulose Blend for Photolithographic Processes and Eco‐Friendly Devices.

112. Photolithographic Rugged Electrode for High‐Density Low‐Contact‐Resistance Coplanar Organic Transistors.

113. Design of single‐layer bandstop fractal frequency selective surface based on WLAN applications.

114. Direct wire writing technique benefitting the flexible electronics.

115. A Technique for Estimating the Pitch of Interference Fringe Patterns for Pattern Exposure in a Non-Orthogonal One-Axis Lloyd's Mirror Interferometer.

116. A Fabrication Method for Memristors with Graphene Top Electrodes and their Characterization.

117. Propulsion of Planar V‐Shaped Microswimmers in a Conically Rotating Magnetic Field.

118. Fabrication of PEG‐anthracene/alginate double‐network hydrogels and their application in photolithography.

119. Polypeptoids: Exploring the Power of Sequence Control in a Photoresist for Extreme‐Ultraviolet Lithography.

120. Fundamentals and applications of metamaterials: Breaking the limits.

121. Fabrication of Silver Iodide (AgI) Patterns via Photolithography and Its Application to In-Situ Observation of Condensation Frosting.

122. Micro Machining of a Si3N4/SiO2/Ti/Pt Hotplate and Its IR Emissivity Properties.

123. Water-Soluble Biomass Resist Materials Based on Polyglucuronic Acid for Eco-Friendly Photolithography.

124. Development of Shape Prediction Model of Microlens Fabricated via Diffuser-Assisted Photolithography.

125. Water-soluble bio-sourced resist interactions with fluorinated etching plasmas during the photolithography process.

126. Scheduling a Real-World Photolithography Area With Constraint Programming.

127. A mould-free soft-lithography approach for rapid, low-cost and bulk fabrication of microfluidic chips using photopolymer sheets.

128. P‐10.11: Digital Microfluidics Chip for Sweat Detection Based on Dielectric Wetting.

129. 70‐2: Photoresist simulation about the sidewall angel of Microߚlens for OLED light extraction.

130. 27‐3: Progress in High‐Performance AMOLED Display with ViP™ Technology.

131. 12‐3: A Liquid Crystal Polymer Matrix‐Based Solution for Linear Polarization Color Conversion‐Photoalignment Lithography Pixelated Color Filters.

132. A new visible light-sensitive, oxygen-tolerant photoinitiator system for the synthesis of polyacrylamide gels by maskless photopolymerization.

136. Micro Sized Interdigital Capacitor for Gases Detection Based on Graphene Oxide Coating

138. Effective Methods of Synthesis and Optimization of a Holographic Mask.

139. Electrical Characteristics of Single Layer Graphene Ribbons in a Wide Temperature Range.

140. Dissolution Behavior of Fluoroalkylated Diazonaphthoquinone and Its Blends with Fluorinated Copolymers under UV Irradiation.

141. Evaluation of the Basic Designs of a Micro Device that Provides Vibrational Stimulation to Cells.

142. Optimization of Layer Transfer and Photolithography for Device Integration of 2D-TMDC.

143. Mask and plate: a scalable front metallization with low-cost potential for III–V-based tandem solar cells enabling 31.6 % conversion efficiency.

144. NIR/Visible Light Double Beam Synergistically Enhanced the Emission of Triplet‐Triplet Annihilation Upconversion via Thermal Lensing Effect.

145. Integrated Optics: Platforms and Fabrication Methods.

146. 电感耦合等离子刻蚀法加工石英晶体 谐振器工艺研究.

147. Substrate‐Free Transfer of Large‐Area Ultra‐Thin Electronics.

148. Optical and Soft X-ray Microlithography at the Turn of the Century.

149. Green deep‐UV photoresist based on chitosan for microelectronics.

150. Valley photonic crystal waveguides fabricated with CMOS-compatible process.

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