101. Formation of Semiconducting Polymer Film by Laser CVD
- Author
-
Minoru Matsuda, Takashi Kawato, Akira Watanabe, and Osamu Ito
- Subjects
Materials science ,Polymers and Plastics ,Band gap ,Organic Chemistry ,Chemical vapor deposition ,Polypyrrole ,Photochemistry ,Laser ,law.invention ,chemistry.chemical_compound ,chemistry ,law ,Polyaniline ,Polymer chemistry ,Materials Chemistry ,Flash photolysis ,Polythiophene ,Thin film - Abstract
The thin films of semiconducting polymers such as poly(N-vinylcarbazole), polythiophene, polypyrrole, and polyaniline were formed by the laser chemical vapor deposition (CVD). The 355-nm laser excitation of N-vinylcarbazole deposited on a quartz substrate gave the poly(N-vinylcarba-zole) film with the molecular weight Mw=11860 (Mw/Mn=7.18). The sandwich excimer/second excimer emission ratio of the time-resolved emission spectra suggested the isotactic structure of the poly(N-vinylcarbazole) film prepared by the laser CVD. The micropatterns of the poly(N-vinylcarbazole) with the resolution of about 20μm were formed by the laser irradiation through a photomask. The laser flash photolysis of the N-vinylcarbazole showed the generation of the radical cation, which suggests the cationic polymerization mechanism. The optical band gap of polythiophene film was decreased with increasing laser excitation power.
- Published
- 1997