977 results on '"negative differential resistance"'
Search Results
952. Graphene/Pentacene Barristor with Ion-Gel Gate Dielectric: Flexible Ambipolar Transistor with High Mobility and On/Off Ratio.
- Author
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Oh G, Kim JS, Jeon JH, Won E, Son JW, Lee DH, Kim CK, Jang J, Lee T, and Park BH
- Abstract
High-quality channel layer is required for next-generation flexible electronic devices. Graphene is a good candidate due to its high carrier mobility and unique ambipolar transport characteristics but typically shows a low on/off ratio caused by gapless band structure. Popularly investigated organic semiconductors, such as pentacene, suffer from poor carrier mobility. Here, we propose a graphene/pentacene channel layer with high-k ion-gel gate dielectric. The graphene/pentacene device shows both high on/off ratio and carrier mobility as well as excellent mechanical flexibility. Most importantly, it reveals ambipolar behaviors and related negative differential resistance, which are controlled by external bias. Therefore, our graphene/pentacene barristor with ion-gel gate dielectric can offer various flexible device applications with high performances.
- Published
- 2015
- Full Text
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953. Enhanced Resonant Tunneling in Symmetric 2D Semiconductor Vertical Heterostructure Transistors.
- Author
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Campbell PM, Tarasov A, Joiner CA, Ready WJ, and Vogel EM
- Abstract
Tunneling transistors with negative differential resistance have widespread appeal for both digital and analog electronics. However, most attempts to demonstrate resonant tunneling devices, including graphene-insulator-graphene structures, have resulted in low peak-to-valley ratios, limiting their application. We theoretically demonstrate that vertical heterostructures consisting of two identical monolayer 2D transition-metal dichalcogenide semiconductor electrodes and a hexagonal boron nitride barrier result in a peak-to-valley ratio several orders of magnitude higher than the best that can be achieved using graphene electrodes. The peak-to-valley ratio is large even at coherence lengths on the order of a few nanometers, making these devices appealing for nanoscale electronics.
- Published
- 2015
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954. Negative Differential Resistance Probe for Interdot Interactions in a Double Quantum Dot Array.
- Author
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Pozner R, Lifshitz E, and Peskin U
- Abstract
Colloidal quantum dots are free-standing nanostructures with chemically tunable electronic properties. In this work, we consider a new STM tip-double quantum dot (DQD)-surface setup with a unique connectivity, in which the tip is coupled to a single dot and the coupling to the surface is shared by both dots. Our theoretical analysis reveals a unique negative differential resistance (NDR) effect attributed to destructive interference during charge transfer from the DQD to the surface. This NDR can be used as a sensitive probe for interdot interactions in DQD arrays.
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- 2015
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955. Performance potential and limit of MoS2 transistors.
- Author
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Li X, Yang L, Si M, Li S, Huang M, Ye P, and Wu Y
- Abstract
High-performance MoS2 transistors scaled down to 100 nm are studied at various temperatures down to 20 K, where a highest drive current of 800 μA μm(-1) can be achieved. Extremely low electrical noise of 2.8 × 10(-10) μm(2) Hz(-1) at 10 Hz is also achieved at room temperature. Furthermore, a negative differential resistance behavior is experimentally observed and its origin of self-heating is identified using pulsed-current-voltage measurements., (© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)
- Published
- 2015
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956. Dual-gated MoS2/WSe2 van der Waals tunnel diodes and transistors.
- Author
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Roy T, Tosun M, Cao X, Fang H, Lien DH, Zhao P, Chen YZ, Chueh YL, Guo J, and Javey A
- Abstract
Two-dimensional layered semiconductors present a promising material platform for band-to-band-tunneling devices given their homogeneous band edge steepness due to their atomically flat thickness. Here, we experimentally demonstrate interlayer band-to-band tunneling in vertical MoS2/WSe2 van der Waals (vdW) heterostructures using a dual-gate device architecture. The electric potential and carrier concentration of MoS2 and WSe2 layers are independently controlled by the two symmetric gates. The same device can be gate modulated to behave as either an Esaki diode with negative differential resistance, a backward diode with large reverse bias tunneling current, or a forward rectifying diode with low reverse bias current. Notably, a high gate coupling efficiency of ∼80% is obtained for tuning the interlayer band alignments, arising from weak electrostatic screening by the atomically thin layers. This work presents an advance in the fundamental understanding of the interlayer coupling and electron tunneling in semiconductor vdW heterostructures with important implications toward the design of atomically thin tunnel transistors.
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- 2015
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957. Room-temperature negative differential resistance in graphene field effect transistors: experiments and theory.
- Author
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Sharma P, Bernard LS, Bazigos A, Magrez A, and Ionescu AM
- Abstract
In this paper we demonstrate experimentally and discuss the negative differential resistance (NDR) in dual-gated graphene field effect transistors (GFETs) at room temperature for various channel lengths, ranging from 200 nm to 5 μm. The GFETs were fabricated using chemically vapor-deposited graphene with a top gate oxide down to 2.5 nm of equivalent oxide thickness (EOT). We originally explain and demonstrate with systematic simulations that the onset of NDR occurs in the unipolar region itself and that the main mechanism behind NDR is associated with the competition between the specific field dependence of carrier density and the drift velocity in GFET. Finally, we show experimentally that NDR behavior can still be obtained with devices of higher EOTs; however, this comes at the cost of requiring higher bias values and achieving lower NDR level.
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- 2015
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958. Gate-tunable resonant tunneling in double bilayer graphene heterostructures.
- Author
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Fallahazad B, Lee K, Kang S, Xue J, Larentis S, Corbet C, Kim K, Movva HC, Taniguchi T, Watanabe K, Register LF, Banerjee SK, and Tutuc E
- Abstract
We demonstrate gate-tunable resonant tunneling and negative differential resistance in the interlayer current-voltage characteristics of rotationally aligned double bilayer graphene heterostructures separated by hexagonal boron nitride (hBN) dielectric. An analysis of the heterostructure band alignment using individual layer densities, along with experimentally determined layer chemical potentials indicates that the resonance occurs when the energy bands of the two bilayer graphene are aligned. We discuss the tunneling resistance dependence on the interlayer hBN thickness, as well as the resonance width dependence on mobility and rotational alignment.
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- 2015
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959. Electrical and Optical Characterization of Group III-V Heterostructures with Emphasis on Terahertz Devices
- Author
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Weerasekara, Aruna Bandara
- Subjects
- Quantum efficiency, Dielectric function, Dark current, Responsivity, Plasma frequency, Neuron-like pulses, High frequency dielectric constant, Negative differential resistance, Correlation dimension, Embedding dimension, Bifurcation, Return maps, Arrhenius, Absorption coefficient, Detectors, Terahertz, Optical Phonon, Infrared, Astrophysics and Astronomy, Physics
- Abstract
Electrical and optical characterizations of heterostructures and thin films based on group III-V compound semiconductors are presented. Optical properties of GaMnN thin films grown by Metalorganic Chemical Vapor Deposition (MOCVD) on GaN/Sapphire templates were investigated using IR reflection spectroscopy. Experimental reflection spectra were fitted using a non - linear fitting algorithm, and the high frequency dielectric constant (ε∞), optical phonon frequencies of E1(TO) and E1(LO), and their oscillator strengths (S) and broadening constants (Γ) were obtained for GaMnN thin films with different Mn fraction. The high frequency dielectric constant (ε∞) of InN thin films grown by the high pressure chemical vapor deposition (HPCVD) method was also investigated by IR reflection spectroscopy and the average was found to vary between 7.0 - 8.6. The mobility of free carriers in InN thin films was calculated using the damping constant of the plasma oscillator. The terahertz detection capability of n-type GaAs/AlGaAs Heterojunction Interfacial Workfunction Internal Photoemission (HEIWIP) structures was demonstrated. A threshold frequency of 3.2 THz (93 µm) with a peak responsivity of 6.5 A/W at 7.1 THz was obtained using a 0.7 µm thick 1E18 cm−3 n - type doped GaAs emitter layer and a 1 µm thick undoped Al(0.04)Ga(0.96)As barrier layer. Using n - type doped GaAs emitter layers, the possibility of obtaining small workfunctions (∆) required for terahertz detectors has been successfully demonstrated. In addition, the possibility of using GaN (GaMnN) and InN materials for terahertz detection was investigated and a possible GaN base terahertz detector design is presented. The non - linear behavior of the Inter Pulse Time Intervals (IPTI) of neuron - like electric pulses triggered externally in a GaAs/InGaAs Multi Quantum Well (MQW) structure at low temperature (~10 K) was investigated. It was found that a grouping behavior of IPTIs exists at slow triggering pulse rates. Furthermore, the calculated correlation dimension reveals that the dimensionality of the system is higher than the average dimension found in most of the natural systems. Finally, an investigation of terahertz radiation efect on biological system is reported.
- Published
- 2007
960. Threshold Extension of Gallium Arsenide/Aluminum Gallium Arsenide Terahertz Detectors and Switching in Heterostructures
- Author
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Rinzan, Mohamed Buhary
- Subjects
- Terahertz detectors, Homojunction, Heterojunction, Free carrier absorption, Reststrahlen band, Interfacial workfunction, Internal photoemission, Infrared detectors, Emitters, Barriers, Dark current, Photo current, Resonance cavity architecture, Responsivity, Quantum Efficiency, Detectivity, BLIP temperature, Threshold wavelength, Negative differential resistance, Tunneling, Switching, Astrophysics and Astronomy, Physics
- Abstract
In this work, homojunction interfacial workfunction internal photoemission (HIWIP) detectors based on GaAs, and heterojunction interfacial workfunction internal photoemission (HEIWIP) detectors based mainly on the Gallium Arsenide/Aluminum Gallium Arsenide material system are presented. Design principles of HIWIP and HEIWIP detectors, such as free carrier absorption, photocarrier generation, photoemission, and responsivity, are discussed in detail. Results of p-type HIWIPs based on GaAs material are presented. Homojunction detectors based on p-type GaAs were found to limit their operating wavelength range. This is mainly due to band depletion arising through carrier transitions from the heavy/light hole bands to the split off band. Designing n-type GaAs HIWIP detectors is difficult as it is strenuous to control their workfunction. Heterojunction detectors based on Gallium Arsenide/Aluminum Gallium Arsenide material system will allow tuning their threshold wavelength by adjusting the alloy composition of the Aluminum Gallium Arsenide/Gallium Arsenide barrier, while keeping a fixed doping density in the emitter. The detectors covered in this work operate from 1 to 128 micron (300 to 2.3 THz). Enhancement of detector response using resonance cavity architecture is demonstrated. Threshold wavelength extension of HEIWIPs by varying the Al composition of the barrier was investigated. The threshold limit of approximately 3.3 THz (92 micron), due to a practical Al fraction limit of approximately 0.005, can be overcome by replacing GaAs emitters in Gallium Arsenide/Aluminum Gallium Arsenide HEIWIPs with Aluminum Gallium Arsenide/Gallium Arsenide emitters. As the initial step, terahertz absorption for 1 micron-thick Be-doped Aluminum Gallium Arsenide epilayers (with different Al fraction and doping density) grown on GaAs substrates was measured. The absorption probability of the epilayers was derived from these absorption measurements. Based on the terahertz absorption results, an Aluminum Gallium Arsenide/Gallium Arsenide HEIWIP detector was designed and the extension of threshold frequency (f0) to 2.3 THz was successfully demonstrated. In a different study, switching in Gallium Arsenide/Aluminum Gallium Arsenide heterostructures from a tunneling dominated low conductance branch to a thermal emission dominated high conductance branch was investigated. This bistability leads to neuron-like voltage pulses observed in some heterostructure devices. The bias field that initiates the switching was determined from an iterative method that uses feedback information, such as carrier drift velocity and electron temperature, from hot carrier transport. The bias voltage needed to switch the device was found to decrease with the increasing device temperature.
- Published
- 2006
961. Probing the Electronic Properties of Materials that Self-Assemble
- Author
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Fuierer, Ryan R
- Subjects
- Negative Differential Resistance, Self-Assembled Monolayers, Scanning Probe Lithography, Stochastic Switching
- Abstract
Developing methods to control the chemistry of surfaces on the 1—100 nm length scale is a fundamental and exciting challenge in many disciplines of science today because it opens new possibilities in fields ranging from molecular electronics (ME) to biomedicine to catalysis. Scanning probe microscopy techniques have been a key goal in achieving this challenge. This work begins with an exhaustive review of scanning probe lithography techniques using self-assembled monolayer (SAM) systems reported in the literature to date. Experimental study describes the development of a scanning probe lithography technique (termed replacement lithography) in which an STM tip selectively desorbs organothiolate SAMs in a predefined pattern, allowing a replacement thiol to adsorb onto the exposed gold in the patterned region. The replacement parameters were investigated using electroactive containing replacement thiol species because they displayed large apparent height contrasts in STM images, allowing the efficacy of the pattern to be easily ascertained. These data were subsequently employed to create mesoscale chemical gradients with replacement lithography. The electronic properties of redox active SAMs were also shown to display negative differential resistance in current-voltage measurements, a behavior that has possible utility in the development of ME devices. Temporal investigations monitoring the stochastic variation in apparent height contrasts in STM images of electroactive containing SAM guest species isolated within insulating host SAM matrices was also studied. The observations from these data may lend insight to how ME candidates might behave when sandwiched in a two-electrode configuration (metal-SAM-metal junction).
- Published
- 2004
962. Resonant -tunneling diodes in high-performance digital circuit applications.
- Author
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Gonzalez, Alejandro Flavio
- Subjects
- Applications, Digital Circuit, High, Mosfets, Negative Differential Resistance, Performance, Resonant Tunneling Diodes, Resonant-tunneling Diodes
- Abstract
This dissertation presents research on the application of resonant-tunneling diodes (RTDs) in multivalued-logic circuits and very-high-speed digital circuits. An RTD-based signed-digit full adder cell is presented in which carry propagation along a chain of adders is eliminated by means of a redundant arithmetic algorithm. RTDs enable efficient implementation of sophisticated multivalued-logic functions. The two-peak negative-differential-resistance (NDR) characteristics of two RTDs connected in series are used to easily detect four voltage threshold levels of a multivalued input signal. The proposed concept was successfully demonstrated via a prototype in which RTDs were connected as external devices to a custom-designed CMOS integrated circuit. A second, fully integrated, prototype was developed using MOS-NDR in a standard CMOS process. MOS-NDR is a new prototyping technique for circuits that combine MOS transistors and NDR devices where NDR characteristics are emulated using only enhancement-mode n-channel MOSFETs. This was the first demonstration of the MOS-NDR technique in multivalued logic applications. A simulation-based study is presented in which performance of bistable logic circuits combining RTDs and III--V transistors is measured as experiment parameters vary. The circuit topology, the type and speed of transistors, and the driven output load are some of the parameters used in the experiments. There are two basic types of topologies for RTD bistable logic circuits: quantum bistable logic, where the state acquired after each clocking event is determined by the interaction between RTDs and transistors, and balanced pair logic, where the logic state depends on the interaction of two or more RTDs. Two types of compound-semiconductor transistors were considered in the study, namely, heterostructure bipolar transistors and high-electron-mobility transistors. The results of the study indicate that the best circuit configuration combines the balanced-pair logic with high-electron-mobility transistors. The experimental simulation framework developed for this study is not tied to any particular technology or circuit technique, and it can thus be used as a general-purpose tool for circuit evaluation and comparison.
- Published
- 2002
963. Negative differential resistance devices and their circuit applications.
- Author
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Lin, Cheng-Hui
- Subjects
- Applications, Circuit, Circuits, Devices, Negative Differential Resistance, Photoreceivers, Tunnel Diodes
- Abstract
As CMOS technology advances to its physical limits of feature size shrinking, it is important to investigate technologies that employ alternative device physics and transport phenomena. Among a host of nascent technologies, resonant-tunneling diodes (RTDs) are the most mature and promising for commercial introduction for the following reasons. First, RTDs can operate at room temperature with large peak-to-valley current ratio (PVCR) which enables a large noise margin in RTD-based logic circuits. Second, RTDs can be monolithically integrated with conventional technologies such as heterojunction bipolar transistors (HBTs), and high-electron mobility transistors (HEMTs). Third, the self-latching property of RTDs makes it possible to realize complex logic functionality with a few devices (RTDs and transistors). This can have a tremendous impact on logic circuit designs and greatly increases the IC packing density. This thesis encompasses many aspects of research on InP-based RTD-HBT circuits. Device properties were first studied in this work. The RTD characteristics can be designed by optimizing the layer structures. The fabricated RTDs showed a wide range of peak current density from 5.7 x 103 A/cm 2 to 1.27 x 105 A/cm2 on different layer structure designs. The smallest peak voltage obtained was 0.25V on the RTD with an InAs subwell design. The highest PVCR found was 30 at room temperature. The InAlAs/InGaAs material system was used for fabricating HBTs. The highest fT and fMAX obtained in this work were 60GHz and 87GHz, respectively on a 2.5 x 2.5 mum 2-HBT. A breakdown voltage greater than 5V has been obtained on the HBT with a 7500A-thick collector. Semiconductor PIN diodes for photodetectors have also been fabricated. The measured responsivity was 0.7A/W. Si-based tunnel diodes were also studied in this work because of the possibility of integrating tunnel diodes with the CMOS process. Negative differential resistance was measured on MBE-wafers. These wafers had delta-doping planes to provide extremely high doping concentration and form triangular potential wells. These wells helped confine electrons and increase the tunneling probability. The maximum PVCR found was 1.18 at room temperature and 1.2 at 80K. The PVCR should be improved by optimizing the growth conditions. Based on the measured device characteristics, RTD-HBT logic gates were designed and fabricated. Two different processes, the via-hole process and the air-bridge process, were developed and improved for this work. Both processes featured all wet-etching processing and self-aligned base contacts. Several digital circuits including a static inverter, concensus element, minority gate and the Monostable-Bistable transition Logic Element (MOBILE) inverting gate have been implemented with RTDs and HBTs. The logic function of these RTD-based circuits has been confirmed up to 10Gb/s which was the limit of our test instrumentation. Photoreceivers based on RTDs and PIN diodes have also been successfully fabricated and tested. Compared to a commercially available photoreceiver, the fabricated photoreceiver consumes very low power (only 0.21mW) and has a high conversion gain of 3000V/W. Optimization of the circuit design should greatly improve the sensitivity of the photoreceivers. These results indicate the potential of RTD-HBT circuits of digital gates and optical communications.
- Published
- 2001
964. The first heteropentanuclear extended metal-atom chain: [Ni⁺-Ru₂⁵⁺-Ni²⁺-Ni²⁺ (tripyridyldiamido)₄(NCS)₂].
- Author
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Huang MJ, Hua SA, Fu MD, Huang GC, Yin C, Ko CH, Kuo CK, Hsu CH, Lee GH, Ho KY, Wang CH, Yang YW, Chen IC, Peng SM, and Chen CH
- Abstract
This study develops the first heteropentametal extended metal atom chain (EMAC) in which a string of nickel cores is incorporated with a diruthenium unit to tune the molecular properties. Spectroscopic, crystallographic, and magnetic characterizations show the formation of a fully delocalized Ru2(5+) unit. This [Ru2]-containing EMAC exhibits single-molecule conductance four-fold superior to that of the pentanickel complex and results in features of negative differential resistance (NDR), which are unobserved in analogues of pentanickel and pentaruthenium EMACs. A plausible mechanism for the NDR behavior is proposed for this diruthenium-modulated EMAC., (© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)
- Published
- 2014
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965. Quantum MOS circuits and systems.
- Author
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Kulkarni, Shriram
- Subjects
- Cmos, Logic Circuits, Mos, Negative Differential Resistance, Quantum, Resonant Tunneling, Systems
- Abstract
Device physics limitations of conventional complementary metal-oxide semiconductor (CMOS) transistors are likely to cause diminishing integrated circuit performance improvement in the sub 100-nm regime. At these dimensions, quantum effects become prominent leading to realization of devices utilizing quantum-mechanical tunneling transport mechanisms for obtaining picosecond device switching speeds. The negative differential-resistance (NDR) current-voltage (I-V) characteristic of such devices, achieved due to resonant tunneling, is also ideally suited for the design of compact self-latching logic circuits. While resonant tunneling devices have been demonstrated using III-V materials, their large absolute current values and low integration levels have limited their use to niche high-performance small-scale circuits. Given the advantages of resonant tunneling devices, it is attractive to envision compact, high-functionality NDR circuits implemented in a technology such as CMOS that offers low power dissipation and very high integration levels. Even as research in cointegration of resonant tunneling devices in Silicon, referred to as quantum MOS (QMOS), is ongoing, this dissertation presents novel combinational and bistable logic families, and compact flip-flop circuits using resonant tunneling diodes (RTDs) and MOS transistors. Analytical studies of static and dynamic QMOS performance parameters yield expressions for theoretical circuit comparison with CMOS, and also for optimizing RTD characteristics. QMOS circuits are characterized using SPICE simulation, and simulation-based comparison of QMOS and CMOS circuits highlights potential area-power-delay savings of this new circuit technique. The folded I-V characteristic of RTDs allows gate-level bistable-clocked-mode system operation. Performance improvement of such fine-grained QMOS pipelines arises from compactness of logic design, elimination of pipeline latch area, delay and power overhead, and high switching speed of the RTD. A pipelined carry-save multiplier and a 32-bit parallel correlator are designed to study the system-level advantages of QMOS logic. In particular, signal processing systems and communication systems benefit from fine-grained pipelining due to minimal data dependence and large volume of similar computations at each cycle. In the absence of a fabrication process that cointegrates RTDs in Silicon, a study of various QMOS prototyping schemes is presented that identifies the best means to verify system-level behavior of QMOS circuits while research in RTD-CMOS cointegration continues.
- Published
- 1999
966. Etude par simulation Monte Carlo des effets induits dans un TEGFET par le transfert spatial
- Author
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B. Mougel, R. Castagné, J.-F. Pône, Philippe Dollfus, and M. Mouis
- Subjects
Monte Carlo study ,drain current ,Physics ,saturation ,Monte Carlo methods ,real space transfer ,02 engineering and technology ,010402 general chemistry ,021001 nanoscience & nanotechnology ,high electron mobility transistors ,01 natural sciences ,6. Clean water ,0104 chemical sciences ,channel pinch off ,semiconductor device models ,TEGFET ,negative resistance ,[PHYS.HIST]Physics [physics]/Physics archives ,simulations ,Atomic physics ,negative differential resistance ,0210 nano-technology ,Drain current ,Saturation (chemistry) - Abstract
La simulation de dispositifs TEGFETs a permis d'éclaircir l'influence du transfert spatial sur le mécanisme de saturation du courant de drain dans ce type de transistor. Dans le TEGFET à grille longue (1 μm), ce phénomène n'apparaît pas et le courant de drain est saturé par pincement du canal. Dans le TEGFET à grille courte (0,5 μm), à la fois le transfert spatial et le transfert intervallées interviennent, mais sans être directement la cause de la saturation. Néanmoins le transfert spatial empêche la formation d'un domaine dipolaire ; le courant de drain est alors contrôlé par le rétrécissement du canal sous la grille. Les électrons défocalisés restent sous l'influence de la tension de drain, provoquant ainsi une forte conductance de drain. On remarque également que le transfert spatial répartit le courant dans les différentes couches conductrices sans modifier le courant de drain total. Dans un dispositif à deux drains — l'un collectant les électrons du canal, l'autre les électrons transférés — le transfert spatial permet d'obtenir une résistance différentielle négative.
- Published
- 1987
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967. Resolving the Mystery of the Elusive Peak: Negative Differential Resistance in Redox Proteins.
- Author
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Mentovich ED, Belgorodsky B, and Richter S
- Abstract
Vertical molecular transistors are used to explain the nonconformal electron transfer results obtained for redox proteins. The transport characteristics of a negative differential resistance peak as appears in the transport data of azurin and its nonredox derivative are explored. A correlation between the peak and its redox center is demonstrated.
- Published
- 2011
- Full Text
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968. Observation and measurement of negative differential resistance on PtSi Schottky junctions on porous silicon.
- Author
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Banihashemian SM, Hajghassem H, Erfanian A, Aliahmadi M, Mohtashamifar M, and Mosakazemi SM
- Subjects
- Microscopy, Atomic Force, Nanotechnology, Particle Size, Porosity, Quantum Theory, Semiconductors, Platinum chemistry, Silicon chemistry
- Abstract
Nanosize porous Si is made by two step controlled etching of Si. The first etching step is carried on the Si surface and the second is performed after deposition of 75 Å of platinum on the formed surface. A platinum silicide structure with a size of less than 25 nm is formed on the porous Si surface, as measured with an Atomic Forced Microscope (AFM). Differential resistance curve as a function of voltage in 77 K and 100 K shows a negative differential resistance and indicates the effect of quantum tunneling. In general form, the ratio of maximum to minimum tunneling current (PVR) and the number of peaks in I-V curves reduces by increasing the temperature. However, due to accumulation of carriers behind the potential barrier and superposition of several peaks, it is observed that the PVR increases at 100 K and the maximum PVR at 100 K is 189.6.
- Published
- 2010
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969. Voltage-Dependent Electronic Transport Properties of Reduced Graphene Oxide with Various Coverage Ratios
- Author
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Serhan Yamacli
- Subjects
Materials science ,Hydrogen ,Negative differential resistance ,Graphene ,Ab initio ,Oxide ,chemistry.chemical_element ,Nanotechnology ,Carbon nanotube ,Chemical vapor deposition ,Article ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,law.invention ,Threshold voltage ,chemistry.chemical_compound ,chemistry ,law ,Chemical physics ,Coverage ratio ,Density functional theory ,Reduced graphene oxide ,Electrical and Electronic Engineering - Abstract
Graphene is mainly implemented by these methods: exfoliating, unzipping of carbon nanotubes, chemical vapour deposition, epitaxial growth and the reduction of graphene oxide. The latter option has the advantage of low cost and precision. However, reduced graphene oxide (rGO) contains hydrogen and/or oxygen atoms hence the structure and properties of the rGO and intrinsic graphene are different. Considering the advantages of the implementation and utilization of rGO, voltage-dependent electronic transport properties of several rGO samples with various coverage ratios are investigated in this work. Ab initio simulations based on density functional theory combined with non-equilibrium Green’s function formalism are used to obtain the current–voltage characteristics and the voltage-dependent transmission spectra of rGO samples. It is shown that the transport properties of rGO are strongly dependent on the coverage ratio. Obtained results indicate that some of the rGO samples have negative differential resistance characteristics while normally insulating rGO can behave as conducting beyond a certain threshold voltage. The reasons of the peculiar electronic transport behaviour of rGO samples are further investigated, taking the transmission eigenstates and their localization degree into consideration. The findings of this study are expected to be helpful for engineering the characteristics of rGO structures.
- Full Text
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970. Mechanism of Rectification in Tunneling Junctions Based on Molecules with Asymmetric Potential Drops
- Author
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Nijhuis, Christian A., Reus, William F., and Whitesides, George M.
- Subjects
self-assembled monolayers ,negative differential resistance ,unimolecular electronic devices ,gallium-indium EGaIN ,electrical rectification ,hexadecylquinolinium tricyanoquinodimethanide ,alkanethiol monolayers ,organic materials ,charge-transport ,metal junction - Abstract
This paper proposes a mechanism for the rectification of current by self-assembled monolayers (SAMs) of alkanethiolates with Fc head groups (SC\(_{11}\)Fc) in SAM-based tunneling junctions with ultra-flat Ag bottom electrodes and liquid metal (Ga\(_2\)O\(_3\)/EGaIn) top electrodes. A systematic physical-organic study based on statistically large numbers of data (N = 300−1000) reached the conclusion that only one energetically accessible molecular orbital (the HOMO of the Fc) is necessary to obtain large rectification ratios \(R \approx 1.0 \times 10^{2} (R = |J(−V)|/|J(V)|\) at \(±1\) V\()\). Values of R are log-normally distributed, with a log-standard deviation of 3.0. The HOMO level has to be positioned spatially asymmetrically inside the junctions (in these experiments, in contact with the Ga\(_2\)O\(_3\)/EGaIn top electrode, and separated from the Ag electrode by the SC\(_{11}\) moiety) and energetically below the Fermi levels of both electrodes to achieve rectification. The HOMO follows the potential of the Fermi level of the Ga\(_2\)O\(_3\)/EGaIn electrode; it overlaps energetically with both Fermi levels of the electrodes only in one direction of bias., Chemistry and Chemical Biology
- Published
- 2010
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971. Transport Properties and Distribution Functions in III - V Semiconductors.
- Author
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WASHINGTON UNIV ST LOUIS MO DEPT OF ELECTRICAL ENGINEERING, Abraham-Shrauner,B W, WASHINGTON UNIV ST LOUIS MO DEPT OF ELECTRICAL ENGINEERING, and Abraham-Shrauner,B W
- Abstract
Approximate analytical expressions for electron distribution functions in III-V semiconductors have been derived for high and low electric fields. For low electric fields two analytic methods were used and compared with an earlier iteration method and a new perturbation method. All gave similar distribution functions and drift mobility. For high electric fields the electron distribution function was found within the diffusion approximation by an expansion inversely in the electric field. For Al(0.25)In(0.75)As the effects of p-wave scattering and nonparabolic energy bands were not found to be the cause of the negative differential resistance. Alloy scattering in ternary semiconductors was treated in the coherent potential approximation. The validity of the diffusion and maximum anisotropy approximation has been assessed by an expansion inversely in the electric field of the polar optical collision term in high electric fields.
- Published
- 1984
972. Gunn Instabilities in the Positive Column of Oxygen Discharge
- Author
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FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OHIO, Sabadil,Heinz, FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OHIO, and Sabadil,Heinz
- Abstract
It is shown that the T layers (in the KHz frequency range) of oxygen discharge correspond in their characteristic properties to the instabilities observed by Gunn in GaAs semiconductors. As can be seen on the basis of measurements carried out with the aid of the double-probe method, the changes in the gradient indicate that the T layers are migrating low-field dipole domains. By considering the dissociative adduction in oxygen discharge in connection with the specific character of the generation of negative ions, it is possible to provide a qualitative explanation for the formation of the T layers and the negative differential resistance occasioned by it. According to this interpretation, the O- ions assume the function of the electrons with large effective masses in the GaAs semiconductor. Finally, it is shown that the T layers may occur also in CO2 discharge but not in discharges of gaseous halogens. (Modified author abstract), Edited trans. of Beitraege aus der Plasmaphysik (East Germany) v8 n4 p299-309 1968.
- Published
- 1974
973. Fabrication of thin-film organic memory elements
- Author
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Kimmo Solehmainen, Marja Vilkman, Tomi Hassinen, and Henrik Sandberg
- Subjects
electrical switching ,organic thin films ,organic memory ,negative differential resistance - Abstract
A flexible organic memory unit will be a key element when manufacturing future RFID circuits on flexible substrates. Although the research of memory devices using organic materials dates back almost 40 years, the performance of these devices has remained low when compared to their inorganic counterparts. The main problem limiting the application of these devices is that their operation tends to degrade in air and under stress of successive read-write cycles. Furthermore, the physical phenomena affecting their stability are many times unclear. In this study many different aspects related to the sample preparation were studied in order to identify which of them had an influence on the performance and stability of the devices. The test device structure consisted of two metal electrodes and an organic layer between them. As the organic film different polymer materials including block polymers, poly(3-hexyl thiophene) (P3HT), and polystyrenes were tested in various compositions. The film thickness varied from a few tens of nanometres to ~200 nm. During the work, different electrode materials, interface effects, film thickness, device area, substrate materials, impurity effects, and curing parameters etc. were studied. Results from the electrical characterisation showed that electrical switching took place in all of the tested materials but not in all fabrication parameter combinations. One of the most important aspects in the sample preparation affecting the device performance was the purity of processing environment. The importance of the dust particles in constituting conducting paths to charge carriers and thereby enabling electrical conductivity was identified. In addition to the purity of the processing environment the interface effects played a major role in the operation of the devices.
974. Oxygen-mediated electron transport through hybrid silicon-organic interfaces
- Author
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Elisa Molinari, Benedetta Bonferroni, Arrigo Calzolari, Andrea Ferretti, Alice Ruini, and Marilia J. Caldas
- Subjects
Materials science ,Silicon ,chemistry.chemical_element ,Bioengineering ,Nanotechnology ,Electronic structure ,Monolayer ,Molecule ,General Materials Science ,Electrical and Electronic Engineering ,SURFACES ,Mechanical Engineering ,Chemistry (all) ,MONOLAYERS ,Molecular electronics ,MICROSCOPY ,JUNCTIONS ,General Chemistry ,Electron transport chain ,chemistry ,Chemical bond ,Mechanics of Materials ,Density functional theory ,Materials Science (all) ,NEGATIVE DIFFERENTIAL RESISTANCE - Abstract
We investigate from first principles the electronic and transport properties of hybrid organic/silicon interfaces of relevance to molecular electronics. We focus on conjugated molecules bonded to hydrogenated Si through hydroxyl or thiol groups. The electronic structure of the systems is addressed within density functional theory, and the electron transport across the interface is directly evaluated within the Landauer approach. The microscopic effects of molecule-substrate bonding on the transport efficiency are explicitly analyzed, and the oxygen-bonded interface is identified as a candidate system when preferential hole transfer is needed.
975. Graphene Negative Differential Resistance Circuit With Voltage-Tunable High Performance at Room Temperature
- Author
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Adrian M. Ionescu, Arnaud Magrez, Antonios Bazigos, Laurent Syavoch Bernard, and Pankaj Sharma
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Materials science ,Graphene ,business.industry ,Transistor ,Doping ,Electrical engineering ,Electronic, Optical and Magnetic Materials ,law.invention ,negative differential conductance ,field effect transistor ,law ,Logic gate ,Optoelectronics ,Field-effect transistor ,Electrical and Electronic Engineering ,business ,negative differential resistance ,Current density ,Voltage ,Electronic circuit - Abstract
We propose, fabricate, and experimentally demonstrate a circuit based on graphene field-effect transistors (GFETs) showing enhanced negative differential resistance (NDR) characteristics at room temperature. The proposed graphene NDR (GNDR) circuit consists of three GFETs, which includes a two GFET inverter connected in a feedback loop with the main GFET in which the NDR is realized. Herein, a GNDR circuit is demonstrated using large-area chemical vapor deposition grown graphene and no doping step, which makes it compatible with silicon-based circuits. The circuit shows negative differential conductance (2.1 mS/ $\mu \text{m}$ ) that is almost an order of magnitude better than NDR based on 1-GFET. This conductance level is uniquely tunable ( $\times 2.3$ ) with the supply voltage as well as with the back bias voltage. It also exhibits an improved peak-to-valley current ratio (2.2) and a wide voltage range (0.6 V) over which NDR is valid. In comparison with other NDR technologies, the GNDR has a very high peak-current-density of the order of 1 mA/ $\mu \text{m}$ , which offers unique opportunities for designing circuits for applications requiring high current drive.
976. Current-voltage characteristic of a resonant tunneling diode under electromagnetic radiation
- Author
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Naser Hatefi-Kargan
- Subjects
transmission coefficient ,negative differential resistance ,resonant tunneling ,lcsh:Physics ,lcsh:QC1-999 ,tunneling diode - Abstract
In this paper, current-voltage characteristic of a resonant tunneling diode under electromagnetic radiation has been calculated and compared with the results when there is no electromagnetic radiation. For calculating current -voltage characteristic, it is required to calculate the transmission coefficient of electrons from the well and barrier structures of this device. For calculating the transmission coefficient of electrons at the presence of electromagnetic radiation, Finite Difference Time Domain (FDTD) method has been used and when there is no electromagnetic radiation Transfer Matrix Method (TMM) and finite diffirence time domain method have been used. The results show that the presence of electromagnetic radiation causes resonant states other than principal resonant state (without presence of electromagnetic radiation) to appear on the transmition coefficient curve where they are in distances from the principal peak and from each other. Also, the presence of electromagnetic radiation causes peaks other than principal peak to appear on the current-voltage characteristics of the device. Under electromagnetic radiation, the number of peaks on the current-voltage curve is smaller than the number of peaks on the current-voltage transmission coefficient. This is due to the fact that current-voltage curve is the result of integration on the energy of electrons, Thus, the sharper and low height peaks on the transmission coefficient do not appear on the current-voltage characteristic curve.
977. Gate-Tunable Tunneling Transistor Based on a Thin Black Phosphorus-SnSe2 Heterostructure
- Author
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Na, Junhong, Kim, Youngwook, Smet, Jurgen H., Burghard, Marko, and Kern, Klaus
- Subjects
diode ,field-effect transistors ,graphene ,2d van der waals heterostructure ,gap ,tin diselenide ,negative differential resistance ,black phosphorus ,anomalous temperature-dependence ,tunneling transistor - Abstract
Tunneling field-effect transistors (TFETs) are of considerable interest owing to their capability of low-power operation. Here, we demonstrate a novel type of TFET which is composed of a thin black phosphorus-tin diselenide (BP-SnSe2) heterostructure. This combination of 2D semiconductor thin sheets enables device operation either as an Esaki diode featuring negative differential resistance (NDR) in the negative gate voltage regime or as a backward diode in the positive gate bias regime. Such tuning possibility is imparted by the fact that only the carrier concentration in the BP component can be effectively modulated by electrostatic gating, while the relatively high carrier concentration in the SnSe2 sheet renders it insensitive against gating. Scanning photocurrent microscopy maps indicate the presence of a staggered (type II) band alignment at the heterojunction. The temperature-dependent NDR behavior of the devices is explainable by an additional series resistance contribution from the individual BP and SnSe2 sheets connected in series. Moreover, the backward rectification behavior can be consistently described by the thermionic emission theory, pointing toward the gating-induced formation of a potential barrier at the heterojunction. It furthermore turned out that for effective Esaki diode operation, care has to be taken to avoid the formation of positive charges trapped in the alumina passivation layer.
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