51. Sputtering of amorphous ITO thin films used for chalcopyrite solar cells
- Author
-
Aviles, T., Lethien, C., Zegaoui, M., Vilcot, J.-P., Leroy, F., Roussel, P., Rolland, N., Rolland, P.A., Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), and Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)
- Subjects
[SPI]Engineering Sciences [physics] ,CIS and Related Ternary and Quaternary Thin Film Solar Cells ,Thin Film Solar Cells ,7. Clean energy - Abstract
26th European Photovoltaic Solar Energy Conference and Exhibition; 3004-3006, In this conference, we report on the study of electrical, optical and structural properties of RF sputtered Indium Tin Oxide (ITO) thin films at room temperature. These films are dedicated to act as front electrode of CIGS solar cells and shall so compel with the electrical and optical criteria that are required for such an application. It is well-known that the main drawback of the sputtering deposition technique deals with the inherent generation of highly energetic particles that causes bombardment onto the sample. The developed deposition process targets to be damage free onto the underlying layer. The deposition process is developed in a conventional magnetron sputtering system without external heating, in such a way that films shall be amorphous. Furthermore, film internal stress is kept very low. Optical studies show a transparency over 80% in the visible range and a high transparency in the infrared region. The lowest obtained sheet resistance is 12.6 Ω/ (~ 300nm film thickness) with a carrier concentration of 2.4 x 1020 cm-3 and a carrier mobility of 45.1 cm²/V.s.
- Published
- 2011