51. Nanopatterning of polyfluorene derivative using electron-beam lithography
- Author
-
Yusuke Doi, Kazumasa Okamoto, Akinori Saeki, Yoshiko Koizumi, Seiichi Tagawa, Shu Seki, and Takahiro Kozawa
- Subjects
chemistry.chemical_classification ,Conductive polymer ,Materials science ,business.industry ,General Engineering ,Polymer ,Fluorescence ,chemistry.chemical_compound ,Polyfluorene ,chemistry ,Optoelectronics ,business ,Absorption (electromagnetic radiation) ,Lithography ,Derivative (chemistry) ,Electron-beam lithography - Abstract
Direct nanopatterning of polyfluorene derivative is demonstrated using electron-beam lithography. Polyfluorene, which has attracted much attention because of its strong fluorescence and application in organic light emitters, is a negative (crosslinking) type material upon exposure to radiation, and requires a large amount of exposure dose ∼2300μC∕cm2 to be patterned in the present case. This extremely large dose would lead to radiation damage of the polymer. To address this issue, a polyfluorene derivative for acid-catalyzed chemical amplification was synthesized to realize nanopatterning of π-conjugated polymer without degrading its optical property. The synthesized polyfluorene derivative was investigated in terms of sensitivity, optical absorption, and spatial resolution. Sensitivity of 4μC∕cm2 was achieved, and lines of 70 nm width were fabricated after optimization of the process conditions.
- Published
- 2005
- Full Text
- View/download PDF