51. Controlled Fabrication of Silicon Nanostructures by the Nanosphere Lithography: Application for Low Reflection Over Wide Spectrum
- Author
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Jinxin Chen, Xiaomei Qin, Dong Zhang, and Wangzhou Shi
- Subjects
Fabrication ,Materials science ,Biomedical Engineering ,Bioengineering ,Nanotechnology ,02 engineering and technology ,General Chemistry ,010402 general chemistry ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,Silicon nanostructures ,01 natural sciences ,0104 chemical sciences ,Nanosphere lithography ,General Materials Science ,0210 nano-technology ,Reflection (computer graphics) - Abstract
Nanostructures have been widely employed to reduce optical refkection for various optoelectronic devices. In this work, the aligned nanostructure arrays of with desirable diameter and density were obtained. We demonstrated the potential applications of nanosphere lithography in fabrication of Si nanoholes (SiNHs) and Si nanowires (SiNWs) with excellent broadband light antirefkectance properties. Both nanostructures drastically suppress the refkection across the whole measured spectrum with wavelength above Si band gap (1.12 eV) as compared to that of planar Si wafer. The refkectance intensity of SiNHs and SiNWs is less than 6% over broad range of 400 to 1000 nm. The nanosphere lithography technique is expected to have potential applications in fabrication of nanostructures with various properties.
- Published
- 2017