51. Deuterated silicon dioxide for heterogeneous integration of ultra-low-loss waveguides
- Author
-
Warren Jin, Jared F. Bauters, John E. Bowers, Brian Thibeault, Demis D. John, and Tony Bosch
- Subjects
Fabrication ,Materials science ,Passivation ,Annealing (metallurgy) ,business.industry ,Silicon dioxide ,Detector ,02 engineering and technology ,Dielectric ,021001 nanoscience & nanotechnology ,01 natural sciences ,Atomic and Molecular Physics, and Optics ,010309 optics ,chemistry.chemical_compound ,Optics ,Deuterium ,chemistry ,0103 physical sciences ,Optoelectronics ,Whispering-gallery wave ,0210 nano-technology ,business - Abstract
Ultra-low-loss waveguide fabrication typically requires high-temperature annealing beyond 1000°C to reduce the hydrogen content in deposited dielectric films. However, realizing the full potential of an ultra-low loss will require the integration of active materials that cannot tolerate high temperature. Uniting ultra-low-loss waveguides with on-chip sources, modulators, and detectors will require a low-temperature, low-loss dielectric to serve as a passivation and spacer layers for complex fabrication processes. We report a 250°C deuterated silicon dioxide film for top cladding in ultra-low-loss waveguides. Using multiple techniques, we measure propagation loss below 12 dB/m for the entire 1200–1650 nm range and top-cladding material absorption below 1 dB/m in the S, C, and L bands.
- Published
- 2020