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55 results on '"Tynan, George R."'

51. Evidence for molecular-assisted recombination of He+ from particle balance measurements in helium-hydrogen mixture plasmas in PISCES-A.

Author

Cai, Laizhong, Tynan, George R., and Hollmann, Eric M.

Subjects
*PARTICLES, *PLASMA gases, *SPECTRUM analysis, *HYDROGEN, *HELIUM, *IONS
Abstract

Particle balance measurements of He+ ions in He/H mixture plasma are performed by using wall probes, plunging probes, and spectroscopy. The measurements indicate that radial loss to the chamber wall is the dominant ion sink; nevertheless, a missing ion sink is observed as the plasma hydrogen fraction is increased. This sink term is attributed to hydrogen-mediated recombination of He+ ions, so-called molecular-assisted recombination (MAR). Independent evidence for MAR (acting on hydrogen ions, however) is seen in anomalously large Hα/Hγ ratios at the cold plasma edge. [ABSTRACT FROM AUTHOR]

Published
2008
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53. Special Section Authors

Author

Conrads, Hans, primary, de Kock, Lambertus, additional, Goebel, Dan M., additional, Bohdansky, Joseph, additional, Conn, Robert W., additional, Hirooka, Yoshi, additional, Leung, Wai Kwong, additional, Nygren, Richard E., additional, Tynan, George R., additional, Vietzke, Egon, additional, Philipps, Volker, additional, Langer, William D., additional, Ehrhardt, Alicia Butcher, additional, Croessmann, Charles D., additional, Gilbertson, Neill B., additional, Watson, Robert D., additional, and Whitley, John B., additional

Published
1989
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55. The Effect of BCl3Addition on RuO2Etching in M=0 Helicon Reactor

Author

Kim, Yun-Sang, Rampersad, Regan H., and Tynan, George R.

Abstract

Photoresist patterned ruthenium oxide etching for ferroelectric capacitor structured device has been studied using high density helicon wave plasma. The trends in the effect on the etch rate and selectivity to photoresist for BCl3ratio to Cl2have been determined. It was found that the strong scavenging effect of BCl3lead primarily after ion bombardment on the film surface. The possible mechanism on the reduction of the issued by-product, RuO4, during plasma process was proposed using plasma and optical emission data.

Published
1998
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