51. Laser-induced desorption from silicon (111) surfaces with adsorbed chlorine atoms
- Author
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Takushi Iimori, Fumio Komori, Yoshitada Murata, Koichiro Hattori, and Ken-ichi Shudo
- Subjects
Photon ,Silicon ,Analytical chemistry ,chemistry.chemical_element ,Laser ,Condensed Matter Physics ,law.invention ,Adsorption ,chemistry ,Etching (microfabrication) ,law ,Desorption ,Chlorine ,Molecule ,General Materials Science - Abstract
We have studied the initial stage of the laser-induced reaction of silicon surfaces with adsorbed chlorine atoms in ultrahigh vacuum, by measuring the species desorbing from the surfaces. In particular, our studies have focused on photo-chemical etching without laser-induced thermal heating. We found that the primary species desorbing from Cl-saturated Si(111) surfaces is the molecule and that the desorption efficiency with 2.3, 3.5 and 4.7 eV photons is significantly enhanced with respect to that for 1.2 eV photons. The results of previous STM studies are discussed and a possible mechanism for the photo-chemical etching is proposed.
- Published
- 1997
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