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Quantum dot infrared photodetectors (QDIPs) have been shown to be a key technology in broad infrared wavelength (3–12 µm) detection due to their potential for normal incidence operation, low dark current density and higher temperature operation. In our research, we have been investigating infrared detectors based on intersubband transitions in a novel InAs/In 0.15 Ga 0.85 As quantum dots-in-well (DWELL) and normal GaAs-capped InAs quantum dot heterostructures. The study is to demonstrate a dual-band infrared image based on two stacked InGaAs and GaAs- capped InAs QDIP structure, with the use of nano-scale Al 2 O 3 surface passivated layer by atomic layer deposition (ALD) system deposited to decrease the device shot noise and boost the operation temperature of the thermal imaging FPA to 180 K. It is worth to mention the specific detectivities (D*) of test device passivated with Al 2 O 3 measured under 80 K and Vb = –3.3 V for mid-wavelength detection is as high as 2.1 × 10 11 cmHz 1/2 /W. By a two-step selective backside etching process, the uncorrected non-uniformity of NEDT is lowered to 6.7%. It reveals the high uniformity of infrared image taken from QWIP FPA with this proposed process is comparable to the conventional one with the mixture of wet- and dry-etching ICP-RIE.

In this letter, the effect of extraordinary transmission of periodic metal hole arrays is directly integrated into the quantum dot infrared photodetector with broadband response. It is found that the detector response is strongly modulated by the extraordinary transmission from the excitation of surface plasmon.

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The temperature-dependent capacitance–voltage (C–V) characteristics of two stacked InAs/GaAs quantum dot p–i–n diode were investigated. The capacitance discontinuities observed are attributed to charge storage in the InAs quantum dots. The average storage electrons at each InAs quantum dot thus obtained are two and three electrons at room temperature and at temperature below 100 K, respectively. In the intermediate temperature range from 100 to 250 K, fractional charge occupation is observed in each dot. When the C–V measurement frequency is lowered from 800 to 80 kHz, the capacitance turns into a negative value under low biases which indicates the dominance of the inductance at lower frequency.

The current leakages of InAs photodiodes have been systematically studied by adding undoped layers having thicknesses of 0, 0.30, and 0.72 μm between the p–n junction. At reverse bias V=−0.5 V, the dark currents of the InAs p–i–n diodes with undoped layer thicknesses of 0, 0.30, and 0.72 μm are about 5×10−6, 7×10−8, and 1×10−10 A, respectively, at 77 K. The leakage current of the InAs p–n diode was successfully reduced by adding 0.72-μm-thick undoped layer between the p–n junction.