51. 300 mm Wafer-level, ultra-dense arrays of Au-capped nanopillars with sub-10 nm gaps as reliable SERS substrates
- Author
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Hilde Jans, I. Vos, Chang Chen, Jiaqi Li, Victor Moshchalkov, Niels Verellen, Yasuaki Okumura, Pol Van Dorpe, XiuMei Xu, and Liesbet Lagae
- Subjects
Reproducibility ,Fabrication ,Materials science ,business.industry ,Nanotechnology ,Surface-enhanced Raman spectroscopy ,Lattice constant ,Optoelectronics ,Molecule ,General Materials Science ,Wafer ,business ,Immersion lithography ,Nanopillar - Abstract
The 193 nm deep UV immersion lithography is leveraged to fabricate highly dense and uniform arrays of Au-capped Si nanopillars on a 300 mm wafer level, and the substrates are applied in surface enhanced Raman spectroscopy for reliable molecule detection. Due to the sub-10 nm gap sizes and ultra-high array density with the lattice constant less than 100 nm, our nanopillar based substrates outperform the current commercial products in terms of the signal intensity, reproducibility and fabrication scale. crosscheck: This document is CrossCheck deposited related_data: Supplementary Information copyright_licence: The Royal Society of Chemistry has an exclusive publication licence for this journal copyright_licence: The accepted version of this article will be made freely available after a 12 month embargo period history: Received 29 July 2014; Accepted 27 August 2014; Accepted Manuscript published 2 September 2014; Advance Article published 18 September 2014; Version of Record published 9 October 2014 ispartof: Nanoscale vol:6 issue:21 pages:12391-12396 ispartof: location:England status: published
- Published
- 2014