51. Soft Magnetic Properties for Fe-B Films Sputtered in Ar+N2 Plasma
- Author
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M. Takahashi, K. Hiraga, Y. Sakai, T. Shimatsu, and Tokuo Wakiyama
- Subjects
Nuclear magnetic resonance ,Materials science ,Electron diffraction ,Annealing (metallurgy) ,Sputtering ,X-ray crystallography ,Analytical chemistry ,Thin film ,Coercivity ,Microstructure ,Grain size - Abstract
Fe-B films sputtered in Ar+N 2 plasma were investigated in order to obtain film with high initial permeability. Importance was placed on elucidation of the relation between the initial permeability ? i and parameters of the film structure such as the phase, grain size, and lattice strain. Fe-B (1 to 4 at% B) films sputtered in Ar+5%N 2 plas-ma exhibit a high ? i of about 2000 after annealing at 400 °C, and about 1000 after annealing at 500 °C. The results of X-ray and electron diffraction patterns indicate that films with high ? i consist of the ? phase. By comparing this with results for Fe-N films, it is suggested that the high ? i of Fe-B-N films is caused by the reduction of grain sizes and induced lattice strain, as well as other metallurgical structures such as in homogeneities.
- Published
- 1992
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