51. Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
- Author
-
Steve P. Walch, Ki-Hyun Kim, Yongmin Kim, J. Provine, Hyo-Jin Kim, Fritz B. Prinz, and Peter Schindler
- Subjects
010302 applied physics ,Materials science ,business.industry ,General Physics and Astronomy ,Low-k dielectric ,Nanotechnology ,02 engineering and technology ,Plasma ,021001 nanoscience & nanotechnology ,01 natural sciences ,lcsh:QC1-999 ,chemistry.chemical_compound ,Atomic layer deposition ,Hydrofluoric acid ,chemistry ,Silicon nitride ,0103 physical sciences ,Remote plasma ,Optoelectronics ,0210 nano-technology ,business ,Layer (electronics) ,Deposition (law) ,lcsh:Physics - Abstract
The continued scaling in transistors and memory elements has necessitated the development of atomic layer deposition (ALD) of silicon nitride (SiNx), particularly for use a low k dielectric spacer. One of the key material properties needed for SiNx films is a low wet etch rate (WER) in hydrofluoric (HF) acid. In this work, we report on the evaluation of multiple precursors for plasma enhanced atomic layer deposition (PEALD) of SiNx and evaluate the film’s WER in 100:1 dilutions of HF in H2O. The remote plasma capability available in PEALD, enabled controlling the density of the SiNx film. Namely, prolonged plasma exposure made films denser which corresponded to lower WER in a systematic fashion. We determined that there is a strong correlation between WER and the density of the film that extends across multiple precursors, PEALD reactors, and a variety of process conditions. Limiting all steps in the deposition to a maximum temperature of 350 °C, it was shown to be possible to achieve a WER in PEALD SiNx of 6.1 Å/min, which is similar to WER of SiNx from LPCVD reactions at 850 °C.
- Published
- 2016