51. Characterization of Si Single Crystals by Conductivity Mode Scanning Electron Microscopy
- Author
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A. J. R. de Kock, S. D. Ferris, Harry J. Leamy, and Lionel C. Kimerling
- Subjects
Materials science ,Scanning electron microscope ,business.industry ,Mode (statistics) ,Optoelectronics ,General Medicine ,Conductivity ,business ,Characterization (materials science) - Abstract
We have recently examined the microscopic electrical inhomogeneities present in dislocation free, floating zone, Si crystals grown under various conditions by conductivity mode scanning electron microscopy. Schottky barriers produced by evaporation of thin Au-Pd (on N type) or Ti (on P type) electrodes were employed in order to eliminate possible changes in defect structure or electrical activity during production of a diffused junction.Doped and undoped crystals, as well as crystals subjected to special treatments, such as melt quenching were examined in this study. Prior to SEM analysis, each crystal was characterized by preferential etching, Cu or Li decoration, and x-ray topography. All of the defects detected by these methods, save C impurity striations detected via their dilatation of the Si lattice in x-ray topographs, were observed in the SEM experiments. For example, “swirl” defects of both type “A” (large) and type “B” (small) were readily revealed via the enhanced recombination rate of electron beam injected carriers in their vicinity (see Figs. 1 and 2).
- Published
- 1975
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