Search

Your search keyword '"Bijkerk, Fred"' showing total 293 results
Start Over Author "Bijkerk, Fred"
293 results on '"Bijkerk, Fred"'

51. Chemically mediated diffusion of d-metals and B through Si and agglomeration at Si-on-Mo interfaces.

Author

Tsarfati, Tim, Zoethout, Erwin, van de Kruijs, Robbert, and Bijkerk, Fred

Subjects
INTERFACES (Physical sciences), MOLYBDENUM, SILICON, AGGLOMERATION (Materials), DIFFUSION, SPUTTERING (Physics), RUTHENIUM
Abstract

Chemical diffusion and interlayer formation in thin layers and at interfaces is of increasing influence in nanoscopic devices, such as nanoelectronics and reflective multilayer optics. Chemical diffusion and agglomeration at interfaces of thin Ru, Mo, Si, and B4C layers have been studied with x-ray photoelectron spectroscopy, cross section electron energy loss spectroscopy, high-angle annular dark field scanning transmission electron microscopy, and energy dispersive x-ray in relation to observations in Ru-on-B4C capped Mo/Si multilayers. Rather than in the midst of the Si layer, silicides and borides are formed at the Si-on-Mo interface front, notably RuSix and MoBx. The interface apparently acts as a precursor for further chemical diffusion and agglomeration of B, Ru, and also other investigated d-metals. Reversed "substrate-on-adlayer" interfaces can yield entirely suppressed reactivity and diffusion, stressing the influence of surface free energy and the supply of atoms to the interface via segregation during thin layer growth. [ABSTRACT FROM AUTHOR]

Published
2009
Full Text
View/download PDF

52. In-depth agglomeration of d-metals at Si-on-Mo interfaces.

Author

Tsarfati, Tim, Zoethout, Erwin, van de Kruijs, Robbert, and Bijkerk, Fred

Subjects
INTERFACES (Physical sciences), AGGLOMERATION (Materials), DIFFUSION, PHYSICAL vapor deposition, SILICON, MOLYBDENUM, RUTHENIUM, RHODIUM
Abstract

Reflective Si/Mo multilayer mirrors with protective d-metal surfaces onto a range of upper Mo and Si layer thicknesses have been grown with physical vapor deposition and investigated on diffusion and in-depth compound formation. Laterally inhomogeneous upward Si and downward d-metal diffusion occurs through Mo layers up to 2 nm thickness. Especially Ru and Rh agglomerate and form silicides such as Ru2Si3 and Rh2Si not in the midst of the Si layer but at the Si/Mo interface. This appears to be mediated by MoSi2 presence at the Si/Mo interface that acts as precursor via better lattice compatibility and lowering of formation energy. [ABSTRACT FROM AUTHOR]

Published
2009
Full Text
View/download PDF

53. Sputtering yields of Ru, Mo, and Si under low energy [Ar.sup.+] bombardment

Author

Shiou-Min Wu, van de Kruijs, Robbert, Zoethout, Erwin, and Bijkerk, Fred

Subjects
Molybdenum -- Electric properties, Molybdenum -- Optical properties, Photolithography -- Analysis, Ruthenium -- Electric properties, Ruthenium -- Optical properties, Sputtering (Physics) -- Usage, Physics
Abstract

In situ weight-loss method with a Kaufman ion source, Faraday cup, and quartz crystal microbalance are used for studying the ion sputtering yields for Ru, Mo, and Si under [Ar.sup.+] ion bombardment in the near-threshold energy range. The results have provided accurate data sets for theoretical modeling in the near-threshold sputter regime and are relevant for optical surfaces exposed to plasmas in extreme ultraviolet photolithography.

Published
2009

55. High Reflectance Nanoscale V/Sc Multilayer for Soft X-ray Water Window Region

Author

Huang, Qiushi, primary, Yi, Qiang, additional, Cao, Zhaodong, additional, Qi, Runze, additional, Loch, Rolf A., additional, Jonnard, Philippe, additional, Wu, Meiyi, additional, Giglia, Angelo, additional, Li, Wenbin, additional, Louis, Eric, additional, Bijkerk, Fred, additional, Zhang, Zhong, additional, and Wang, Zhanshan, additional

Published
2017
Full Text
View/download PDF

59. High reflectance La/B based multilayer mirrors for 6.x nm wavelength

Author

Kuznetsov, Dmitry, Yakshin, Andrey, Sturm, Marko, Van De Kruijs, Robbert, Louis, Eric, Bijkerk, Fred, Goto, Shunji, Morawe, Christian, Khounsary, Ali M., and XUV Optics

Abstract

For future photolithography processes, the wavelength of 6 nm may offer improved imaging specs. The perspective of this technology however, will depend critically on the performance of multilayer reflective mirrors, which are likely to be based on La/B. One of the issues is formation of LaxBy compounds at the interfaces, which decreases the optical contrast and reduce the reflectivity. To prevent such chemical interaction, passivation of La by nitrogen has been investigated. We successfully synthesized LaN layers that resulted in a new world record reflectivity of 64% at 6.6 nm at near normal incidence. This reduces the gap to the target of 70%, desired for a next generation lithography.

Published
2015

60. Spectral purity enhancement for the EUV Lithography Systems by suppressing UV reflection from multilayers

Author

Huang, Qiushi, de Boer, Meint, Barreaux, Jonathan, Paardekooper, Daniel Mathijs, van den Boogaard, Toine, van de Kruijs, Robbert, Zoethout, Erwin, Louis, Eric, Bijkerk, Fred, Wood, Obert R., Panning, Eric M., and XUV Optics

Subjects
Materials science, business.industry, Extreme ultraviolet lithography, Radiation, Grating, medicine.disease_cause, Wavelength, Optics, EUV multilayer, Pyramid, Extreme ultraviolet, medicine, Optoelectronics, Spectral purity, business, Lithography, Diffraction, Ultraviolet
Abstract

Plasma based radiation sources optimized to emit 13.5 nm Extreme UV radiation also produce a significant amount of light at longer wavelengths. This so called out-of-band (OoB) radiation is detrimental for the imaging capabilities of an EUV lithographic imaging system, particularly the ultraviolet (UV) parts of the light (λ=100-400 nm). To suppress these wavelengths while maintaining the high efficiency of the mirror for EUV light, several methods have been developed, including phase-shift gratings (PsG) and anti-reflection layers (SPE layer). Both methods have achieved a suppression factor of 10 - 30 around the target wavelength. To achieve a full band suppression effect with a minimum loss of EUV light, a new scheme based on surface pyramid structures was developed. An average suppression of more than 10 times was achieved with a relative EUV efficiency of 82.2% by using the Si pyramids structure (compared to a flat multilayer (ML)). Recently, we have successfully produced a pyramid structure consisting of multilayers which greatly improves the relative EUV efficiency to 94.2%.

Published
2014
Full Text
View/download PDF

64. Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics.

Author

Qiushi Huang, Medvedev, Viacheslav, van de Kruijs, Robbert, Yakshin, Andrey, Louis, Eric, and Bijkerk, Fred

Subjects
OPTICAL multilayers, ULTRAVIOLET radiation, SOFT X rays, PHOTOLITHOGRAPHY, PARTICLE accelerators
Abstract

Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed. [ABSTRACT FROM AUTHOR]

Published
2017
Full Text
View/download PDF

88. Subatomic accuracy in EUVL multilayer coatings

Author

Zoethout, Erwin, primary, Suter, P., additional, van de Kruijs, R. W., additional, Yakshin, Andrey E., additional, Louis, Eric, additional, Bijkerk, Fred, additional, Enkisch, H., additional, and Muellender, Stefan, additional

Published
2004
Full Text
View/download PDF

Catalog

Books, media, physical & digital resources
See catalog results