801. Molecular beam epitaxy of GaNAs alloys with high As content for potential photoanode applications in hydrogen production.
- Author
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Novikov, S. V., Staddon, C. R., Foxon, C. T., Yu, K. M., Broesler, R., Hawkridge, M., Liliental-Weber, Z., Walukiewicz, W., Denlinger, J., and Demchenko, I.
- Subjects
GALLIUM nitride ,MOLECULAR beam epitaxy ,GALLIUM arsenide ,ALLOYS ,CRYSTAL growth - Abstract
The authors have succeeded in growing GaN
1-x Asx alloys over a large composition range (02 flux at low (as low as 100 °C) growth temperatures, which is much below the normal GaN growth temperature range. Using x-ray and transmission electron microscopy, they found that the GaNAs alloys with high As content x>0.17 are amorphous. Optical absorption measurements together with x-ray absorption and emission spectroscopy results reveal a continuous gradual decrease in band gap from ∼3.4 to <1 eV with increasing As content. The energy gap reaches its minimum of ∼0.8 eV at x∼0.8. The composition dependence of the band gap of the crystalline GaN 1-x Asx alloys follows the prediction of the band anticrossing model (BAC). However, our measured band gap of amorphous GaN1-x Asx with 0.31-xAs x alloys have short-range ordering that resembles random crystalline GaN1-x Asx alloys. They have demonstrated the possibility of the growth of amorphous GaN1-x Asx layers with variable As content on glass substrates. [ABSTRACT FROM AUTHOR]- Published
- 2010
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