401. Growth of 4H-SiC epitaxial layers at temperatures below 1500 °C using trichlorosilane (TCS).
- Author
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Yang, Shangyu, Zhao, Siqi, Chen, Junhong, Yan, Guoguo, Shen, Zhanwei, Zhao, Wanshun, Wang, Lei, Zhang, Yang, Liu, Xingfang, Sun, Guosheng, and Zeng, Yiping
- Subjects
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EPITAXIAL layers , *EPITAXY , *TRICHLOROSILANE , *SINGLE crystals , *TEMPERATURE - Abstract
• The growth of 4H-SiC using TCS in the temperature range of 1350 °C to 1550 °C was studied. • When the growth temperature was increased to 1450 °C, RMS reached about 0.2 nm. • When the growth temperature was increased to 1400 °C, the epitaxial layer is a single 4H-SiC. • High quality 4H-SiC epitaxial layer can be obtained at 1450 °C. TCS (SiHCl 3) is widely used in the rapid growth of SiC. However, in the study of using TCS to grow 4H-SiC, the growth temperature is mainly concentrated in 1550–1650 °C, and the research on lower growth temperature is lacking. In this study, TCS was used as the silicon precursor and epitaxial layers were grown in the temperature range of 1350–1500 °C. The results show that the single crystal type 4H-SiC epitaxial layer with good quality can be obtained at the growth temperature of 1450 ℃. [ABSTRACT FROM AUTHOR]
- Published
- 2023
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