421 results on '"Leray, Philippe"'
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402. Overlay error investigation for metal containing resist (MCR)
403. Self-aligned block technology: a step toward further scaling
404. Impact of stochastic process variations on overlay mark fidelity "towards the 5nm node"
405. Enabling CD SEM metrology for 5nm technology node and beyond
406. Metrology challenges for in-line process control
407. Growing Hierarchical Self-Organizing Map for Alarm Filtering in Network Intrusion Detection Systems.
408. Hybrid overlay metrology for high order correction by using CDSEM
409. Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
410. Ultimate intra-wafer critical dimension uniformity control by using lithography and etch tool corrections
411. Hybrid overlay metrology with CDSEM in a BEOL patterning scheme
412. Real-time inspection system utilizing scatterometry pupil data
413. Compensating process non-uniformity to improve wafer overlay by RegC
414. Impact of process decisions and alignment strategy on overlay for the 14nm node
415. Overlay accuracy with respect to device scaling
416. Diffraction based overlay re-assessed
417. Inspection of Stochastic Defects With Broadband Plasma Optical Systems for Extreme Ultraviolet (EUV) Lithography.
418. Learning the parameters of possibilistic networks from data: Empirical comparison
419. Towards an Integral Approach for Modeling Causality
420. Une architecture semi-supervisée et adaptative pour le filtrage d'alarmes dans les systèmes de détection d'intrusions sur les réseaux
421. Réseaux bayésiens : Apprentissage et diagnostic de systemes complexes
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