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Solar cells with the structure ZnO/CdS/Cu 2 ZnSnSe 4 /Mo/glass were studied by photoluminescence (PL) before and after irradiation with a dose of 1.8 × 1015 cm−2 and then 5.4 × 1015 cm−2 of 10 MeV electrons carried out at 77 K in liquid nitrogen bath. The low temperature PL spectra before irradiation revealed two bands, a broad and asymmetrical dominant band at 0.94 eV from the CZTSe layer and a lower intensity high energy band (HEB) at 1.3 eV, generated by defects in the CdS buffer layer. Analysis of the excitation intensity and temperature dependencies suggested that the dominant band is free-to-bound (FB): the recombination of free electrons with holes localised at acceptors whose energy levels are affected by potential fluctuations of the valence band due to high concentrations of randomly distributed charged defects. Irradiation did not induce any new band in the examined spectral range (from 0.5 μm to 1.65 μm) but reduced the intensity of both bands in the PL spectra measured at 77 K without warming the cells. The higher the dose the greater was the reduction. After this the cells were warmed to 300 K and moved to a variable temperature cryostat to measure temperature dependencies of the PL spectra. After irradiation the red shift rate of the FB band with temperature rise was found to increase. Electrons displace atoms in the lattice creating primary defects: interstitials and vacancies. These defects recombine during and shortly after irradiation forming secondary defect complexes which work as deep non-radiative traps of charge carriers reducing the PL intensity and increasing the rate of the temperature red shift. Irradiation did not affect the mean depth of the band tails estimated from the shape of the low energy side of the dominant PL band. [ABSTRACT FROM AUTHOR]

• Combined top-down bottom-up approach as alternative to AlN selective area growth. • Purely AlN nanostructures suitable to house GaN quantum dots. • Uniform AlN nanorod structures with sharp apices and fully formed non-polar planes. • AlN nanostructures suitable for non- and semi-polar active regions. • Study of different growth conditions effecting AlN nanostructure morphology. The realisation of spatially-determined, uniform arrays of faceted aluminium nitride (AlN) nanostructures has had limited exploration, largely due to the fact that selective area growth of AlN via MOVPE (Metal Organic Vapour Phase Epitaxy) has not been realised. Instead, this paper reports the use of a combined top-down, bottom-up approach to realise well-faceted, highly-uniform, periodic nanotextured AlN surfaces. MOVPE regrowth is performed upon dry-etched AlN nanorods and nanoholes, and we present a study into the effect of the growth conditions on the resulting faceting and morphology. Specifically, growth temperature, V/III ratio and growth time are investigated and analysed via scanning-electron and atomic-force microscopy. The V/III ratio was found to influence the nanostructure morphology most whilst the growth temperature was found to have much less of an impact within the temperature range studied. Experiments with a longer growth time are performed to create nanostructures for potential use in applications, such as for AlGaN-based quantum-well or quantum-dot emitters. [ABSTRACT FROM AUTHOR]

Understanding defects and their roles in plastic deformation and device reliability is important for the development of a wide range of novel materials for the next generation of electronic and optoelectronic devices. We introduce the use of gaseous secondary electron detectors in a variable pressure scanning electron microscope for non-destructive imaging of extended defects using electron channelling contrast imaging. We demonstrate that all scattered electrons , including the secondary electrons, can provide diffraction contrast as long as the sample is positioned appropriately with respect to the incident electron beam. Extracting diffraction information through monitoring the modulation of the intensity of secondary electrons as a result of diffraction of the incident electron beam, opens up the possibility of performing low energy electron channelling contrast imaging to characterise low atomic weight and ultra-thin film materials. Our methodology can be adopted for large area, nanoscale structural characterisation of a wide range of crystalline materials including metals and semiconductors, and we illustrate this using the examples of aluminium nitride and gallium nitride. The capability of performing electron channelling contrast imaging, using the variable pressure mode, extends the application of this technique to insulators, which usually require conducting coatings on the sample surface for traditional scanning electron microscope based microstructural characterisation. [ABSTRACT FROM AUTHOR]

• Fabrication of nano-pillars on sapphire using Displacement Talbot Lithography. • AlN overgrowth shows smooth surface by changing offcut from 0.2° to 0.1°. • Extended defect characterization comparing XRD, ECCI and defect etching. • Improved luminescence of AlGaN multi-quantum-wells (265 nm) on 0.1° offcut sample. • Realized UVC LED (265 nm) on 0.1° offcut sample (0.81 mW @ 20 mA, EQE = 0.86%). We present overgrowth of nano-patterned sapphire with different offcut angles by metalorganic vapor phase epitaxy. Hexagonal arrays of nano-pillars were prepared via Displacement Talbot Lithography and dry-etching. 6.6 µm crack-free and fully coalesced AlN was grown on such substrates. Extended defect analysis comparing X-ray diffraction, electron channeling contrast imaging and selective defect etching revealed a threading dislocation density of about 109 cm−2. However, for c-plane sapphire offcut of 0.2° towards m direction the AlN surface shows step bunches with a height of 10 nm. The detrimental impact of these step bunches on subsequently grown AlGaN multi-quantum-wells is investigated by cathodoluminescence and transmission electron microscopy. By reducing the sapphire offcut to 0.1° the formation of step bunches is successfully suppressed. On top of such a sample an AlGaN-based UVC LED heterostructure is realized emitting at 265 nm and showing an emission power of 0.81 mW at 20 mA (corresponds to an external quantum efficiency of 0.86%). [ABSTRACT FROM AUTHOR]