587 results on '"Adan, Ofer"'
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2. SEM overlay target design using e-beam simulation
3. Recess metrology challenges for 3D device architectures in advanced technology nodes
4. Plasma assisted particle contamination control
5. A yield-centric perspective on the growing eBeam role in patterning control
6. Welcome and Introduction to SPIE Conference 11611
7. Understanding the influence of 3D sidewall roughness on observed line-edge roughness in scanning electron microscopy images
8. Accuracy assessment between on-product and on-optical-target overlay metrology with SEM and STEM
9. Accelerating on-device overlay metrology accuracy verification
10. Recess metrology challenges for 3D device architectures in advanced technology nodes
11. Surface effects in simulations of scanning electron microscopy images
12. First results from the Large Dynamic Range Atomic Force Microscope for overlay metrology
13. On device EPE: minimizing overlay, pattern placement, and pitch-walk, in presence of EUV stochastics and etch variations (Conference Presentation)
14. Improving statistical validity with Macro CD-SEM imaging
15. A novel method of overlay variation study for 3D NAND channel hole
16. A study on diffraction-based overlay measurement based on FDTD method
17. Plasma assisted particle contamination control: plasma charging dependence on particle morphology
18. Accuracy aware pixel selection in multi-wavelength μDBO metrology enables higher robustness and accuracy for DRAM
19. AFM line space trench and depth measurement of fan-out fine-pitch high aspect ratio redistribution layer structure
20. Introducing machine learning-based application for writer main pole CD metrology by dual beam FIB/SEM
21. An accurate and robust after-develop overlay measurement solution using YieldStar multi-wavelength optical metrology accompanied by a precise application strategy
22. Absolute coordinate system adjustment and calibration by using standalone alignment metrology system
23. Non-destructive depth measurement using SEM signal intensity
24. Process variation impacts on optical overlay accuracy signature
25. Accuracy enhancement in imaging-based overlay metrology by optimizing measurement conditions per layer
26. Study of high throughput EUV mask pattern defect inspection technologies using multibeam electron optics
27. Imaging-based overlay metrology optimized by HV-SEM in 3D-NAND process
28. Data fusion by artificial neural network for hybrid metrology development
29. Mark design challenge of cut layer in FinFet
30. Effects of lithography process conditions on unbiased line roughness by PSD analysis
31. Defect characterization of EUV Self-Aligned Litho-Etch Litho-Etch (SALELE) patterning scheme for advanced nodes
32. Detection and correlation of yield loss induced by color resist deposition deviation with a deep learning approach applied to optical acquisitions
33. Broadband scatterometry at extreme ultraviolet wavelengths for nanograting characterization
34. Recent advancements in atomic force microscopy
35. Virtual metrology: how to build the bridge between the different data sources
36. Multivariate analysis methodology for the study of massive multidimensional SEM data
37. Assessment of stochastic fail rate using E-beam massive metrology
38. Scatterometry solutions for 14nm half-pitch BEOL layers patterned by EUV single exposure
39. Contour-based metrology for assessment of edge placement error and its decomposition into global/local CD uniformity and LELE intralayer overlay
40. Improvement of EPE measurement accuracy on ADI wafer, the method of using machine learning trained with CAD
41. Ellipsometric critical dimension metrology employing mid-infrared wavelengths for high-aspect-ratio channel hole module etch processes
42. Edge placement error wafer mapping and investigation for improvement in advanced DRAM node
43. In-line Raman spectroscopy for stacked nanosheet device manufacturing
44. Scatterometry of nanowire/nanosheet FETs for advanced technology nodes
45. Spectroscopy: a new route towards critical-dimension metrology of the cavity etch of nanosheet transistors
46. Methods to overcome limited labeled data sets in machine learning-based optical critical dimension metrology
47. OCD enhanced: implementation and validation of spectral interferometry for nanosheet inner spacer indentation
48. Unsupervised density-based machine learning for abnormal leveling signatures detection
49. Latent image characterization by spectroscopic reflectometry in the extreme ultraviolet
50. A breakthrough on throughput and accuracy limitation in ellipsometry using self-interference holographic analysis
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