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1 results on '"*PHOTOMASK manufacturing"'

1. IBM, Toppan expand photomask development to include 22-nm node.

Author

Mutschler, Ann Steffora

Subjects
*CONTRACTS, *PHOTOMASK manufacturing, *LITHOGRAPHY
Abstract

The article reports on the agreement made by International Business Machine Corp. and Toppan Printing Co. Ltd. in expanding the photomask process development in the U.S. The development deal encompasses the last phase of 32-nm photomask manufacturing procedure development to be done at IBM's Burlington photomask facility in Essex Junction, VT. It states that the working process is essential to the growth of lithography technologies that will be in demand to make future-generation semiconductors.

Published
2008

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