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The article focuses on the Inverse Lithography Technology (ILT) deployed on complex 45 and 32 nanometer (nm) critical layers by Palo Alto, California-based Luminescent Technologies Inc. It notes that ILT has demonstrated the ability to solve line-end shortening problems in the poly and diffusion layers at 45 nm. It mentions that ILT users benefited in mask-write speed metrics and mask-inspection validation. It cites several examples of manufacturers working on various designs with ILT.

This article reports on the launch of Explorer, the first iteration of what Mountain View, California-based Luminescent Technologies Inc. calls its inverse lithography technology, as of October 2005. Andrew Moore, vice president of marketing and business development at Luminescent, said by inverting they get it right the first time. The it that Moore was referring to was the photomask, or rather the mask data. With production fabricators now churning out devices with 90-nanometer feature sizes, the industry has been fabricating features smaller than the wavelength of light used to create them for the last several technology nodes.

Addresses issues surrounding the session "Maskless Lithography: Bark or Bite?," presented at the 2003 Photomask Technology conference in Monterey, California. Statistics on maskmaking; Arguments of Kevin Cummins, director of advanced reticle technology at the Technology Development Center of ASML; Disadvantages of maskless lithography.