Search

Solution-based printing approaches permit digital designs to be converted into physical objects by depositing materials in a layer-by-layer additive fashion from microscale to nanoscale resolution. The extraordinary adaptability of this technology to different inks and substrates has received substantial interest in the recent literature. In such a context, this review specifically focuses on the realization of inks for the deposition of ZnO, a well-known wide bandgap semiconductor inorganic material showing an impressive number of applications in electronic, optoelectronic, and piezoelectric devices. Herein, we present an updated review of the latest advancements on the ink formulations and printing techniques for ZnO-based nanocrystalline inks, as well as of the major applications which have been demonstrated. The most relevant ink-processing conditions so far explored will be correlated with the resulting film morphologies, showing the possibility to tune the ZnO ink composition to achieve facile, versatile, and scalable fabrication of devices of different natures.

Large-area, highly ordered ZnO micropores-arrays consisting of ZnO nanotubes delimited by ZnO nanorods have been successfully fabricated and tested for protein sensing applications. ZnO seed layers have been deposited by Metal Organic Chemical Vapour Deposition and readily patterned by Colloidal Lithography to attain ZnO nanorods growth at selective sites by Chemical Bath Deposition. The used synthetic approach has been proven effective for the easy assembly of ZnO nanoplatforms into high-density arrays. Both patterned and unpatterned ZnO nanorods have been morphologically and compositionally characterised and, thus, tested for model studies of protein mobility at the interface. The patterned layers, having a higher contribution of surface polar moieties than the corresponding unpatterned surfaces, exhibit a reduced lateral diffusion of the adsorbed protein. This evidence is related to the intrinsic porous nature of the ZnO hemispherical arrays characterised by a nanotube-nanorod hybrid networks. The present study gives a great impetus to the fabrication of tunable ZnO nanoplatforms having multiple morphologies and exceptionally high surface areas suitable for application in sensing devices.

A new ligand, N, N, N', N'-tetramethylethylenediamine, has been used to grow ZnO nanorods on silicon substrates via a two steps approach. A preliminary seeding on silicon substrates has been combined with chemical bath deposition using a Zinc acetate - N, N, N', N'-tetramethylethylenediamine aqueous solution. The used diamino ligand has been selected as Zn(2+) complexing agent and the related hydrolysis generates the reacting ions (Zn(2-) and OH(-)) responsible for the ZnO growth. The seed layer has been annealed at low temperature (

A complete set up of optimal process conditions for an effective colloidal lithography/catalyst assisted MOCVD process integration is presented. It mainly focuses on the determination of the deposition temperature threshold for ZnO Metal-Organic Chemical Vapour Deposition (MOCVD) as well as the concentration of metal-organic silver (Ag) catalyst. Indeed, the optimization of such process parameters allows to tailor the ZnO film morphology in order to make the colloidal lithography/catalyst assisted MOCVD approach a valuable bottom up method to fabricate bi-dimensional ordered ZnO nanohole arrays. (C) 2010 Elsevier B.V. All rights reserved.